GB/T 44390-2024 in English
VALIDPrint display—Measuring method of film uniformity
- Issued on:2024-08-23
- Implemented on:2025-03-01
- File Format:PDF
- Delivery:Via email within 5 business days
$301.00
《GB/T 44390-2024打印显示 薄膜均匀性测试方法》由TC203(全国半导体设备和材料标准化技术委员会)归口,主管部门为国家标准委。
Introduction
Interpretation of GB/T 44390—2024 National Standard of the People's Republic of China
1. Background and significance of standard formulation
With the rapid development of display technology, the uniformity of printed display films has become an important indicator for evaluating the quality of display products. This standard aims to standardize the film thickness measurement method, ensure the consistency and reliability of the test results, and provide technical support for the semiconductor equipment and materials industry.
2. Comparison of standard frameworks
| Test method | Technical principle | Scope of application | Advantages and disadvantages analysis |
|---|---|---|---|
| Step meter method | Scan the surface topography with a probe to measure the change in film thickness. | Suitable for testing thin films with a thickness range of $5\mathrm{nm}\sim10^{5}\mathrm{nm}$. | Advantages:High precision and good repeatability; Disadvantages:Complex operation and requires high professional skills. |
| White light interferometer method | Measures the distribution of thin film thickness using the principle of optical interference. | Suitable for high-precision, large-area thin film uniformity testing. | Advantages:Non-contact, fast; Disadvantages:Sensitive to the surface state of the sample. |
3. Implementation Suggestions
Case Analysis: Test Selection in Actual Application Scenarios
- For small batch R&D samples, it is recommended to use the step meter method for precise measurement.
- In the mass production stage, it is recommended to use the white light interferometer method to improve efficiency and coverage.
- For special materials or complex structures, the two methods can be combined for joint testing.
4. Technology Evolution Analysis
From traditional contact measurement to modern optical interferometry technology, thin film uniformity test methods have undergone significant technological progress. In the future, with the development of artificial intelligence and automation technology, test equipment will be more intelligent, realizing unmanned operation and real-time quality monitoring.

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