GB/T 24582-2009 in English

SUPERSEDED

Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry

Issued on:2009-10-30
Implemented on:2010-06-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $120.00
$117.00

Standard No:	GB/T 24582-2009
Document status:	SUPERSEDED
Superseded by:	GB/T 24582-2023 Test method for measuring surface metal impurity content of polycrystalline silicon—Acid extraction-inductively coupled plasma mass spectrometry method
Superseded on:	2024-03-01
Title in English:	Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry
Title in Chinese:	酸浸取电感耦合等离子质谱仪测定多晶硅表面金属杂质
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2009-10-30
Implemented on:	2010-06-01
ICS Classification:	29.045-Semiconducting materials
Chinese Classification:	H80-Semimetal and semiconductor material in general
Professional Classification:	GB-National Standard
Related Keywords:	polycrystalline silicon polycrystalline silicon block plasma mass spectrometry scopethis standard test method plasma mass spectrometer
Related Topics:	mass spectrometer Mass spectrometer standard metal impurities inductive coupling Impurities Inductively Coupled Mass Spectrometer inductive coupling Inductance mass spectrometer thermal ionization mass spectrometer Inductive plasma Mass spec impurity Ion Analyzer MS ionization voltage Mass Spec + Precursor Ion Peak Inductively Coupled Plasma Mass Spectrometry Mass spectrometry molecular weight more than 29 Inductive plasma mass spectrometer multiple ion mass spectrometer Mass Spectrometry Molecular Weight Multi 1 Mass spectrum molecular weight more than 33 Silicon metal meter mass spectrometry field ionization Mass Spectrometry Ionization Species Impurities in English Plasma mass spectrometer plasma mass spectrometry Mass spectrum molecular weight more than 32 Product Surface Impurities Mass spec impurity Mass Spectrometry Molecular Weight Multi 3 Are there many X-type ions in the secondary mass spectrometer? Plasma Impurity Spectroscopy Ion Hydrazine Mass Spectrometer Mass spectrum molecular weight multi 17 Mass spectrum molecular weight more than 58 plasma mass spectrometry Mass Spectrometer Precursor and Product Ions Mass spectrum molecular weight more than 38 Mass spectrum molecular weight more than 38 The mass spectrum molecular weight is more than 42 Plasma Mass spec impurity ions Silicon metal meter Ion Analyzer Coupled inductor Mass Spectrometry Molecular Weight Multi 2 Inductive coupling+ New Inductively Coupled Plasma Mass Spectrometer Triple Quadruple Inductively Coupled Plasma Mass Spectrometer Mass spectrometry more than 20 molecular weight Mass spectrometry has many impurity peaks Plasma inductive coupling Plasma inductive coupling surface mass spectrometer Mass spectrum molecular weight more than 20 Mass Spectrometry Molecular Weight Multi 7 Mass Spectrometry Metals Mass spectrum molecular weight more than 40 Impurity mass spectrometry Mass Spec Ion Hydrazine The mass spectrometer has a molecular weight of more than 37 field ionization mass spectrometry Inductively Coupled Plasma mass spectrometer ion ratio mass spectrometer Combined mass spectrometer mass spectrometry ion spectrum Inductive coupling standard mass spectrometer plasma icpms inductive coupling instrument 58 ions in the mass spectrum Sulfuric acid inductive coupling Mass spectrum molecular weight more than 30 Mass spectrum molecular weight more than 31 plasma coupling Plasma instrument Fe ion mass spectrometry Mass spectrum molecular weight more than 28 metal impurities Mass spectrometry negative ions more than 25 Mass spec impurity peak Mass Spectrum Impurities Mass spectrum molecular weight more than 27 Mass spectrum molecular weight more than 28 Acid Leaching-Inductively Coupled Plasma Mass Spectrometer Determination of Metals on Polysilicon Surface Mass spectrum molecular weight more than 45 Mass spectrum molecular weight more than 54 polyatomic ion How many mass spectrometers Inductively Coupled Plasma Mass Spectrometry Mass spec b-ions Ion Hydrazine MS/MS Impurities determined by mass spectrometry ion trap micro mass spectrometer hybridization mass spectrometry multispectral instrument multidimensional mass spectrometry Mass spectrum molecular weight more than 24 Extract metal impurities Coupled inductor ion mass spectrometry Mass Spectrometer Various Ions open ionization mass spectrometer plasma surface metal Mass spectrum molecular weight more than 22 multistage mass spectrometer Multiple Receiver Plasma Mass Spectrometry Inductive Plasma Mass Spectrometry surface plasmon There are many impurities in hydrochloric acid MS ionization voltage Inductively coupled mass spectrometer plasma mass spectrometry MS ion cluster Plasma mass spectrometer Heavy metal ion meter Inductively Coupled Plasma Mass Spectrometry Molecular Weight Multi 11 Routine Maintenance of Ion Trap Mass Spectrometers surface micro mass spectrometer Mass Spectrum Peak Precursor Ion Mass spectrum molecular weight more than 69 Mass Spec Molecules Multi 18 Mass spectrum molecular weight more than 33 mass spectrometer metal Magnetic metal impurities Mass spectrum molecular weight more than 50 Mass spectrometry positive ions more than 31 Method for Determination of Performance of Inductively Coupled Plasma Mass Spectrometer Voltage ionization + mass spectrometry multiple mass spectrometry Plasma silicon Mass spectrometry negative ions more than 16 Ion Hydrazine Mass Spectrometry Plasma silicon Magnetic metal impurities Peptide + MS Ionization Plasma mass spectrometer X7 Inductively Coupled Plasma Mass Spectrometers and Mass Spectrometers Plasma coupled mass spectrometer Inductively Coupled Plasma Mass Spectrometer ion trap multistage mass spectrometer Multiple Electron Mass Spectrometry Inductively Coupled Charge Plasma Mass Spectrometer Mass spec major ions Mass Spectrum Impurities New Ion Trap Mass Spectrometer mass spectrum silica peak Inductively Coupled Plasma Mass Spectrometry Sample Preparation There are many ions in the first mass spectrometry, but few ions in the second mass spectrometry Mass spectrum molecular weight more than 41 Mass spectrometer bromide ion Mass Spectrometer Ion Trap Metal Impurity Analysis Mass spectrum molecular weight more than 27 Mass Spectrometry Precursor Ion Peak Mass Spectrometer Precursor Ions Inductively coupled plasma mass spectrometry using Mass Spec + Precursor Ion Peak icpms inductively coupled plasma mass spectrometry Mass spectrum is 15 more than molecular weight The mass spectrum molecular weight is more than 76 Mass spectrum molecular weight more than 98 Mass spec impurity peak Mass Spectrometry Primary Ionization Mass Spectrometry Multivalent Ions Mass Spectrometer Ion Trap . Mass spectrometer Mass spectrometer specific Impurity profile Mass spectrum molecular weight more than 64 MS coupled peaks Ion Trap Mass Spectrometers and Mass Spectrometers Son + mass + spectrometer + instrument Mass spectrum molecular weight more than 43 Inductive coupling instrument Spectrometer metal detection Mass spectrometer ion pair The mass spectrometer molecular weight is much more Impurity standard polyacid mass spectrometry Mass Spectrometry Ionization Technology Mass Spectrometry Ionization Technology Multi-Particle Spectrometer MSMS Inductive high frequency plasma instrument Inductive plasma instrument Induction Plasma Ion trap mass spectrometer dual plasma mass spectrometer The molecular weight of mass spectrum is more than 60 multiphoton ionization Mass Spectrometer Precursor Ion Product Ion Mass Spectrometry Molecular Weight Multi 14 Mass spectrum molecular weight more than 37 Impurity profile Mass spectrometry negative ions more than 44 Mass spectrum molecular weight more than 66 Mass spectrum molecular weight multi 17 "Mass spectrometer Plasma Inductive Coupler surface mass spectrometer Plasma Inductively Coupled Mass Spectrometer Metal mass spectrometer Multi-Field Coupled Instruments Plasma measurement Inductively Coupled Ion Mass Spectrometry Metal Mass Spectrometer GBT24582 GB/T 24582-2009 for metal impuritiesmedical What is the ionization source of electron coupled mass spectrometer? Mass spectrometry metal ions Inventor of mass spectrometry soft ionization Mass spectrometer ionization method Inductively coupled plasma mass spectrometer won the bid Hard acidic metal ions Mass Spectrometry 4500 Split Ion Source Mass spectrometry 46 PE inductively coupled plasma mass spectrometer won the bid Corresponding wavelength of metal ion inductive coupling ICPoes detects impurities in gold Metal material spectrometer Can a mass spectrometer measure mixtures? Metal silicon industry quality Detection of bulk metal impurities in silicon wafers Texture analyzer for bread testing Mass spectrometer ion source shipped from the factory Standard impurity spectrum Metal ion detection Mass spectrometer weekly quality control National monitoring of plasma mass spectrometer Multi-stage mass spectrometry representation method

