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tetrafluoromethane electronic gas standard overview electronic gas tetrafluoromethane introduction gb/t electronic grade tetrafluoromethane important electronic gas indicators items requirements tetrafluoromethane purity air & flue system material selection specifications hierarchical material requirements structure components introduction background
GB/T 43976-2024 in English

GB/T 43976-2024 in English

VALID

Electronic gas—Tetrafluoromethane

  • Issued on:2024-04-25
  • Implemented on:2024-11-01
  • File Format:PDF
  • Delivery:Via email within 1~3 business days
Price(USD): $250.00
$243.00
Standard No: GB/T 43976-2024
Document status: VALID
Title in English: Electronic gas—Tetrafluoromethane
Title in Chinese: 电子气体 四氟甲烷
Language: English
File Format: Electronic (PDF)
Delivery: Via email within 1~3 business days
Issued on: 2024-04-25
Implemented on: 2024-11-01
Professional Classification: GB-National Standard
Related Keywords: tetrafluoromethane electronic gas standard overview
electronic gas tetrafluoromethane introduction gb/t
electronic grade tetrafluoromethane
important electronic gas
indicators items requirements tetrafluoromethane purity
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《GB/T 43976-2024电子气体 四氟甲烷》由TC203(全国半导体设备和材料标准化技术委员会)归口,TC203SC1(全国半导体设备和材料标准化技术委员会气体分会)执行,主管部门为国家标准化管理委员会。


Introduction

GB/T 43976—2024 Tetrafluoromethane Electronic Gas Standard Overview

This standard specifies the technical requirements, inspection rules, marking, packaging, transportation, storage and safety information requirements for electronic grade tetrafluoromethane, and is applicable to tetrafluoromethane prepared by purification of industrial tetrafluoromethane.

Comparison of technical requirements and indicators

Items Requirements
Tetrafluoromethane purity (volume fraction) /10-2 ≥99.999
Oxygen + Argon content (volume fraction) /10-6 <1
Nitrogen content (volume fraction) /10-6 <4
Carbon monoxide content (volume fraction) /10-6 <0.1

Background of Standard Formulation and Analysis of Technological Evolution

With the rapid development of the semiconductor industry, electronic gases are key materials, and their purity and impurity control directly affect product quality. Tetrafluoromethane, as an important electronic gas, is used in plasma etching, thin film deposition and other fields in semiconductor manufacturing.

The formulation of this standard is based on many years of industry practice and technical accumulation, combined with advanced domestic and foreign experience, and aims to meet the gas quality requirements of high-precision electronic devices.

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