There are many ions in the first mass spectrometry, but few ions in the second mass spectrometry

There are many ions in the first mass spectrometry, but few ions in the second mass spectrometry, Total:232 items.

The international standard classification for "There are many ions in the first mass spectrometry, but few ions in the second mass spectrometry" includes: Chemical analysis , Chemical analysis of metals , Testing of metals , Semiconducting materials , Measuring instruments , Occupational safety. Industrial hygiene , Protection against crime .

The Chinese standard classification for "There are many ions in the first mass spectrometry, but few ions in the second mass spectrometry" includes: Basic standards and general methods , Semimetal and semiconductor material analysis method , Special electronic technology material , Hygiene, safety and labor protection , Semimetal and semiconductor material in general , Electron optics and other physical optics instrument , Analysis methods for toxic substances in water , Mass spectrometer, liquid spectrometer, energy spectrometer and combined devices of them , Hydrogeological survey , Labor sanitation , Crime judging technology .

General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China

GB/T 45768-2025 Surface chemical analysis—Secondary ion mass spectrometry—Linearity of intensity scale in single ion counting time-of-flight mass analysers
GB/T 35925-2018 Determination of impurity fluorine ion in water soluble chemicals—Ion chromatography method
GB/T 22572-2008 Surface chemical analysis - Secondary-ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials
GB/T 40109-2021 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
GB/T 32281-2015 Test method for measuring oxygen, carbon, boron and phosphorus in solar silicon wafers and feedstock by secondary ion mass spectrometry
GB/T 24580-2009 Test method for measuring Boron contamination in heavily doped n-type silicon substrates by secondary ion mass spectrometry
GB/T 11446.7-2013 Test Method for Trace Anion in Electronic Grade Water by Ion Chromatography
GB/T 37049-2018 Test method for the content of metal impurity in electronic grade polysilicon—Inductively coupled-plasma mass spectrometry method
GB/T 32495-2016 Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of arsenic in silicon
GB/T 43663-2024 Surface chemical analysis—Secondary-ion mass spectrometry—Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
GB/T 42263-2022 Determination of nitrogen content in silicon single crystal—Secondary ion mass spectrometry method
GB/T 24582-2009 Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry
GB/T 31197-2014 Inorganic chemicals for industrial use-Determination of impurity anions - Ion chromatography method
GB/T 11446.7-1997 Test method for trace chloride, nitrate, phosphate, sulfate in electronic grade water by ion-chromatography
GB/T 25186-2010 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of relative sensitivity factors from ion-implanted reference materials
GB/T 40129-2021 Surface chemical analysis—Secondary ion mass spectrometry—Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
GB/T 39144-2020 Test method for magnesium content in gallium nitride materials—Secondary ion mass spectrometry
GB/T 20176-2006 Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials
GB/T 41153-2021 Determination of boron,aluminum and nitrogen impurity content in silicon carbide single crystal―Secondary ion mass spectrometry
GB/T 20176-2025 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of boron atomic concentration in silicon using uniformly doped materials

Professional Standard - Environmental Protection

HJ 84-2016 Water Quality-Determination of Inorganic Anions（F-、Cl-、NO2-、Br-、NO3-、PO43-、SO32-、SO42-）-Ion Chromatography
HJ 778-2015 Water quality - Determination of iodide - Ion chromatiography
HJ 669-2013 Water quality-Determination of phosphate-Ion chromatography
HJ 812-2016 Water Quality - Determination of Water Soluble Cations（Li+ 、Na+、NH4+、K+、Ca2+、Mg2+） - Ion Chromatography
HJ/T 84-2001 Water quality -- Determination of inorangic anions -- Ion chromatography method

