Mass peak resolution

Mass peak resolution, Total:132 items.

The international standard classification for "Mass peak resolution" includes: Chemical analysis , Measuring instruments , Solid fuels , Laboratory medicine .

The Chinese standard classification for "Mass peak resolution" includes: Basic standards and general methods , Electron optics and other physical optics instrument , Mass spectrometer, liquid spectrometer, energy spectrometer and combined devices of them , Coal petrography , Medical laboratory equipment , Analysis methods for toxic substances in water .

General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China

GB/T 22572-2008 Surface chemical analysis - Secondary-ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials
GB/T 20176-2006 Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials
GB/T 25186-2010 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of relative sensitivity factors from ion-implanted reference materials
GB/T 43663-2024 Surface chemical analysis—Secondary-ion mass spectrometry—Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
GB/T 32495-2016 Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of arsenic in silicon

国家市场监督管理总局、中国国家标准化管理委员会

GB/T 40129-2021 Surface chemical analysis—Secondary ion mass spectrometry—Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
GB/T 40109-2021 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon

Professional Standard - Medicine

YY/T 1740.3-2024 Clinical mass spectrometer-Part 3 : Inductively coupled plasma mass spectrometry

Group Standards of the People's Republic of China

T/CASAS 010-2019 Determination of Trace Impurities Concentration and Distribution in GaN Materials by Secondary Ion Mass Spectrometry
T/SXQCA 001-2023 Water quality-Determination of water soluble cations（Sr2+、Ba2+） -Ion chromatography
T/BPMA 32-2004 Determination of chlorate and perchlorate in leek by ion chromatography-mass spectrometry/mass spectrometry
T/ZJATA 0023-2024 Determination of perchlorate in water Ion chromatography-mass spectrometry/mass spectrometry
T/NAIA 0169-2022 Water Quality Determination of Ammonia Nitrogen by Ion Chromatography
T/CASAS 009-2019 Determination of Trace Impurities Concentration and Distribution in Semi-insulating SiC Materials by Secondary Ion Mass Spectrometry
T/CIS 17004-2020 Ambient ionization device

Professional Standard - Electron

SJ/T 11493-2015 Test method for measuring nitrogen concentration in silicon substrates by secondary ion mass spectrometry
SJ/T 11498-2015 Test method for measuring oxygen contamination in heavily doped silicon substrates by secondary ion mass spectrometry

Professional Standard - Coal

MT/T 807-1999 Separation of vitrinite group in bituminous coal

国家药监局

YY/T 1740.2-2021 Clinical mass spectrometer—Part 2:Matrix-assisted laser desorption ionization-time of flight mass spectrometer

Professional Standard - Environmental Protection

HJ/T 84-2001 Water quality -- Determination of inorangic anions -- Ion chromatography method

工业和信息化部

YS/T 1496-2021 Analysis method for palladium compounds Determination of impurity anion content Ion chromatography
YS/T 1497-2021 Analysis method for platinum compounds Determination of impurity anion content Ion chromatography

Professional Standard - Education

JY/T 0568-2020 General rules for inductively coupled plasma-mass spectrometry

国家能源局

SY/T 7361-2017 Quadrupole mass spectrometry for rare gas separation and component content analysis

Military Standard of the People's Republic of China-General Armament Department

GJB 5168-2003 Lithium isotope abundance mass spectrometry
GJB 8791-2015 Lithium isotope abundance mass spectrometry

Professional Standard - Agriculture

53药典四部-2020 0412 Inductively coupled plasma mass spectrometry
73药典四部-2015 0412 Inductively coupled plasma mass spectrometry

GSO

GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
BH GSO ISO 13084:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
OS GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
BH GSO ISO 23830:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
OS GSO ISO 23830:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
GSO ISO 23830:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
GSO ISO 18114:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
BH GSO ISO 17560:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
OS GSO ISO 12406:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of arsenic in silicon
BH GSO ISO 18114:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
GSO ISO 12406:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of arsenic in silicon
GSO ISO 17560:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
BH GSO ISO 11632:2017 Stationary source emissions -- Determination of mass concentration of sulfur dioxide -- Ion chromatography method
GSO ISO 11632:2015 Stationary source emissions -- Determination of mass concentration of sulfur dioxide -- Ion chromatography method
BH GSO ISO 23812:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials
OS GSO ISO 23812:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials

