YS/T 15-1991 in English

Name: YS/T 15-1991 English Version
Brand: China Standards Store
SKU: YST15-1991-EN
Availability: InStock
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SUPERSEDED

Thcikness determination for silicon epitaxial layer and difussion layer - Angle lap-stain method

Issued on:-
Implemented on:1992-06-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $90.00
$88.00

Details of YS/T 15-1991
Sample PDF

Standard No:	YS/T 15-1991
Document status:	SUPERSEDED
Superseded by:	YS/T 15-2015 Test method for thickness of epitaxial layers and diffused layers by angle lap stain
Superseded on:	2015-10-01
Title in English:	Thcikness determination for silicon epitaxial layer and difussion layer - Angle lap-stain method
Title in Chinese:	硅外延层和扩散层厚度测定磨角染色法
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Implemented on:	1992-06-01
ICS Classification:	29.045-Semiconducting materials
Chinese Classification:	H82-Elemental semiconductor material
Professional Classification:	YS-Non-ferrous Metal
Related Keywords:	silicon epitaxial layer difussion layer angle lap-stain method thcikness determination layer
Related Topics:	dyeing diffusion prediffusion temperature cladding diffusion Silicon epitaxy outer diffusion thermogravity Thickness measurement temperature diffusion method Dyeing Dyeing epitaxy color method Diffusion measurement Diffuser Angle Role dispersion and line dispersion Diffusion method to measure water activity Corneal staining Silicon epitaxial thickness testing method Standard silicon peak angle