Group Standards of the People's Republic of China

T/CIS 17004-2020 Ambient ionization device
T/CSTM 00918-2024 Ionic impurities test of insulation paper used in value side bushing of ultra-high voltage converter transformer - Ion chromatography method
T/STEI 0003-2024 Determination of multiple elements in whole blood — Inductively coupled plasma mass spectrometry
T/NAIA 0169-2022 Water Quality Determination of Ammonia Nitrogen by Ion Chromatography
T/CASAS 010-2019 Determination of Trace Impurities Concentration and Distribution in GaN Materials by Secondary Ion Mass Spectrometry
T/DLAS 004-2021 Determination of five kinds of selenium in selenium-enriched agricultural products by ion chromatography-inductively coupled plasma mass spectrometry
T/NAIA 0212-2023 Determination of Multiple Elements in Lycium Barbarum by Inductively Coupled Plasma Mass Spectrometry
T/NAIA 0159-2022 Determination of Multiple Elements in Wine by Inductively Coupled Plasma Mass Spectrometry
T/ZPP 095-2024 Simultaneous determination of multiple elements in blood by inductively coupled plasma mass spectrometry
T/BPMA 32-2004 Determination of chlorate and perchlorate in leek by ion chromatography-mass spectrometry/mass spectrometry
T/GXAS 720-2024 Ion-absorbing type rare earths ore—Determination of total rare earth ion phase—Inductively coupled plasma mass spectrometery
T/NAIA 0168-2022 Water Quality Determination of Perchlorate by Ion Chromatography
T/ZJATA 0023-2024 Determination of perchlorate in water Ion chromatography-mass spectrometry/mass spectrometry
T/SXQCA 001-2023 Water quality-Determination of water soluble cations（Sr2+、Ba2+） -Ion chromatography
T/NAIA 0160-2022 Determination of total sulfur dioxide in wine by triple quadrupole inductively coupled plasma mass spectrometry
T/CNIA 0017-2019 Determination of Impurity Content in Chlorosilanes for Polysilicon by Inductively Coupled Plasma Mass Spectrometry
T/SATA 020-2021 Determination of Multiple Elements in Seawater by Inductively Coupled Plasma Mass Spectrometry

Professional Standard - Commodity Inspection

SN/T 2210-2008 Determination of hexavalent chromium in health foods - IC-ICP-MS method

Professional Standard - Geology

DZ/T 0064.51-1993 Groundwater quality test methods - the determination of chloridion, fluorinion, bromide ion, nitrate radical and sulfate radical with ion chromatography method

Professional Standard - Electron

SJ/T 11498-2015 Test method for measuring oxygen contamination in heavily doped silicon substrates by secondary ion mass spectrometry
SJ/T 11637-2016 General principles of inductively coupled plasma mass spectrometry for electronic chemicals
SJ 3237-1989 Method for determination of trace oxygen in electronic grade Argon--Argon ionization gas chromatography method
SJ/T 11493-2015 Test method for measuring nitrogen concentration in silicon substrates by secondary ion mass spectrometry

Professional Standard - Agriculture

1807药典一部-2010 Appendix XI D Inductively Coupled Plasma Mass Spectrometry
73药典四部-2015 0412 Inductively coupled plasma mass spectrometry
53药典四部-2020 0412 Inductively coupled plasma mass spectrometry
HJ 1288-2023 Water quality-Determination of acrylic acid-Ion chromatography
HJ 1288-2023 Water quality-Determination of acrylic acid-Ion chromatography
775兽药典二部-2015 Appendix Contents 0400 Spectroscopy 0411 Inductively Coupled Plasma Mass Spectrometry
781兽药典一部-2015 Appendix Contents 0400 Spectroscopy 0412 Inductively Coupled Plasma Mass Spectrometry

Professional Standard - Medicine

YY/T 1740.3-2024 Clinical mass spectrometer-Part 3 : Inductively coupled plasma mass spectrometry

Shandong Provincial Standard of the People's Republic of China

DB37/T 4152-2020 Determination of water quality glyphosate ion chromatography
DB37/T 4151-2020 Determination of Acrylic Acid in Water by Ion Chromatography

Professional Standard - Non-ferrous Metal

YS/T 980-2014 Determination of impurities of high purity gallium oxide—Inductively coupled plasma-mass spectrmetry
YS/T 1497-2021 Analysis method for platinum compounds Determination of impurity anion content Ion chromatography
YS/T 1496-2021 Analysis method for palladium compounds Determination of impurity anion content Ion chromatography

