YS/T 839-2012 in English

VALID

Test Method for Measurement of Insulator Thickness and Refractive Index on Silicon Substrates by Ellipsometry

Issued on:2012-11-07
Implemented on:2013-03-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $180.00
$175.00

Standard No:	YS/T 839-2012
Document status:	VALID
Title in English:	Test Method for Measurement of Insulator Thickness and Refractive Index on Silicon Substrates by Ellipsometry
Title in Chinese:	硅衬底上绝缘体薄膜厚度及折射率的椭圆偏振测试方法
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2012-11-07
Implemented on:	2013-03-01
ICS Classification:	77.120.99-Other non-ferrous metals and their alloys
Chinese Classification:	H68-Precious metals and their alloys
Professional Classification:	YS-Non-ferrous Metal
Related Keywords:	test method refractive index insulator thickness silicon substrates ellipsometry scopethis method
Related Topics:	Substrate membrane thickness Refractive index membrane thickness insulator Test method for film thickness ys/t836-2012 ys/t 745.9-2012 Ellipsometer thickness Ellipsometer test method Two methods of ellipsometer film thickness film thickness Film Thickness Measurement Elliptical Polarization Measurement Method for Insulator Film Thickness and Refractive Index on Silicon Substrate ys/t+3017-2012 Ellipse frequency insulating substrate Measuring Film Thickness Ellipsometer method Elliptical polarization Polarization ellipsoid Polarization + Diffraction + thin film substrate silicon substrate Ellipticity silicon substrate Ellipticity method ys/t798-2012 semi-insulating substrate Polarization Ellipticity "Insulator substrate film Fsgs basement membrane thinning Film thickness test on silicon substrate Polarization degree test method Silicon carbide substrate thickness Elliptical film thickness Test method for silane film weight ys/t 789 2012 ys/t817-2012 ys/t789-2012 ys/t858-2012 ys/t 839-2012

本方法规定了用椭圆偏振测试方法测量生长或沉积在硅衬底上的绝缘体薄膜厚度及折射率的方法。
本方法适用于薄膜对测试波长没有吸收和衬底对测试波长处不透光、且已知测试波长处衬底折射率和消光系数的绝缘体薄膜厚度及折射率的测量。对于非绝缘体薄膜，满足一定条件时,方可采用本方法。

Scope

This method specifies the method for measuring the thickness and refractive index of insulator films grown or deposited on silicon substrates using elliptical polarization testing. This method is suitable for measuring the thickness and refractive index of insulator films where the film has no absorption of the test wavelength and the substrate is opaque to the test wavelength, and the refractive index and extinction coefficient of the substrate at the test wavelength are known. For non-insulating films, this method can be used only when certain conditions are met.

More samples: JC/T 2453-2018 GB 50021-2001(2009) DL/T 368-2010

Sample only — not a preview of YS/T 839-2012

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