GB/T 16879-1997 in English
VALIDGuidelines for precision and accuracy expression for mask writing equipment
- Issued on:1997-06-20
- Implemented on:1998-03-01
- File Format:PDF
- Delivery:Via email within 1~3 business days
$117.00
《GB/T 16879-1997掩模曝光系统精密度和准确度的表示准则》由TC203(全国半导体设备和材料标准化技术委员会)归口,主管部门为国家标准化管理委员会。
本准则规定了在表示掩模曝光设备的精密度和准确度时应遵循的一般要求。掩模曝光设备的图形曝光精密度和准确度是通过测量制成的掩模来评估的,掩膜制造过程中的工艺条件对它有很大影响。所以,曝光条件应经厂家和用户双方同意。
Scope
This guideline specifies general requirements to be followed in expressing the precision and accuracy of mask exposure equipment. The pattern exposure precision and accuracy of mask exposure equipment is evaluated by measuring the fabricated mask, and the process conditions in the mask manufacturing process have a great influence on it. Therefore, the exposure conditions should be agreed by both the manufacturer and the user.

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