Hunan Provincial Standard of the People's Republic of China

DB43/T 2957-2024 Water quality-Determination of perchlorate-Ion chromatography

Zhejiang Provincial Standard of the People's Republic of China

DB33/T 543-2005 Method for Determination of Multi-residue Pesticides in Fruits and Vegetables by Gas Chromatography Ion Trap Mass Spectrometry

National Health Commission of the People's Republic of China

GBZ/T 308-2018 Simultaneous determination of a variety of metals in urine —— Inductively coupled plasma mass spectrometry method

Jiangxi Provincial Standard of the People's Republic of China

DB36/T 1839-2023 Determination of iodide in water quality by inductively coupled plasma mass spectrometry

National Metrological Technical Specifications of the People's Republic of China

JJF 2115-2024 Liquid chromatography-inductively coupled plasma mass spectrometry instrument calibration specification

Professional Standard - Public Safety Standards

GA/T 1628-2019 Forensic sciences—Examination methods for glyphosate in biological samples—IC-MS

International Organization for Standardization (ISO)

ISO 13084:2018 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
ISO/TS 22933:2022 Surface chemical analysis — Secondary ion mass spectrometry — Method for the measurement of mass resolution in SIMS
ISO 13084:2011 Surface chemical analysis - Secondary-ion mass spectrometry - Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
ISO 20411:2018 Surface chemical analysis - Secondary ion mass spectrometry - Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
ISO 18114:2021 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
ISO 18114:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
ISO 14911:1998 Water quality - Determination of dissolved Li<(hoch)+>, Na<(hoch)+>, NH<(Index)4><(hoch)+>, K<(hoch)+>, Mn<(hoch)2+>, Ca<(hoch)2+>, Mg<(hoch)2+>, Sr<(hoch)2+> and Ba<(hoch)2+> using ion chromatography - Method for water and waste water
ISO 12010:2019 Water quality — Determination of short-chain polychlorinated alkanes (SCCP) in water — Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
ISO 22048:2004 Surface chemical analysis — Information format for static secondary-ion mass spectrometry
ISO 20341:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials
ISO 178:1975 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO 17862:2022 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO 17862:2013 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO 178:2019 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO 23812:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
ISO 14237:2000 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
ISO 11632:1998 Stationary source emissions - Determination of mass concentration of sulfur dioxide - Ion chromatography method

American Society for Testing and Materials (ASTM)

ASTM E1504-92(1996) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-92(2001) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-06 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-11 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1635-06(2011) Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-11(2019) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1635-06 Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1881-12 Standard Guide for Cell Culture Analysis with SIMS
ASTM E2695-09 Standard Guide for Interpretation of Mass Spectral Data Acquired with Time-of-Flight Secondary Ion Mass Spectroscopy
ASTM E1438-91(1996) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
ASTM E1438-91(2001) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
ASTM E1881-06 Standard Guide for Cell Culture Analysis with SIMS
ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1438-06 Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
ASTM C1287-10 Standard Test Method for Determination of Impurities in Nuclear Grade Uranium Compounds by Inductively Coupled Plasma Mass Spectrometry
ASTM F1366-92(1997)e1 Standard Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry
ASTM C1287-18 Standard Test Method for Determination of Impurities in Nuclear Grade Uranium Compounds by Inductively Coupled Plasma Mass Spectrometry
ASTM E1880-06 Standard Practice for Tissue Cryosection Analysis with SIMS
ASTM E1162-06 Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1880-12 Standard Practice for Tissue Cryosection Analysis with SIMS
ASTM E1635-06(2019) Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1635-95(2000) Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1162-11 Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)

The Directorate General of Specifications and Metrology (DGSM)

OS GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
OS GSO ISO 23830:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
OS GSO ISO 22048:2013 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
OS GSO ISO 23812:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials

GCC Standardization Organization

GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
GSO ISO 18114:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
GSO ISO 23830:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
GSO ISO 22048:2013 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
GSO ISO 12010:2013 Water quality -- Determination of short-chain polychlorinated alkanes (SCCPs) in water -- Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
GSO ISO 11632:2015 Stationary source emissions -- Determination of mass concentration of sulfur dioxide -- Ion chromatography method
GSO ISO 20341:2014 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for estimating depth resolution parameters with multiple delta-layer reference materials

