GB/T 18682-2002 in English

VALID

Specifications of physical vapour deposition TiN films

Issued on:2002-03-10
Implemented on:2002-08-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $300.00
$291.00

Standard No:	GB/T 18682-2002
Document status:	VALID
Title in English:	Specifications of physical vapour deposition TiN films
Title in Chinese:	物理气相沉积TiN薄膜技术条件
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2002-03-10
Implemented on:	2002-08-01
ICS Classification:	25.220.20-Surface treatment
Chinese Classification:	A29-Material Protection
Professional Classification:	GB-National Standard
Related Keywords:	physical vapour deposition tin physical vapor deposition thin films tin films
Related Topics:	deposition thin film technology Membrane Technology gas phase vapor deposition Vapor Deposition Technology Vapor deposition film adhesion is average vapor deposition physical vapor deposition gas phase volume Tantalum solid phase deposition Vapor Deposition Technology Membrane gas phase volume peak + gas phase thin film physics Oriental Vapor Deposition physical film thin film technology tin bulk film phase sediment dating sediment year technical film film substance tin tin physical vapor deposition Vapor deposition instrument vapor phase film gas phase conditions Gas phase quenching technology Aqueous and organic membranes gas film technology gas phase volume Film UV test conditions Thin Film Test Conditions Thin film material phase Vapor deposition temperature Solid phase deposition instrument Water phase membrane near-field vapor deposition organic vapor deposition Membrane gas phase tin in the middle of the night thin film phase deposition carrier gas volume gas phase physical deposition GBT18682 film Sediment Physical Properties solid phase deposition The difference between chemical vapor deposition and physical vapor deposition Gas discharge and thin film deposition Physical vapor deposition method steps Comparison between physical vapor deposition and chemical vapor deposition Sediment particle size pretreatment Sediments International Thin film capacitor technical standards sediment treatment Physical vapor deposition process specifications

《GB/T 18682-2002物理气相沉积TiN薄膜技术条件》由TC57（全国金属与非金属覆盖层标准化技术委员会）归口，主管部门为中国机械工业联合会。
本标准规定了物理气相沉积TiN薄膜的技术要求。本标准适用于物理气相沉积TiN薄膜，也适用于其他方法制备的TiN薄膜。本标准也适用于其他材料沉积层（TiC，TiCN，TiAlN等）。

Scope

This standard specifies the technical requirements for physical vapor deposition of TiN thin films. This standard applies to physical vapor deposition of TiN thin films, and also to TiN thin films prepared by other methods. This standard also applies to other material deposition layers (TiC, TiCN, TiAIN, etc.).

More samples: NB/T 47013.2-2015 GB 50021-2001(2009) GB 18306-2015

Sample only — not a preview of GB/T 18682-2002

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