YS/T 1158.1-2016 in English

VALID

Methods for chemical analysis of copper-indium-gallium-selenide target—Part 1:Determination of gallium,indium contents—Inductively coupled plasma atomic emission spectrometry

Issued on:2016-07-11
Implemented on:2017-01-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $100.00
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Standard No:	YS/T 1158.1-2016
Document status:	VALID
Title in English:	Methods for chemical analysis of copper-indium-gallium-selenide target—Part 1:Determination of gallium,indium contents—Inductively coupled plasma atomic emission spectrometry
Title in Chinese:	铜铟镓硒靶材化学分析方法第1部分：镓量和铟量的测定电感耦合等离子体原子发射光谱法
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2016-07-11
Implemented on:	2017-01-01
ICS Classification:	77.120.30-Copper and copper alloys
Chinese Classification:	H13-Heavy metals and their alloys analysis method
Professional Classification:	YS-Non-ferrous Metal
Related Keywords:	chemical analysis methods copper indium gallium chemical analysis indium contents plasma atomic emission spectrometry introductionthis standard
Related Topics:	gallium selenide Indium ion determination Molecular mass of indium Indium Molecular Weight InGaAs Composition InGaZnO InGaAs Composition gallium reading Ion Quantitative Analysis Preparation of InGa Alloy Gallium ion titration Indium emission indium constant gallium selenide Quantitative analysis of ions gallium quantum dots Indium by gravimetric method Select copper target and molybdenum target respectively Gallium volatilization Argon ion copper target Indium Electrolyte Analysis Indium Electrolyte Analysis Argon ion+copper target Gallium hydrate ion Indium Molecular Weight Gallium Indium Alloy Sensor Integrating sphere InGa The relative molecular mass of indium Ion Quantitative Analysis Gallium ion source Indium ion reaction Does gallium react with copper? Reflection Spectrum of Indium Indium reflection spectrum Indium Atomic Emission Spectroscopy Gallium Selenide Fluorescence Gallium Ion Source Gallium ion source Atomization of copper ions Indium single atom Molecular weight of indium oxide gallium plasma Adsorbed gallium ions Protoplast isolation method university textbook ys/t+1145-2016 Analysis method of gallium solution InGaP

本部分规定了铜铟镓硒靶材中镓量和铟量的测定方法。本部分适用于铜铟镓硒靶材中镓量和铟量的测定。测定范围：镓1.00 %~13.00%，铟 10.00 %~30.00 %。本部分所有称重结果单位为g,并精确至0.0001g 。

Introduction

This standard outlines the chemical analysis methods for determining the content of gallium and indium in copper indium gallium selenide targets. It specifies the procedure using inductively coupled plasma atomic emission spectroscopy. The method provides a systematic approach for the quantitative analysis of these elements, ensuring consistency and accuracy in the measurement process. The standard covers the preparation of samples, calibration of instruments, and the execution of analytical procedures. It also includes guidelines for data interpretation and reporting. The content is structured to support laboratories in achieving reliable and reproducible results. The standard is applicable to the quality control and research activities related to the production of copper indium gallium selenide targets.

*** Please note: This description may not be accurate, please refer to the official documentation.

More samples: JC/T 2453-2018 DL/T 368-2010 JJG 21-2008

Sample only — not a preview of YS/T 1158.1-2016

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