mask lithography

mask lithography, Total:14 items.

The international standard classification for "mask lithography" includes: .

The Chinese standard classification for "mask lithography" includes: Dedicated processing equipment , Technical management .

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Group Standards of the People's Republic of China

• T/QGCML 1154-2023 Colorful reflective lettering film
• T/ZS 0344-2022 Digital maskless laser direct imaging lithography machine

General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China

• GB/T 15870-1995 Chrome thin films for hard surface photomasks

Professional Standard - Electron

• SJ/T 11079-1996 General specification for mask alignment and exposure system

German Institute for Standardization

• DIN 32566:2007 Production equipment for microsystems - Specification for an X-Ray Lithography Mask Support Ring
• DIN 32566:2007-12 Production equipment for microsystems - Specification for an X-Ray Lithography Mask Support Ring

British Standards Institution (BSI)

• BS EN 187105:2002 Single mode optical cable (duct/direct buried installation)

CZ-CSN

• CSN 35 8971 Cast.1-1984 Semiconductor devices. Substrates for masks and masks. Nomenclature and definitions
• CSN 35 8971-1984 Semiconductors devices. Substrates for masks and masks. Measuring methods of characteristic parameters

Association of German Mechanical Engineers

• VDI/VDE 3717 Blatt 6-1999 Mask engineering - Pellicles
• VDI/VDE 3717 Blatt 10-1993 Mask engineering; masks for integrated optics

Institute of Interconnecting and Packaging Electronic Circuits (IPC)

• IPC MI-660 5.5-1984 Dry Film Solder Mask

RU-GOST R

• GOST 27716-1988 Masks for printed boards. General specifications

GM North America

• GM 9985438-1989 Adhesive, Tape, Paper, Masking

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