xps photoelectron spectroscopy
xps photoelectron spectroscopy, Total:18 items.
The international standard classification for "xps photoelectron spectroscopy" includes: Optical measuring instruments , Chemical analysis , Measurement of electrical and magnetic quantities .
The Chinese standard classification for "xps photoelectron spectroscopy" includes: Electron optics and other physical optics instrument , Basic standards and general methods , Integrated test system , Mass spectrometer, liquid spectrometer, energy spectrometer and combined devices of them .
General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China
- GB/T 31470-2015 Standard practice for determination of the specimen area contributing to the detected signal in Auger electron spectrometers and some X-ray photoelectron spectrometers
- GB/T 28893-2012 Surface Chemical Analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Methods used to determine peak intensities and information required when reporting results
- GB/T 28633-2012 Surface chemical analysis—X-ray photoelectron spectroscopy—Repeatability and constancy of intensity scale
- GB/T 19500-2004 General rules for X-ray photoelectron spectroscopic analysis method
- GB/T 25188-2010 Thickness measurements for ultrathin silicon oxide layers on silicon wafers X-ray photoelectron spectroscopy
- GB/T 28892-2012 Surface chemical analysis - X-ray photoelectron spectroscopy -Description of selected instrumental performance parameters
- GB/T 22571-2008 Surface chemical analysis ? X-ray photoelectron spectrometers ? Calibration of energy scales
- GB/T 30702-2014 Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
Professional Standard - Education
- JY/T 013-1996 General rules for electron spectroscopic analysis
国家市场监督管理总局、中国国家标准化管理委员会
- GB/T 41064-2021 Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- GB/T 41072-2021 Surface chemical analysis - Electron spectroscopies - Guidelines for ultraviolet photoelectron spectroscopy analysis
GSO
- BH GSO ISO 16243:2017 Surface chemical analysis -- Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
- OS GSO ISO 16243:2015 Surface chemical analysis -- Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
- GSO ISO 16243:2015 Surface chemical analysis -- Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
Association Francaise de Normalisation
- NF X21-073*NF ISO 16243:2012 Surface chemical analysis - Recording and reporting data in X-ray photoelectron spectroscopy (XPS).
- NF ISO 16243:2012 Chemical Analysis of Surfaces - X-ray Photoelectron Spectroscopy (XPS) Data Logging and Reporting
British Standards Institution (BSI)
- BS ISO 16243:2011 Surface chemical analysis. Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
International Organization for Standardization (ISO)
- ISO 16243:2011 Surface chemical analysis - Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
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