YY/T 0652-2016 in English
VALIDWear of implant materials—Polymer and metal wear particles—Isolation and characterization
- Issued on:2016-01-26
- Implemented on:2017-01-01
- File Format:PDF
- Delivery:Via email within 1~3 business days
$243.00
本标准规定了分离和表征聚合物和金属磨屑(磨屑来源于翻修手术或尸检时关节置换植入物周围切除的组织或关节模拟器润滑液)的仪器、试剂和试验方法。
本标准适用于植入人体和模拟器中关节置换植入物所产生的聚合物和金属材料磨屑。
本标准代替YY/T 0652-2008植入物材料的磨损聚合物和金属材料磨屑分离、表征和定量分析方法。
Introduction
Interpretation of the core content of the standard
This standard specifies a standardized method for separating and characterizing polymer/metal wear debris generated by implant wear from human tissue and joint simulator lubricating fluid. Compared with the 2008 version, the main new step for ceramic wear debris treatment (5.4) is added, and the particle number calculation requirement is deleted.
Comparison of key technologies
| Wear dust type | Separation method | Characterization instrument | Key parameters |
|---|---|---|---|
| Polymer wear dust | NaOH digestion + ultracentrifugation | SEM (accelerating voltage ≤10keV) | Analysis ≥100 particles, magnification 5000-150000 times |
| Metal wear dust | Enzyme digestion (papain) | TEM (80kV)/SEM | Analyze 150-300 particles and classify by aspect ratio |
| Ceramic wear chips | Hydrochloric acid digestion method (to be verified) | EDXA composition analysis | Note acid resistance test |
Key points for implementation of the standard
Typical application scenarios
In hip prosthesis revision surgery, when using an ultrasonic cell crusher (3.3.20) to process tissue samples, attention should be paid to possible contamination caused by the titanium probe. It is recommended to perform three buffer washes (step g) in accordance with clause 4.3, with a centrifugal force of 16000g to ensure the purity of the metal wear chips.
Key equipment requirements
- Centrifuge: must have 100000g ultracentrifugation capacity (4.2.2.3)
- Filter membrane system: equipped with 0.015μm polycarbonate membrane (3.3.14)
- Electron microscope: SEM requires EDXA module, TEM slice thickness 100-120nm (4.4.2)
Technology evolution analysis
This standard is equivalent to ISO 17853:2011, and the main technological breakthroughs are reflected in:
- Establish a standardized collection process for nano-scale grinding chips (<0.1μm)
- Introduce density gradient centrifugation (ρ=1.02-1.35g/cm³ sucrose solution) to improve separation accuracy
- Standardize the TEM/SEM dual-track verification mechanism (4.5.2)
Solutions to common problems
| Problem phenomenon | Possible cause | Solution measures |
|---|---|---|
| Filter membrane is blocked | Grinding dust concentration is too high | Dilution is 1:10~1:100 as required by 4.4.1 |
| SEM image is blurred | Conductive layer is too thick | Control the gold spraying thickness to 3-5nm (4.5.1) |
| Metal particle oxidation | Exposure to air | Use nitrogen protection throughout the process (4.3 Note 2) |

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