Kingdom of Bahrain Testing and Metrology Directorate

BH GSO ISO 13084:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
BH GSO ISO 23830:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
BH GSO ISO 12010:2016 Water quality -- Determination of short-chain polychlorinated alkanes (SCCPs) in water -- Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
BH GSO ISO 18114:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
BH GSO ISO 22048:2016 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
BH GSO ISO 23812:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials
BH GSO ISO 17560:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
BH GSO ISO 11632:2017 Stationary source emissions -- Determination of mass concentration of sulfur dioxide -- Ion chromatography method

British Standards Institution (BSI)

BS ISO 13084:2011 Surface chemical analysis. Secondary-ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
BS ISO 20411:2018 Surface chemical analysis. Secondary ion mass spectrometry. Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
BS ISO 13084:2018 Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
BS ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
25/30500395 DC BS ISO 13084 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
10/30199193 DC BS ISO 13084. Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time of flight secondary ion mass spectrometer
BS ISO 18114:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
BS ISO 17862:2013 Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
07/30138812 DC BS ISO 23830. Surface chemical analysis. Secondary-ion mass spectrometry. Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
BS ISO 23812:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
BS ISO 18114:2021 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials
BS EN ISO 17294-1:2024 Water quality. Application of inductively coupled plasma mass spectrometry (ICP-MS) - General requirements
BS EN ISO 17294-1:2006 Water quality. Application of inductively coupled plasma mass spectrometry (ICP-MS)-General guidelines
BS ISO 22048:2004 Surface chemical analysis. Information format for static secondary-ion mass spectrometry
BS ISO 22048:2004(2005) Surface chemical analysis — Information format for static secondary - ion mass spectrometry
BS ISO 20341:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials
BS EN ISO 12010:2014 Water quality. Determination of short-chain polychlorinated alkanes (SCCPs) in water. Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
10/30156236 DC BS ISO 12010. Water quality. Determination of short-chained polychlorinated alkanes (SCCP) in water. Method using gas chromatography/mass spectrometry (GC/MS) and negative-ion chemical ionization (NCI)
BS EN ISO 17294-1:2004 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - General guidelines
BS EN ISO 12010:2019 Water quality. Determination of short-chain polychlorinated alkanes (SCCP) in water. Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
BS ISO 17862:2022 Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
BS ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
20/30409889 DC BS ISO 18114. Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials
BS ISO 11632:1998(1999) Stationary source emissions — Determination of mass concentration of sulfur dioxide — Ion chromatography method
BS ISO 11632:1998 Stationary source emissions - Determination of mass concentration of sulfur dioxide - Ion chromatography method
BS ISO 12010:2012 Water quality. Determination of short-chain polychlorinated alkanes (SCCPs) in water. Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
20/30409963 DC BS ISO 17862. Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers

Japanese Industrial Standards Committee (JISC)

JIS K 0157:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
JIS K 0158:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
JIS K 0153:2015 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
JIS K 0133:2007 General rules for high frequency plasma mass spectrometry
JIS K 0163:2010 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
JIS K 0133:2000 General rules for high frequency plasma mass spectrometry
JIS K 0168:2011 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
JIS K 0143:2000 Surface chemical analysis -- Secondary ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
JIS K 0155:2018 Surface chemical analysis -- Secondary ion mass spectrometry -- Linearity of intensity scale in single ion counting time-flight mass analysers
JIS K 0164:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon

Association Francaise de Normalisation

NF X21-064*NF ISO 23830:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry.
NF ISO 23830:2009 Chemical analysis of surfaces - Mass spectrometry of secondary ions - Repeatability and constancy of the scale of relative intensities in static mass spectrometry of secondary ions
NF T90-048*NF EN ISO 14911:1999 Water quality - Determination of dissolved Li+, Na+, NH 4+, K+, Mn 2+, Ca 2+, Mg 2+, Sr 2+ and Ba 2+ using ion chromatography - Method for water and waste water.
NF X21-066*NF ISO 23812:2009 Surface chemical analysis - Secondary ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
NF X21-070*NF ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials.
NF T90-046:2014 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
NF X43-338*NF ISO 11632:1998 Stationary source emissions. Determination of the mass concentration of sulfur dioxide. Ion chromatography method.

