GB/T 34893-2017 in English
VALIDMicro-electromechanical system technology-Measuring method for in-plane length measurements of MEMS microstructures using an optical interferometer
- Issued on:2017-11-01
- Implemented on:2018-05-01
- File Format:PDF
- Delivery:Via email within 1~3 business days
$156.00
《GB/T 34893-2017微机电系统（MEMS）技术 基于光学干涉的MEMS微结构面内长度测量方法》由TC336（全国微机电技术标准化技术委员会）归口，主管部门为国家标准化管理委员会。
Introduction
1. Background and significance of standard formulation
With the rapid development of micro-electromechanical systems (MEMS) technology, the demand for high-precision measurement of MEMS microstructures is growing. Optical interference microscopes have become an important tool for evaluating MEMS microgeometry due to their non-contact and high-resolution characteristics. This standard aims to standardize the in-plane length measurement method based on optical interference technology to ensure the accuracy and consistency of the measurement results.
2. Comparison of standard frameworks
| Standard dimensions | GB/T 34893—2017 | International advanced level |
|---|---|---|
| Measurement principle | Acquire surface morphology based on optical interference microscopy | Use phase shift interferometry, white light scanning interferometry and other technologies |
| Scope of application | MEMS structure with a reflectivity of not less than 4% and a width-to-depth ratio of more than 1:10 | Applicable to high-precision micron-level measurement |
| Measurement accuracy | Resolution ≥1nm, repeatability error ≤5% | Internationally leading level, supporting sub-nanometer measurement |
3. Technology evolution and application cases
Technology evolution analysis:From early mechanical measurement to modern optical interference technology, MEMS microstructure measurement technology has undergone a major transformation from contact to non-contact. The introduction of optical interference microscopes has significantly improved measurement accuracy and efficiency, while reducing the risk of damage to the sample surface.
Actual application case:A MEMS gyroscope manufacturer uses this standard to measure the in-plane length of microstructures. By selecting a microscope objective with a suitable magnification and combining it with optical interference technology, the measurement error is successfully controlled within 2%, significantly improving product quality.
4. Implementation Suggestions
Equipment Selection:Optical interference microscopes with high resolution and wide measurement range should be selected first, and their imaging magnification factors should be calibrated.
Operation Specifications:Measure strictly in accordance with the measurement environment conditions specified in the standard (temperature 15~35°C, humidity 20%~80%, atmospheric pressure 86kPa~106kPa), and ensure that there are no obvious defective areas on the sample surface.
Data Processing:It is recommended to use professional software to analyze the acquired three-dimensional surface morphology data, and calculate the in-plane length in combination with the standard formula, and correct the angle error to improve the measurement accuracy.
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