GB/T 38866-2020 in English
VALIDDichlorosilane for electronic industry
- Issued on:2020-07-21
- Implemented on:2021-02-01
- File Format:PDF
- Delivery:Via email within 1~3 business days
$214.00
| Standard No: | GB/T 38866-2020 |
| Document status: | VALID |
| Title in English: | Dichlorosilane for electronic industry |
| Title in Chinese: | 电子工业用二氯硅烷 |
| Language: | English |
| File Format: | Electronic (PDF) |
| Delivery: | Via email within 1~3 business days |
| Issued on: | 2020-07-21 |
| Implemented on: | 2021-02-01 |
| ICS Classification: | 71.100.20-Gases for industrial application |
| Professional Classification: | GB-National Standard |
| Related Topics: | Silane
Silane Standard Silane method Silane Standard Silicon in silane electronics industry bottled silane electronics industry Silane volatilization Disilylation Chlorosilane two-electron path GBT38866 GB/T 38866-2020 industrial silicon moisture Silane calibration Industrial silicon related Silane compressor Method for purifying industrial dichloroethane Silane reference |
《GB/T 38866-2020电子工业用二氯硅烷》由TC203（全国半导体设备和材料标准化技术委员会）归口，TC203SC1（全国半导体设备和材料标准化技术委员会气体分会）执行，主管部门为国家标准化管理委员会。
Introduction
Core Technical Requirements of the Standard
| Indicator Category | Key Parameters | Limit Requirements |
|---|---|---|
| Purity Index | Dichlorosilane Purity | ≥99.99% |
| Silicon Tetrachloride (SiCl4) | ≤25ppm | |
| Trichlorosilane (SiHCl3) | ≤10ppm | |
| Metal Impurities | Boron + Aluminum (B+Al) | ≤0.1μg/kg |
| Phosphorus + Arsenic (P+As) | ≤0.3μg/kg | |
| Iron (Fe) | ≤5μg/kg | |
| Sodium (Na) | ≤1μg/kg | |
| Copper (Cu) | ≤0.1μg/kg |
Technological Evolution and Standard Background
This standard is for dichlorosilane prepared by the disproportionation method. Compared with the early industrial-grade standards:
- The control of metal impurities has been improved from ppm level to ppb level
- Added limit requirements for 12 trace elements
- Using inductively coupled plasma mass spectrometer to replace traditional atomic absorption method
Key points of detection method
Gas chromatography analysis
Using Hayesep Q chromatographic column to separate SiCl4, SiHCl3 and other components, the detection limit is 0.1ppm
ICP-MS metal analysis
The sample is evaporated and concentrated by a special pretreatment device (Figure 1), and detected by high-purity argon plasma. Key steps:
- Volatilize the main components at 50℃
- Hydrofluoric acid-nitric acid mixed digestion
- Fix to volume with 2% nitric acid and then test on the machine
Implementation Suggestions
| Links | Key Control Points |
|---|---|
| Packaging and Transportation | Use DISS636 interface cylinders, filling factor ≤1.08kg/L |
| Storage Management | Keep in a cool and ventilated environment, shelf life no more than 18 months |
| Safety Protection | Equipped with hydrofluoric acid leakage emergency treatment equipment, operators must wear self-priming gas masks |
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