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aluminium alloys split-beam microscope method scopethis standard anodic oxidation coatings test methods aluminium tree coverage forest coverage= digital detection system low voltage shunt capacitor banks
GB/T 8015.2-1987 in English

GB/T 8015.2-1987 in English

SUPERSEDED

Test methods for thickness of anodic oxidation coatings on aluminium and aluminium alloys; Split-beam microscope method

  • Issued on:1987-06-26
  • Implemented on:1988-05-01
  • File Format:PDF
  • Delivery:Via email within 1~3 business days
Price(USD): $180.00
$175.00
Standard No: GB/T 8015.2-1987
Document status: SUPERSEDED
Superseded by: GB/T 8014.3-2005 Anodizing of aluminium and its alloys - The measuring method of thickness of anodic oxide coatings - Part 3: Split-beam microscope method
Superseded on: 2005-12-01
Title in English: Test methods for thickness of anodic oxidation coatings on aluminium and aluminium alloys; Split-beam microscope method
Title in Chinese: 铝及铝合金阳极氧化膜厚度的试验方法 分光束显微法
Language: English
File Format: Electronic (PDF)
Delivery: Via email within 1~3 business days
Issued on: 1987-06-26
Implemented on: 1988-05-01
ICS Classification: 25.220.40-Metallic coatings
Chinese Classification: H21-Metal physical property test method
Professional Classification: GB-National Standard
Related Keywords: aluminium alloys
split-beam microscope method scopethis standard
anodic oxidation coatings
test methods
aluminium
Related Topics: Alumina spectrophotometry
Anodized film thickness
Electrode Piece Thickness
The thickness of the electrode pad
Aluminum alloy plating thickness
Gold test thickness
microbeam method
Tantalum oxide film thickness
Oxide film inspection method
GBT8015.2
GB/T 8015.2-1987
Aluminum anodized film thickness
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microchemical methods

《GB/T 8015.2-1987铝及铝合金阳极氧化膜厚度的试验方法 分光束显微法》由610(中国有色金属工业协会)归口。


Scope

This standard is applicable to the determination of the thickness of anodized film on aluminum and aluminum alloy products. This standard is not applicable to the measurement of special films (such as dark oxide films) and films with rough sample substrates. Under normal industrial conditions, films above 10 μm can be measured. When the surface is smooth, the oxide film of 5-10 μm can also be measured.

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