Korean Agency for Technology and Standards (KATS)

KS D ISO 18114-2005(2020) Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS D ISO 18114-2020 Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS D ISO 18114:2005 Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS I ISO 14911:2009 Water quality-Determination of dissolved Li+, Na+,NH4+, K+, Mn2+, Ca2+, Mg2+, Sr2+ and Ba2+ using ion chromatography-Method for water and waste water
KS I ISO 12010-2022 Water quality — Determination of short-chain polychlorinated alkanes(SCCPs) in water — Method using gas chromatography-mass spectrometry(GC-MS) and negative-ion chemical ionization(NCI)
KS I ISO 12010:2022 Water quality — Determination of short-chain polychlorinated alkanes(SCCPs) in water — Method using gas chromatography-mass spectrometry(GC-MS) and negative-ion chemical ionization(NCI)
KS I ISO 12010:2014 Water quality — Determination of short-chain polychlorinated alkanes(SCCPs) in water — Method using gas chromatography-mass spectrometry(GC-MS) and negative-ion chemical ionization(NCI)
KS I ISO 12010-2014 Water quality — Determination of short-chain polychlorinated alkanes(SCCPs) in water — Method using gas chromatography-mass spectrometry(GC-MS) and negative-ion chemical ionization(NCI)
KS D ISO 22048-2020 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
KS D ISO 14237:2003 Surface chemical analysis－Secondary-ion mass spectrometry－Determination of boron atomic concentration in silicon using uniformly doped materials
KS D ISO 22048-2005(2020) Surface chemical analysis - Information format for static secondary-ion mass spectrometry
KS D ISO 20341:2005 Surface chemical analysis－Secondary-ion mass spectrometry－Method for estimating depth resolution parameters with multiple delta-layer reference materials
KS I ISO 17294-2014(2021) Water quality — Application of inductively coupled plasma mass spectrometry(ICP-MS)
KS I ISO 17294:2014 Water quality — Application of inductively coupled plasma mass spectrometry(ICP-MS)
KS D ISO 20341-2020 Surface chemical analysis－Secondary-ion mass spectrometry－Method for estimating depth resolution parameters with multiple delta-layer reference materials
KS I ISO 11632-2014(2019) Stationary source emissions — Determination of the mass concentration of sulfur dioxide(ion chromatography method)
KS I ISO 11632:2004 Stationary source emissions-Determination of the massconcentration of sulfur dioxide(Ion chromatography method)
KS I ISO 11632-2024 Stationary source emissions — Determination of the mass concentration of sulfur dioxide(ion chromatography method)
KS I ISO 11632-2019 Stationary source emissions — Determination of the mass concentration of sulfur dioxide(ion chromatography method)
KS I ISO 17294-2021 Water quality — Application of inductively coupled plasma mass spectrometry(ICP-MS)
KS I ISO 11632:2014 Stationary source emissions — Determination of the mass concentration of sulfur dioxide(ion chromatography method)
KS D ISO 20341-2005(2020) Surface chemical analysis－Secondary-ion mass spectrometry－Method for estimating depth resolution parameters with multiple delta-layer reference materials

Swedish Institute for Standards

SS-EN ISO 17294-2:2005 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 2: Determination of 62 elements (ISO 17294-2:2003)
ASTM E1635-11 Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
SS-EN ISO 12010:2014 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO 12010:2012)