British Standards Institution (BSI)

BS ISO 13084:2018 Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
BS ISO 13084:2011 Surface chemical analysis. Secondary-ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
BS ISO 20411:2018 Surface chemical analysis. Secondary ion mass spectrometry. Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
BS ISO 17862:2022 Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
20/30409963 DC BS ISO 17862. Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
BS ISO 16564:2004 Rubber, raw natural - Determination of average molecular mass and molecular-mass distribution by size exclusion chromatography (SEC)
BS ISO 17862:2013 Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
BS ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
BS ISO 12406:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
BS ISO 18114:2021 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials
24/30454135 DC BS ISO 6863 Nuclear fuel technology - Preparation of spikes for isotope dilution mass spectrometry (IDMS)
BS ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
BS ISO 11632:1998(1999) Stationary source emissions — Determination of mass concentration of sulfur dioxide — Ion chromatography method
BS ISO 23812:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
20/30409889 DC BS ISO 18114. Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials

International Organization for Standardization (ISO)

ISO 13084:2011 Surface chemical analysis - Secondary-ion mass spectrometry - Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
ISO 178:1975 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO 17862:2022 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO/TS 22933:2022 Surface chemical analysis — Secondary ion mass spectrometry — Method for the measurement of mass resolution in SIMS
ISO 17862:2013 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO 178:2019 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO 13084:2018 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
ISO 20411:2018 Surface chemical analysis - Secondary ion mass spectrometry - Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
ISO 12406:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of arsenic in silicon
ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
ISO 17560:2014 Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon
ISO 18114:2021 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
ISO/CD 6863 Preparation of Plutonium and Uranium spikes for Isotope Dilution Mass Spectrometry (IDMS)
ISO 18114:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
ISO 14237:2000 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
ISO 10304-4:1997 Water quality - Determination of dissolved anions by liquid chromatography of ions - Part 4: Determination of chlorate, chloride and chlorite in water with low contamination
ISO 11632:1998 Stationary source emissions - Determination of mass concentration of sulfur dioxide - Ion chromatography method

Japanese Industrial Standards Committee (JISC)

JIS K 0157:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
JIS K 0158:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
JIS K 0155:2018 Surface chemical analysis -- Secondary ion mass spectrometry -- Linearity of intensity scale in single ion counting time-flight mass analysers
JIS K 0153:2015 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
JIS K 0164:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
JIS K 0163:2010 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials

Association Francaise de Normalisation

NF ISO 23830:2009 Chemical analysis of surfaces - Mass spectrometry of secondary ions - Repeatability and constancy of the scale of relative intensities in static mass spectrometry of secondary ions
NF X21-064*NF ISO 23830:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry.
NF X21-070*NF ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials.
NF ISO 17560:2006 Chemical analysis of surfaces - Mass spectrometry of secondary ions - Determination of boron in silicon by thickness profiling
NF EN ISO 10304-4:2022 Water quality - Determination of dissolved anions by liquid ion chromatography - Part 4: determination of chlorate, chloride and chlorite ions in lightly contaminated water
NF X21-066*NF ISO 23812:2009 Surface chemical analysis - Secondary ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
NF T90-046:2014 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)

SCC

10/30199193 DC BS ISO 13084. Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time of flight secondary ion mass spectrometer
07/30138812 DC BS ISO 23830. Surface chemical analysis. Secondary-ion mass spectrometry. Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
AWWA QTC98245 Analysis of Metals by Inductively Coupled Plasma-Mass Spectrometry: Effect of Concentration on Accuracy and Precision
10/30199169 DC BS ISO 12406. Surface chemical analysis. Secondary ion mass spectrometry. Method for depth profiling of arsenic in silicon
AWWA WQTC55099 The Use of Electrospray Ionization (ESI) High-Field Asymmetric Waveform Ion Mobility Mass Spectrometry (FAIMS-MS) for the Analysis of Haloacetic Acids (HAAS) in Drinking Water

American Society for Testing and Materials (ASTM)

