cover up

cover up, Total:70 items.

The international standard classification for "cover up" includes: Integrated circuits. Microelectronics , Electronic components in general , Public information symbols , Glass products .

The Chinese standard classification for "cover up" includes: Electronic industry production equipment in general , Dedicated processing equipment , Technical management , Technical management , Terms and Symbols , Quartz glass .

General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China

GB/T 16879-1997 Guidelines for precision and accuracy expression for mask writing equipment
GB/T 15870-1995 Chrome thin films for hard surface photomasks
GB/T 16524-1996 Specification for registration marks for photomasks
GB/T 15871-1995 Hard surface photomask substrates
GB/T 16880-1997 Guidelines for photomask defect classification and size definition

Professional Standard - Electron

SJ/T 10584-1994 Terms of photomasking technology for microelectronics
SJ/T 31120-1994 Requirements of readiness and methods of inspection and assessment for KSM-MJB3 mask alignment and exposure systems
SJ/T 11079-1996 General specification for mask alignment and exposure system
SJ/T 31119-1994 Requirements of Readiness and Methods of Inspection and Assessment for Mask Alignment and Exposure Systems
SJ/T 11516-2015 Specification for thin film transistor (TFT) mask
SJ/T 31121-1994 Requirements of readiness and methods of inspection and assessment for JB-VII mask alignment and exposure systems
SJ/T 10274-1991 Test methods of mask alignment and exposure system

国家市场监督管理总局、中国国家标准化管理委员会

GB/T 38605-2020 Emergency guidance systems—Graphical symbols for evacuation and shelter

Taiwan Provincial Standard of the People's Republic of China

CNS 12493-1989 High Density Polyethylene Geomembrane for Sanitary Landfill
CNS 12843-1991 Chlorosulfonated Polyethylene Rubber Supported Geomembrane for Landfill

中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会

GB/T 34178-2017 Silica glass substrates for photomask

Association of German Mechanical Engineers

VDI/VDE 3717 Blatt 10-1993 Mask engineering; masks for integrated optics
VDI/VDE 3717 Blatt 6-1999 Mask engineering - Pellicles
VDI/VDE 3717 Blatt 2-1987 Mask engineering; substrates
VDI/VDE 3717 Blatt 3-1988 Mask engineering; layers
VDI/VDE 3717 Blatt 5-1988 Mask engineering; blank defects

CZ-CSN

CSN 83 8034-2000 Waste Landfilling - Degasification of Landfills
CSN 83 8033-2002 Landfilling of waste - Handling of percolation water from landfills
CSN 83 8035-1998 Waste landfilling - Covering and reclamation of landfills
CSN 35 8971 Cast.1-1984 Semiconductor devices. Substrates for masks and masks. Nomenclature and definitions
CSN 83 8030-2002 Waste landfilling - Basic conditíons for design and construction of landlills
CSN 35 8971-1984 Semiconductors devices. Substrates for masks and masks. Measuring methods of characteristic parameters

U.S. Military Regulations and Norms

ARMY MIL-S-70440-1983 SUPPORT, COVER
ARMY MIL-S-70440 NOTICE 1-1997 SUPPORT, COVER
ARMY MIL-S-70440 (2)-1987 SUPPORT, COVER
ARMY MIL-C-52765 E NOTICE 1-1997 CAMOUFLAGE SCREENING SUPPORT SYSTEM
ARMY MIL-S-44196 A-1991 SHELTER, TACTICAL, NON-EXPANDABLE
ARMY MIL-S-44196 A NOTICE 1-1998 SHELTER, TACTICAL, NON-EXPANDABLE
ARMY MIL-S-44195 A NOTICE 1-1998 SHELTER, TACTICAL, EXPANDABLE, TWO-SIDE
ARMY MIL-S-44195 A-1991 SHELTER, TACTICAL, EXPANDABLE, TWO-SIDE

Institute of Interconnecting and Packaging Electronic Circuits (IPC)

IPC PE-740A SECTION 3-1997 Phototooling
IPC MI-660 5.5-1984 Dry Film Solder Mask
IPC MI-660 5.4-1984 Liquid Photo Solder Mask
IPC MI-660 5.6-1984 Screened-Liquid Solder Mask

GOST

GOST R 71024-2023 Masked plates for photomasks. Terms and definitions

SCC

MIL MIL-S-70440-1983 SUPPORT, COVER
MIL MIL-C-44358A-1991 COVER, INDIVIDUAL, CAMOUFLAGE (SUPERSEDING MIL-C-44358)

Society of Automotive Engineers (SAE)

SAE AMS2429-2011 BRONZE PLATE MASKING

RO-ASRO

STAS 3128-1980 Boiler plants MASKING PLATE

United States Navy

NAVY MIL-S-29412 C NOTICE 1-1998 SHELTER, COMPLEXING KIT FOR
NAVY MIL-C-18491 A NOTICE 2-1997 CURTAIN, FLAK PROTECTIVE
NAVY MIL-S-29412 C-1994 SHELTER, COMPLEXING KIT FOR
NAVY MIL-C-18491 A VALID NOTICE 1-1991 CURTAIN, FLAK PROTECTIVE
NAVY MIL-S-29413 B NOTICE 1-1998 SHELTER, JOINING CORRIDOR FOR
NAVY MIL-S-29409 B NOTICE 1-1998 SHELTER ASSEMBLY, KNOCKDOWN
NAVY MIL-C-18491 A-1969 CURTAIN, FLAK PROTECTIVE
NAVY MIL-S-29409 B-1994 SHELTER ASSEMBLY, KNOCKDOWN
NAVY MIL-C-18491 A (1)-1981 CURTAIN, FLAK PROTECTIVE
NAVY MIL-S-29413 B-1988 SHELTER, JOINING CORRIDOR FOR
NAVY QPL-24613-QPD-2012 Deck Covering Materials, Interior, Cosmetic Polymeric
NAVY QPL-24613-2012 Deck Covering Materials, Interior, Cosmetic Polymeric

VDI - Verein Deutscher Ingenieure

VDI/VDE 3717 Blatt 4-1997 Mask engineering - Pattern

GM North America

GM 9984160-1990 Coating, Sprayable Masking
GM 9985438-1989 Adhesive, Tape, Paper, Masking
GM 9985256-1989 Adhesive, Tape, Masking
GM 9985025-1989 Adhesive, Tape, Masking
GM 9985540-1989 Adhesive, Tape, Paper, Masking - Black

RU-GOST R

GOST R 54849-2011 Protective solder mask for printed circuit boards. General specifications

US-FCR

FCR FED FCGS 16775-1980 BACKGROUND SOUND MASKING SYSTEM

Semiconductor Equipment and Materials International (SEMI)

SEMI E117-1104 (Reapproved 0710)-2010 SPECIFICATION FOR RETICLE LOAD PORT

SE-SIS

SIS 16 00 10 hos pigment

American Society for Testing and Materials (ASTM)

ASTM RR-E29-1000 1991 E1458-Standard Test Method for Calibration Verification of Laser Diffraction Particle Sizing Instruments Using Photomask Reticles
ASTM E1975-21 Standard Specification for Shelter, Electrical, Equipment S-280/G

British Standards Institution (BSI)

BS 9295:2010 Guide to the structural design of buried pipelines

Danish Standards Foundation

DS/EN 28 798:1993 Acoustics - Reference levels for narrow-band masking noise

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