GB/T 39516-2020 in English
VALIDMicro nano standard samples (geometric)
- Issued on:2020-11-19
- Implemented on:2021-06-01
- File Format:PDF
- Delivery:Via email within 5 business days
$301.00
《GB/T 39516-2020微纳米标准样板（几何量）》由TC132（全国量具量仪标准化技术委员会）归口，主管部门为中国机械工业联合会。
Introduction
Analysis of the core content of the standard
| Parameter type | Measurement range | Allowance deviation | Uniformity requirement |
|---|---|---|---|
| Line spacing | 0.05-10μm | ±(1-5%) | 1-5% |
| Step height | 0.01-100μm | ±(1-10%) | 1-5% |
| Line spacing | 0.05-10μm | ±(1-10%) | 1-5% | 2-1000nm | ±(1-15%) | 0.5-10% |
| Linewidth | 25-1000nm | ±(1-5%) | 1-5% |
Key Technical Requirements
1. Standard sample for line spacing
For 0.05μm line spacing sample: deviation ≤±5%, line edge roughness ≤5nm, 10 cycles of data need to be measured in a 100μm×100μm effective area using a scanning electron microscope.
2. Step height standard sample
Steps below 1μm must use a boss structure, 9 measurement positions including the center line and 4 parallel lines on both sides need to be selected during measurement, and an atomic force microscope is used to scan the step profile.
3. Film thickness standard sample
The center 10mm diameter area is the effective area, uniformity detection requires measurement of 5 points (center + surrounding), 2nm film allows ±15% deviation, and 1000nm film deviation is tightened to ±1%.
4. Line width standard sample
25nm line width The sample needs to evenly select 9 measurement positions in the 10μm×10μm area, and the edge roughness effect (≤5nm) needs to be considered when measuring with a scanning electron microscope.
Implementation points
- Testing environment requirements: temperature 20±2℃, humidity ≤80%, cleanliness ISO6 level
- All samples must be marked with the manufacturer, product number and nominal value
- Transportation process needs to be shockproof and moisture-proof, and the storage environment should be kept clean
- Periodic calibration is recommended every 6 months
Standard evolution background
This standard fills the gap in the field of micro-nano geometric measurement standard materials in my country, and for the first time systematically standardizes the metrological characteristics of four typical micro-nano structures. Compared with ISO/TC201 standards, the technical indicators such as line edge roughness (≤5nm) and uniformity (≤1%) have reached the international advanced level.
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