GB/T 34972-2017 in English

VALID

Determination of metal content in gases- Inductively coupled plasma mass spectrometry method

Issued on:2017-11-01
Implemented on:2018-02-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $160.00
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Standard No:	GB/T 34972-2017
Document status:	VALID
Title in English:	Determination of metal content in gases- Inductively coupled plasma mass spectrometry method
Title in Chinese:	电子工业用气体中金属含量的测定电感耦合等离子体质谱法
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2017-11-01
Implemented on:	2018-02-01
ICS Classification:	71.040.40-Chemical analysis
Chinese Classification:	G86-Industrial gas and chemical gas
Professional Classification:	GB-National Standard
Related Keywords:	plasma mass spectrometry method introduction gb/t metal content metal element content plasma mass spectrometry method metal elements
Related Topics:	Precursor ion peak in mass spectrum Inductively Coupled Plasma MS ionization voltage Mass Spec + Precursor Ion Peak mass spectrometry field ionization Plasma Mass Spectrometry Determination of Metal Elements in Solid Waste by Inductively Coupled Plasma Mass Spectrometry gold ion potential plasma mass spectrometry Mass Spectrum Molecular Weight Inductive coupling general purpose metal ion plasma in english ion pairs in mass spectrometry Beryllium in Inductively Coupled Plasma Stainless Steel Determination of Metal Elements in Solid Waste by Inductively Coupled Plasma Mass Spectrometry Inductively Coupled Plasma Mass Spectrometry Precursor ions for mass spectrometry plasma mass spectrometry Precursor Ions in Mass Spectrometry New Inductively Coupled Plasma Mass Spectrometer Inductively Coupled Plasma Nonmetals How to use inductive coupling Plasma and Mass Spectrometry lead ore inductively coupled plasma Inductively Coupled Plasma Mass Spectrometry Operation Inductively Coupled Plasma Characterization field ionization mass spectrometry Solution metal ion content Inductively Coupled Plasma Mass Spectrometry Manganese mass spectrometry ion spectrum The molecular weight in the mass spectrum is more than 7 content metal ion solution 58 ions in the mass spectrum Mass Spectrum Molecular Weight 26 Ion source for mass spectrometry Mass Spectrum Molecular Weight 43 mass spec ion peak mass plasma mass spectrometry Gas Chromatography Mass Spectrometry Precursor Ion Product Ion Mass Spectrum Molecular Weight 36 Inductively Coupled Plasma Characterization Gases for Ion Chromatography in-solution plasma method electronics industry Plasma mass spec pure Inductively Coupled Plasma Definition plasma coupled mass spectrometry water plasma Ions in a mass spectrum What gases are used in ion chromatography? 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Corresponding wavelength of metal ion inductive coupling Rubber plate metal ion content experiment Metal ion content detection method Execution of metallic elements of compressed air in the electronics industry How to measure the electron content in metals Metal ion free radical determination method Titanium alloy inductively coupled plasma National standard for metal content in water Bromine method for measuring metal ion content Metal ion detection Standard ion chromatography for detection of metal ions Antibody isoelectric point mass Gases for Electronics Industry International National monitoring of plasma mass spectrometer Metal ion detection method Plasma irradiation testing

《GB/T 34972-2017电子工业用气体中金属含量的测定电感耦合等离子体质谱法》由TC203（全国半导体设备和材料标准化技术委员会）归口，主管部门为国家标准化管理委员会。

Introduction

GB/T 34972—2017: Interpretation of the standard for determination of metal content in gases for the electronics industry

1. Scope and applicability of the standard

This standard specifies the method for determining the content of metal elements in gases for the electronics industry using an inductively coupled plasma mass spectrometer (ICP-MS). It is applicable to a variety of gas samples, including oxygen, nitrogen, argon, hydrogen, ammonia, etc. 0.000 1~100.0 Ce 0.000 5~100.0

2. Background of standard formulation and analysis of technological evolution

With the development of the electronics industry, the demand for detection of trace metal elements in gases is increasing. Traditional atomic absorption spectrometry (AAS) and inductively coupled plasma optical emission spectrometry (ICP-OES) have certain limitations in sensitivity and ability to simultaneously determine multiple elements. However, inductively coupled plasma mass spectrometry (ICP-MS) has become an ideal choice for gas detection in the electronics industry due to its advantages of high sensitivity and simultaneous detection of multiple elements.

3. Principle and steps of the method

3.1 Principle of the method

Metal elements are enriched by the absorption liquid in the gas washing bottle. The treated sample is introduced into the atomization system by the carrier gas to form an aerosol, and enters the central area of the plasma for ionization and excitation. The mass spectrometer separates ions according to the mass-to-charge ratio and determines their content.

3.2 Experimental steps

It includes four main links: sample sampling, absorption, processing and instrumental determination:

Gas sampling: Select appropriate sampling equipment according to the characteristics of the gas to ensure that the system is leak-free.
Sample absorption: Use nitric acid solution or pure water as the absorption liquid, and cool it in an ice water bath.
Working curve drawing: Use a multi-element mixed standard solution to establish a linear relationship, and the correlation coefficient is not less than 0.99.
Sample determination: Analyze the metal element content in the absorption liquid by ICP-MS, and calculate the metal content in the gas.

4. Implementation suggestions and precautions

To ensure the accuracy of the test results, it is recommended to strengthen management in the following aspects:

Instrument calibration: Regularly calibrate ICP-MS parameters to ensure measurement accuracy.
Absorption liquid treatment: Avoid contamination, and soak the vessel with nitric acid solution before use.
Data recording: Record sampling conditions, environmental factors and abnormal phenomena in detail.

5. Comparison of standard frameworks and application cases

This standard has wide applicability in the field of gas detection in the electronics industry, especially for trace metal analysis of high-purity gases and ultra-pure gases. The following is a practical application case:

Case study: A semiconductor company

A semiconductor company needs to detect the content of metal impurities in high-purity argon during the production process. By adopting this standard method, the content of aluminum (Al) in argon was successfully determined to the range of 0.001~100.0 μg/L, ensuring product quality.

More samples: DL/T 368-2010 QC/T 942-2021 GB 50021-2001(2009)

Sample only — not a preview of GB/T 34972-2017

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