ASTM C1871-22 Standard Test Method for Determination of Uranium Isotopic Composition by the Double Spike Method Using a Thermal Ionization Mass Spectrometer
ASTM C1871-18 Standard Test Method for Determination of Uranium Isotopic Composition by the Double Spike Method Using a Thermal Ionization Mass Spectrometer
ASTM C1871-18a Standard Test Method for Determination of Uranium Isotopic Composition by the Double Spike Method Using a Thermal Ionization Mass Spectrometer
ASTM E1438-06 Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
ASTM E1438-91(1996) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
ASTM E1504-11 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1438-91(2001) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM D5996-05 Standard Test Method for Measuring Anionic Contaminants in High-Purity Water by On-Line Ion Chromatography
ASTM E1504-92(1996) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-92(2001) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-11(2019) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-06 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM C1625-05 Standard Test Method for Uranium and Plutonium Concentrations and Isotopic Abundances by Thermal Ionization Mass Spectrometry

Korean Agency for Technology and Standards (KATS)

KS D ISO 18114-2020 Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS D ISO 18114-2005(2020) Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS D ISO 18114:2005 Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS D ISO 20341-2020 Surface chemical analysis－Secondary-ion mass spectrometry－Method for estimating depth resolution parameters with multiple delta-layer reference materials
KS D ISO 20341-2005(2020) Surface chemical analysis－Secondary-ion mass spectrometry－Method for estimating depth resolution parameters with multiple delta-layer reference materials
KS I ISO 11632:2004 Stationary source emissions-Determination of the massconcentration of sulfur dioxide(Ion chromatography method)
KS I ISO 11632-2019 Stationary source emissions — Determination of the mass concentration of sulfur dioxide(ion chromatography method)
KS I ISO 11632:2014 Stationary source emissions — Determination of the mass concentration of sulfur dioxide(ion chromatography method)
KS I ISO 11632-2014(2019) Stationary source emissions — Determination of the mass concentration of sulfur dioxide(ion chromatography method)
KS I ISO 10304-4:2008 Water quality-Determination of dissolved anions by liquid chromatography of ions-Part 4:Determination of chlorate, chloride and chlorite in water with low contamination
KS C 2375-2006(2016) Analytical method of polychlorinated biphenyls(PCBs)by gas chromatography peak pattern comparison
KS I ISO 12010:2014 Water quality — Determination of short-chain polychlorinated alkanes(SCCPs) in water — Method using gas chromatography-mass spectrometry(GC-MS) and negative-ion chemical ionization(NCI)
KS I ISO 12010:2022 Water quality — Determination of short-chain polychlorinated alkanes(SCCPs) in water — Method using gas chromatography-mass spectrometry(GC-MS) and negative-ion chemical ionization(NCI)

KR-KS

KS D ISO 17560-2003(2023) Surface chemical analysis - Secondary ion mass spectrometry - Boron depth distribution measurement method in silicon
KS I ISO 17294-2014 Water quality — Application of inductively coupled plasma mass spectrometry(ICP-MS)
KS I ISO 12010-2022 Water quality — Determination of short-chain polychlorinated alkanes(SCCPs) in water — Method using gas chromatography-mass spectrometry(GC-MS) and negative-ion chemical ionization(NCI)

Standard Association of Australia （SAA）

AS ISO 17560:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon

Spanish Association for Standardization (UNE)

UNE 77226:1999 STATIONARY SOURCE EMISSIONS. DETERMINATION OF MASS CONCENTRATION OF SULFUR DIOXIDE. ION CHROMATOGRAPHY METHOD.

VN-TCVN

TCVN 6750-2000 Stationary source emissions.Determination of mass concentration of sulfur dioxide.Ion chromatography method

Danish Standards Foundation

DS/ISO 11632:1998 Stationary source emissions - Determination of mass concentration of sulfur dioxide - Ion chromatography method

RU-GOST R

GOST R 57061-2016 Copper. Measurement of impurities mass fraction in copper by an inductively coupled plasma mass spectrometry method

German Institute for Standardization

DIN EN ISO 17294-1:2022-07 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 1: General guidelines (ISO/DIS 17294-1:2022); German and English version prEN ISO 17294-1:2022 / Note: Date of issue 2022-06-17*Intended as replacement for DIN ...

Others: Sensitivity mass spec ion peak,Peak separation,Mass Spectrum Peak Separation,Mass peak resolution,Abundance mass peak,Mass peak resolution,Mass Spectrum Abundance Peak,MS resolution,Resolution mass spectrometry