German Institute for Standardization

DIN EN ISO 14911:1999 Water quality - Determination of dissolved Li<(hoch)+>, Na<(hoch)+>, NH<(Index)4><(hoch)+>, K<(hoch)+>, Mn<(hoch)2+>, Ca<(hoch)2+>, Mg<(hoch)2+>, Sr<(hoch)2+> and Ba<(hoch)2+> using ion chromatography - Method for water and waste water (ISO 14911:1998); G
DIN EN ISO 17294-1:2022-07 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 1: General guidelines (ISO/DIS 17294-1:2022); German and English version prEN ISO 17294-1:2022 / Note: Date of issue 2022-06-17*Intended as replacement for DIN ...
DIN EN ISO 12010:2019-09 Water quality - Determination of short-chain polychlorinated alkanes (SCCP) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO 12010:2019); German version EN ISO 12010:2019
DIN EN ISO 12010:2014-07 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO 12010:2012)
DIN ISO 11632 E:2001-05 Stationary source emissions - Determination of mass concentration of sulfur dioxide - Ion chromatography method
DIN EN ISO 12010:2019 Water quality - Determination of short-chain polychlorinated alkanes (SCCP) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO 12010:2019)
DIN EN ISO 12010 E:2018-03 Water quality Determination of short-chain polychlorinated triphenylane (SCCP) in water by gas chromatography mass spectrometry (GC-MS) and negative ion chemical ionization (NCI) (draft)
DIN EN ISO 12010 E:2013-12 Water quality Determination of short-chain polychlorinated triphenylane (SCCP) in water by gas chromatography mass spectrometry (GC-MS) and negative ion chemical ionization (NCI) (draft)
DIN EN ISO 12010:2018-03 Draft Document - Water quality - Determination of short-chain polychlorinated alkanes (SCCP) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO/DIS 12010:2018); German and English versio...

Standard Association of Australia （SAA）

AS ISO 22048:2006 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
AS ISO 18114:2006(R2016) Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
AS ISO 18114:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
AS ISO 22048:2006(R2016) Surface chemical analysis - Information format for static secondary-ion mass spectrometry
AS ISO 14237:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
AS ISO 17560:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon

European Committee for Standardization (CEN)

EN ISO 14911:1999 Water Quality - Determination of Dissolved Li+, Na+, NH4+, K+, Mn2+, Ca2+, Mg2+, Sr2+ and Ba2+ Using Ion Chromatography - Method for Water and Waste Water ISO 14911:1998
EN ISO 12010:2014 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)

Ente Nazionale Italiano di Unificazione

UNI EN ISO 12010:2014 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
UNI EN ISO 15061:2001 Water quality - Determination of dissolved bromate - Method by liquid chromatography of ions
UNI EN ISO 12010:2019 Water quality - Determination of short-chain polychlorinated alkanes (SCCP) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
UNI EN ISO 19340:2018 Water quality - Determination of dissolved perchlorate - Method using ion chromatography (IC)

CEN - European Committee for Standardization

EN ISO 12010:2019 Water quality - Determination of short-chain polychlorinated alkanes (SCCP) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)

Standards Norway

NS-EN ISO 12010:2014 Water quality — Determination of short-chain polychlorinated alkanes (SCCPs) in water — Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO 12010:2012)
NS-EN ISO 12010:2019 Water quality — Determination of short-chain polychlorinated alkanes (SCCP) in water — Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO 12010:2019)

Spanish Association for Standardization (UNE)

UNE-EN ISO 12010:2020 Water quality - Determination of short-chain polychlorinated alkanes (SCCP) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO 12010:2019)
UNE 77226:1999 STATIONARY SOURCE EMISSIONS. DETERMINATION OF MASS CONCENTRATION OF SULFUR DIOXIDE. ION CHROMATOGRAPHY METHOD.
UNE-EN ISO 12010:2014 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO 12010:2012)
AENOR UNE-EN ISO 12010:2020 Water quality - Determination of short-chain polychlorinated alkanes (SCCP) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO 12010:2019)

Danish Standards Foundation

DANSK DS/ISO 12010:2019 Water quality – Determination of short-chain polychlorinated alkanes (SCCP) in water – Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
DS/ISO 12010:2012 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
DS/ISO 11632:1998 Stationary source emissions - Determination of mass concentration of sulfur dioxide - Ion chromatography method
DANSK DS/EN ISO 12010:2019 Water quality – Determination of short-chain polychlorinated alkanes (SCCP) in water – Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO 12010:2019)

VN-TCVN

TCVN 6750-2000 Stationary source emissions.Determination of mass concentration of sulfur dioxide.Ion chromatography method

RO-ASRO

STAS 10564/2-1981 PLASMA GUTTING OF METALLS Grades of quality

Others: There are many ions in the first mass spectrometry, but few ions in the second mass spectrometry