GB/T 44928-2024 in English
VALIDTerms of microlithography technology for microelectronics
- Issued on:2024-12-31
- Implemented on:2024-12-31
- File Format:PDF
- Delivery:Via email within 10 business days
$3,129.00
《GB/T 44928-2024微电子学微光刻技术术语》由TC203（全国半导体设备和材料标准化技术委员会）归口，TC203SC4（全国半导体设备和材料标准化技术委员会微光刻分会）执行，主管部门为国家标准委。
Introduction
GB/T 44928—2024
Terms of micro lithography technology for microelectronics
This document defines terms related to microelectronic lithography technology, advanced lithography technology, microlithography patternization and graphic data processing technology, micro刻感光材料、铬板与基板材料，光掩模技术，光刻工艺（曝光、蚀刻与微纳米加工）技术，电子束掩模制造与直写技术，光刻及掩模质量参数测量和评定，掩模制造设备和微光刻设备等术语 and definitions. It is applicable to teaching, research, production, application, trade, and technical exchanges in the field of microelectronic lithography technology.
Loading PDF document...
Error loading PDF. Please make sure the file is valid and try again.
We also recommend
-
GB/T 6426-2025 in English
Quasi-static test method for ferroelectric hysteresis loop in ferroelectric ceramics
2025-08-29 -
GB/T 45505.4-2025 in English
Test methods of flat panel display glass substrate—Part 4：Mechanical properties
2025-04-25 -
GB/T 46379-2025 in English
Bismaleimide triazine (BT) base material for integrated circuit (IC) package
2025-10-31 -
GB/T 37946.2-2025 in English
Test method for organic luminescence material—Part 2: Thermal property
2025-08-01 -
GB/T 46177-2025 in English
Polarizer for organic light emitting displays
2025-10-05 -
GB/T 46698-2025 in English
Electronic grade titanium tetrachloride
2025-10-31 -
GB/T 45505.1-2025 in English
Test method of flat panel display glass substrate—Part 1: Appearance and geometric dimensions
2025-08-01