《GB/T 24582-2009酸浸取电感耦合等离子质谱仪测定多晶硅表面金属杂质》由TC203（全国半导体设备和材料标准化技术委员会）归口，TC203SC2（全国半导体设备和材料标准化技术委员会材料分会）执行，主管部门为国家标准化管理委员会。
本标准规定了用酸从多晶硅块表面浸取金属杂质,并用电感耦合等离子质谱仪定量检测多晶硅表面上的金属杂质痕量分析方法。
本标准适用于碱金属、碱土金属和第一系列过渡元素如钠、钾、钙、铁、镍、铜、锌以及其他元素如铝的检测。
本标准适用于各种棒、块、粒、片状多晶表面金属污染物的检测。由于块、片或粒形状不规则,面积很难准确测定,故根据样品重量计算结果,使用的样品重量为50g~300g,检测限为0.01ng/mL。

Scope

This standard specifies the analysis method for leaching metal impurities from the surface of polycrystalline silicon block with acid, and quantitatively detecting the trace amount of metal impurities on the surface of polycrystalline silicon with inductively coupled plasma mass spectrometer. This standard applies to the detection of alkali metals, alkaline earth metals and the first series of transition elements such as sodium, potassium, calcium, iron, nickel, copper, zinc and other elements such as aluminum. This standard applies to the detection of metal contaminants on the surface of various rods, blocks, grains, and flakes. Due to the irregular shape of blocks, flakes or granules, it is difficult to accurately measure the area. Therefore, according to the calculation results of the sample weight, the sample weight used is 50 g to 300 g, and the detection limit is 0.01 ng/mL. The concentration, composition, temperature and leaching time of the acid determine the depth of surface corrosion and the leaching benefit of surface contaminants. Less than 1% of the sample weight was etched away in this experimental method. This standard applies to the determination of samples with a weight of 25 g to 5000 g. In order to achieve the purpose of arbitration, this test method stipulates that the weight of the sample is about 300 g.

More samples: JJG 21-2008 QC/T 942-2021 GB 18306-2015

Sample only — not a preview of GB/T 24582-2009

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