GB/T 14849.4-2008 in English

SUPERSEDED

for chemical analysis of silicon metal - Part 4: Determination of elements content Inductively coupled plasma atomic emission spectrometric method

Issued on:2008-06-09
Implemented on:2008-12-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $60.00
$59.00

Standard No:	GB/T 14849.4-2008
Document status:	SUPERSEDED
Superseded by:	GB/T 14849.4-2014 Methods for chemical analysis of silicon metal - Part 4:Determination of impurity contents - Inductively coupled plasma atomic emission spectrometric method
Superseded on:	2015-08-01
Title in English:	for chemical analysis of silicon metal - Part 4: Determination of elements content Inductively coupled plasma atomic emission spectrometric method
Title in Chinese:	工业硅化学分析方法第4部分：电感耦合等离子体原子发射光谱法测定素含量
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2008-06-09
Implemented on:	2008-12-01
ICS Classification:	77.120.10-Aluminium and aluminium alloys
Chinese Classification:	H17-Semimetal and semiconductor material analysis method
Professional Classification:	GB-National Standard
Related Keywords:	determination method spectrometric method scopethis part silicon metal determination range nickel content
Related Topics:	Atomic Emission Spectroscopy Plasma Atomic Emission Spectroscopy inductive coupling Silicon analysis inductive coupling Silicon analysis Inductively Coupled Plasma Industrial silicon chemical analysis methods Atomic Emission Spectroscopy Inductively Coupled Plasma Atomic Emission Spectroscopy Atomization and plasmaization, plasma atom Determination method of silicon element Elemental Analysis Silicon Spectrum Elemental Analysis + Silicon Determination method of silicon element Coupled inductor Bromine content analysis method Inductive coupling+ atomic coupling GB/T14849.4-2014 gb/t14849.4 Elemental Analysis Ions Chemical analysis of silicon element Element Molecular Weight Spectroscopic analysis of silicon content Secondary Electronic Elemental Analysis Atomic Ratio in Elemental Analysis Chemical analysis of silicon element Inductively Coupled Plasma Optical Radiation Spectroscopy Inductive coupling standard Inductively Coupled Plasma Atomic Emission Spectrometry Determination of Seven Trace Elements in Water by Inductively Coupled Plasma-Atomic Emission Spectrometry Determination method of silicon element Elemental silicon determination method Element Ion Quantitative Analysis Determination of multi-element content in stainless steel by inductively coupled plasma atomic emission spectrometry Elemental Analysis Silicon Determination of Silicon by Spectroscopic Analysis Plasma spectroscopic elemental analysis atomic silicon atomic element Atomic Ratio Elemental Analysis Element Elemental Analysis and Ion Analysis Coupled inductor Quantitative analysis of ions Measure element content coupled plasma Atomic element content Plasma Atomic Emission Spectroscopy Ion Elemental Analysis Silicon analysis method Spectral quantitative analysis of 51 elements Plasma silicon Atomic Aluminum Method Plasma silicon Inductively Coupled Plasma-Atomic Emission Spectroscopy Spectroscopy and Chemical Elements Elemental Analysis Silicon atomic test element atomic weight element Elemental Analysis and Content Determination Methods Inductively Coupled Plasma Atoms Elemental Analysis Atomic Ratio Atomic Ratio in Elemental Analysis Ion Quantitative Analysis plasma processing method Silicon analysis Coupled atoms Elemental Analysis Determination of Silicon Determination of element content by atomic spectroscopy Ion Elemental Analysis Determination method of silicon element Chemical meta-analysis inductive plasma atoms silicon atom Ion Chromatography and Elemental Analysis Atomic weight of zirconium element molecular weight element Element Molecular Weight Determination of wear metal content in aviation working fluids Part 2: Inductively coupled plasma atomic emission spectrometer detection method GBT14849.4 GB/T 14849.4-2008 GB/T 14849.4-2014 Explain the development of electrochemical methods in separation Methods for detecting chemical element content Chemical element detection methods Ion detection electrochemical method Methods for isolating protozoa Chemical separation methods

《GB/T 14849.4-2008工业硅化学分析方法第4部分：电感耦合等离子体原子发射光谱法测定元素含量》由TC243（全国有色金属标准化技术委员会）归口，TC243SC1（全国有色金属标准化技术委员会轻金属分会）执行，主管部门为中国有色金属工业协会。
GB/T 14849《工业硅化学分析方法》分为四部分，本部分为第４部分。本部分规定了工业硅中铁、铝、钙、钛、锰、镍含量的测定方法。本部分也适用于以上其含量的测定。

Scope

This part specifies the determination method of iron, aluminum, calcium, titanium manganese and nickel content in industrial silicon. This part is applicable to the determination of iron, aluminum, calcium, titanium manganese and nickel content in industrial silicon. The determination range is shown in Table 1.

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