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chemical analysis-sputter depth profiling-optimization reference materials scopein order multi-layer film system reference materials depth resolution depth analysis technical paper carbonless copy paper wind turbine generator system rotor centrifugal stability
GB/T 20175-2006 in English

GB/T 20175-2006 in English

SUPERSEDED

Surface chemical analysis-Sputter depth profiling-Optimization using layered systems as reference materials

  • Issued on:2006-03-27
  • Implemented on:2006-11-01
  • File Format:PDF
  • Delivery:Via email within 1~3 business days
Price(USD): $190.00
$185.00
Standard No: GB/T 20175-2006
Document status: SUPERSEDED
Superseded by: GB/T 20175-2025 Surface chemical analysis—Sputter depth profiling—Optimization using layered systems as reference materials
Superseded on: 2026-01-01
Title in English: Surface chemical analysis-Sputter depth profiling-Optimization using layered systems as reference materials
Title in Chinese: 表面化学分析 溅射深度剖析 用层状膜系为参考物质的优化方法
Language: English
File Format: Electronic (PDF)
Delivery: Via email within 1~3 business days
Issued on: 2006-03-27
Implemented on: 2006-11-01
ICS Classification: 71.040.40-Chemical analysis
Chinese Classification: N33-Electron optics and other physical optics instrument
Professional Classification: GB-National Standard
Related Keywords: chemical analysis-sputter depth profiling-optimization
reference materials scopein order
multi-layer film system reference materials
depth resolution
depth analysis
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《GB/T 20175-2006表面化学分析 溅射深度剖析 用层状膜系为参考物质的优化方法》由TC38(全国微束分析标准化技术委员会)归口,TC38SC2(全国微束分析标准化技术委员会表面化学分析分会)执行,主管部门为国家标准化管理委员会。
本标准采用适当的单层和多层膜系参考物质,提供优化溅射深度剖析参数的指南。


Scope

In order to optimize the instrument settings of Auger Electron Spectroscopy, X-ray Photoelectron Spectroscopy and Secondary Ion Mass Spectrometry to achieve depth resolution, this standard uses appropriate single-layer and multi-layer film system reference materials to provide optimized sputtering depth analysis. A guide to parameters. The use of special multilayer systems (such as various doped layer systems) is not covered by this standard.

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