GB/T 20176-2006 in English

SUPERSEDED

Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials

Issued on:2006-03-27
Implemented on:2006-11-01
File Format:PDF
Delivery:Via email within 1~3 business days

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Standard No:	GB/T 20176-2006
Document status:	SUPERSEDED
Superseded by:	GB/T 20176-2025 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of boron atomic concentration in silicon using uniformly doped materials
Superseded on:	2026-01-01
Title in English:	Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials
Title in Chinese:	表面化学分析二次离子质谱用均匀掺杂物质测定硅中硼的原子浓度
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2006-03-27
Implemented on:	2006-11-01
ICS Classification:	71.040.40-Chemical analysis
Chinese Classification:	N33-Electron optics and other physical optics instrument
Professional Classification:	GB-National Standard
Related Keywords:	atomic concentration chemical analysis-secondary-ion mass spectrometry-determination uniform boron secondary ion mass spectrometry method single crystal silicon
Related Topics:	Premium Used Ion Chromatography Premium Used Ion Chromatography Mass concentration atomic concentration ion mass spectrometry ion mass spectrometry The concentration of the mass spectrometer Precursor ion peak in mass spectrum Mass concentration silicon atom Mass Spec + Precursor Ion Peak Negative ion detection Negative ion detection Selection of Precursor Ion Peaks in MS/MS Spectrometry Mass Spec Positive Ions Mass Spectrometry Ionization Species Secondary mass spectrometry analysis Ion Trap MS/MS Atomic Concentration Impurity separation Impurity separation Product Surface Impurities Determination of impurities in crude oil Mass Spec Positive Ions ion pairs in mass spectrometry atomic matter Are there many X-type ions in the secondary mass spectrometer? Mass spectrometry secondary analysis Secondary Mass Spectrometry Product Ions Mass spectrometry how concentration Mass spec impurity ions Precursor ions for mass spectrometry Elemental Analysis by Secondary Ion Mass Spectrometry Separation of impurities ionic strength surface MS ionization Impurities Precursor Ions in Mass Spectrometry Determination of Atomic Concentration of Boron in Silicon Using Uniform Doping Species atomic concentration negative ion mass spectrometry ionizer mass spectrometer Impurities mass spectrometry surface analysis Concentration during mass spectrometry boron ion mass ts after chemical positive ion mass spectrometry mass spectrometer negative ion mass spectrometry negative ion spectrum Mass Spec Ion Hydrazine mass spectrometry ion spectrum Analysis of MS/MS 58 ions in the mass spectrum atomic concentration Ionic Strength Measurement Fe ion mass spectrometry How to select product ions in secondary mass spectrometry Ion source for mass spectrometry Mass spec impurity peak Several ionizations in mass spectrometry Ionic Strength Measurement spectrum Mass peak resolution Mass spec b-ions Mass Spectrometry Sample Preparation Concentration Analysis of Impurity Profile atomic matrix Silicon ions mass spectrometric product ions hybridization mass spectrometry ion mass spectrometry Ions in a mass spectrum Measuring Atomic Concentration Ionic Strength Measurement Hybrid silicon Hybrid silicon spectrum Major ions in mass spectrometry mass ionizer Secondary Electron Analysis atomic ion electronic hybridization degree of ionization MS double ion peak Secondary mass spectrometry analysis Quantity of product ions in mass spectrometry Detecting Transitions in Mass Spectrometry MS ion cluster Mass Spectrum Peak Precursor Ion Mass-like concentration Ions in mass detection Molecular concentration Surface Atomic Energy Spectroscopy Ion peaks in a mass spectrum Secondary Electron Mass Spectrometry Ionized impurities material factor average mass spectrum Ion Hydrazine Mass Spectrometry homogeneous analysis precursor ions in mass spectrometry Precursor ion analysis by mass spectrometry Homogenizer principle atomic surface chemistry mass spectrometry Mass spec major ions Determination of Boron Ions in Water material separation Mass peak resolution secondary ion source thermal ionization mass spectrometry Precursor ion peaks in mass spectra Secondary Electron Mass Spectrometry There are many ions in the first mass spectrometry, but few ions in the second mass spectrometry Chemical concentration concentration in chemistry For ions Determination of Ion Peaks in Mass Spectrometry Mass Spectrometry Precursor Ion Peak Ion source in mass spectrometry Major Ions for Mass Spectrometry Mass Spectrometry Concentration Ratio Mass Spectrometry Concentration Ratio How to determine the parent ion in mass spectrometry Mass Spec + Precursor Ion Peak Major Ions in Mass Spectrometry Molecular Mass and Concentration Mass spec impurity peak Base Peaks in Mass Spectrometry Secondary ion mass spectrometry mode Silicon ions Atomic Agent Concentration How Mass Spectrometry Determines Substance Precursor Ions Measuring ionic strength Homogenizer principle Concentration and Relative Atomic Mass MS resolution atomic silicon Mass Spectrometric Analysis of Cyclic Dipeptides boron ion Secondary ion mass spectrometric detection of boron contamination in heavily doped n-type silicon substrates tissue homogenization Mass Spectrometry Secondary Mass Spectrometry secondary particle mass spectrometry Therefore, each atom contains Ion Chromatography Ion Concentration mass spectrometry molecular kurtosis Ion strength in mass spectrometry Resolution mass spectrometry homogeneous centrifugation boron ion mass secondary neutron boron ion homogenized tissue Counter atom of boron mass spectrometry ionization Secondary Ion Definition mass spectrometry original ion+mass spec+ role of atomization Mass Spectrometry Sample Preparation Concentration Techniques for Analyzing Secondary Electrons mass spectrometry ion element Ions of mass spectrum 58 GBT20176 GBT20176-2006 Mass spectrometry APCI ion source measures substance molecular weight +36 Mass Spectrometry 4500 Split Ion Source In the mass spectrum if the mass of the precursor ion m1 and the product ion m2 Positive ion mode Mass spectrometry analysis of pathogens First observation of molecular atoms Secondary mass spectrometry precursor ions Chemical substance standard mass spectrum ion ratio Chemical secondary container height Barium ion concentration water quality Construction of Proton and Heavy Ion Center gb/t 20176-2006 Junior high school chemical substance separation method table

《GB/T 20176-2006表面化学分析二次离子质谱用均匀掺杂物质测定硅中硼的原子浓度》由TC38（全国微束分析标准化技术委员会）归口，TC38SC2（全国微束分析标准化技术委员会表面化学分析分会）执行，主管部门为国家标准化管理委员会。
本标准详细说明了用标定的均匀掺杂物质确定单晶硅中硼的原子浓度的二次离子质谱方法。

Scope

This standard specifies the secondary ion mass spectrometry method for determining the atomic concentration of boron in single crystal silicon using a calibrated homogeneous dopant (calibrated with a boron-implanted reference substance). It is suitable for uniform boron doping concentration ranging from 1×10¹⁶atoms/cm³ to 1×10²⁰atoms/cm³.

More samples: JGJ 94-2008 JJG 21-2008 NB/T 47013.2-2015

Sample only — not a preview of GB/T 20176-2006

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