GB/T 38867-2020 in English
VALIDSilicon tetrachloride for electronic industry
- Issued on:2020-07-21
- Implemented on:2021-02-01
- File Format:PDF
- Delivery:Via email within 1~3 business days
$204.00
《GB/T 38867-2020电子工业用四氯化硅》由TC203（全国半导体设备和材料标准化技术委员会）归口，TC203SC1（全国半导体设备和材料标准化技术委员会气体分会）执行，主管部门为国家标准化管理委员会。
Introduction
Analysis of the core technical requirements of the standard
| Test items | Optical fiber indicators | Semiconductor indicators | Test methods |
|---|---|---|---|
| SiCl4Purity | ≥99.9% | ≥99.99% | Gas chromatography |
| Total amount of metal impurities | ≤1.00μg/kg | ≤0.50μg/kg | ICP-MS |
| Infrared transmittance | 3666cm-1≥98% | Not applicable | FTIR |
Detailed explanation of key technical indicators
The standard innovatively adopts a graded control model: the metal impurity requirements for silicon tetrachloride for semiconductors are 50% stricter than those for optical fibers, where (B+Al)≤0.1μg/kg and (P+As)≤0.3μg/kg. Purity detection is calculated by formula (1): φ=100-(φ1+φ2+φ3)×10-4, and helium ionization gas chromatography (GB/T28726) is required.
Breakthrough in detection method
Metal impurities are detected using inductively coupled plasma mass spectrometry (ICP-MS): After the sample is evaporated and concentrated by the pretreatment device shown in Figure 1, the residue is dissolved with 2% nitric acid in a Class 1000 ultra-clean environment. Critical control points include:
- Blank value control: All utensils need to be soaked in nitric acid for 12 hours
- Recovery rate verification: 75%-125%
- Precision requirement: RSD＜20%
Standard implementation suggestions
1. Use stainless steel welded gas cylinders (GB/T32566) for packaging and perform internal surface treatment
2. The sampling process strictly follows the moisture-proof requirements of GB/T6680
3. Establish an exhaust gas treatment system to prevent SiCl4 hydrolysis contamination
4. The relative humidity of the storage environment should be <45%
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