Mass spec impurity ions

Mass spec impurity ions, Total:165 items.

The international standard classification for "Mass spec impurity ions" includes: Semiconducting materials , Chemical analysis , Inorganic chemicals in general , Testing of metals , Physicochemical methods of analysis , Other non-ferrous metals and their alloys , Analytical chemistry , Chemical analysis of metals , Titanium and titanium alloys , Nickel, chromium and their alloys , Testing of metals in general , Measuring instruments , Other pipeline components .

The Chinese standard classification for "Mass spec impurity ions" includes: Semimetal and semiconductor material in general , Electron optics and other physical optics instrument , Inorganic chemicals in general , Semimetal and semiconductor material analysis method , Synthetic materials in general , Elemental semiconductor material , Basic standards and general methods , Rare metals and their alloys analysis method , Hygiene, safety and labor protection , Basic Subject in general , Light metals and their alloys analysis method , Rare refractory metals and their compounds , Rare light metals and their alloys , Heavy metals and their alloys analysis method , Mass spectrometer, liquid spectrometer, energy spectrometer and combined devices of them , Metallochemistry analysis method in general , Analysis methods for toxic substances in water , Boiler and its auxiliary equipment , Quartz glass .

General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China

GB/T 12690.13-2003 Chemical analysis methods for non-rare earth impurities of rare earth metals and their oxides - Determination of molybdenum and tungsten content - Inductively coupled plasma atomic
GB/T 20176-2006 Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials
GB/T 30903-2014 Inorganic chemicals for industrial use―Determination of impurity element―Inductively coupled plasma mass spectrometry(ICP-MS)
GB/T 13747.27-2020 Methods for chemical analysis of zirconium and zirconium alloys—Part 27：Determination of trace impurities content—Inductively coupled plasma mass spectrometry
GB/T 29852-2013 Test Method for Measuring Phosphorus, Arsenic and Antimony in Silicon Materials Used for Photovoltaic Applications by Secondary Ion Mass Spectrometry
GB/T 24582-2009 Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry
GB/T 25186-2010 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of relative sensitivity factors from ion-implanted reference materials
GB/T 30902-2014 Inorganic chemicals for industrial use—Determination of impurity element—Inductively coupled plasma optical emission spectrometry(ICP-OES)
GB/T 31197-2014 Inorganic chemicals for industrial use-Determination of impurity anions - Ion chromatography method
GB/T 31854-2015 Test method for measuring metallic impurities content in silicon materials used for photovoltaic applications by inductively coupled plasma mass spectrometry
GB/T 29849-2013 Test method for measuring surface metallic contamination of silicon materials used for photovoltaic applications by inductively coupled plasma mass spectrometry
GB/T 42240-2022 Nanotechnology—Measurement of metallic impurities in graphene powder—Inductively coupled plasma mass spectrometry
GB/T 29851-2013 Test method for measuring boron and aluminium in silicon materials used for photovoltaic applications by secondary ion mass spectrometry
GB/T 43663-2024 Surface chemical analysis—Secondary-ion mass spectrometry—Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
GB/T 24582-2023 Test method for measuring surface metal impurity content of polycrystalline silicon—Acid extraction-inductively coupled plasma mass spectrometry method

中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会

GB/T 35925-2018 Determination of impurity fluorine ion in water soluble chemicals—Ion chromatography method
GB/T 35418-2017 Nanotechnologies―Determination of elemental impurities in samples of carbon nanotubes―Inductively coupled plasma mass spectrometry

工业和信息化部

YS/T 540.5-2018 Methods for chemical analysis of vanadium-Part 5:Determination of impurity contents-Inductively coupled plasma atomic emission spectrometry
YS/T 870-2020 Method for chemical analysis of aluminium - Determination of trace impurities contents - Inductively coupled plasma mass spectrometry
YS/T 1261-2018 Method for chemical analysis of hafnium-Determination of impurity element contents-Inductively coupled plasma atomic emission spectrometry
YS/T 1496-2021 Analysis method for palladium compounds Determination of impurity anion content Ion chromatography
YS/T 1497-2021 Analysis method for platinum compounds Determination of impurity anion content Ion chromatography

国家市场监督管理总局、中国国家标准化管理委员会

GB/T 37049-2018 Test method for the content of metal impurity in electronic grade polysilicon—Inductively coupled-plasma mass spectrometry method
GB/T 41153-2021 Determination of boron,aluminum and nitrogen impurity content in silicon carbide single crystal―Secondary ion mass spectrometry
GB/T 40129-2021 Surface chemical analysis—Secondary ion mass spectrometry—Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer

Professional Standard - Non-ferrous Metal

YS/T 980-2014 Determination of impurities of high purity gallium oxide—Inductively coupled plasma-mass spectrmetry
YS/T 900-2013 Methods for Chemical Analysis of The High Purity Tungsten - Determination of Trace Impurity Element Content - Inductively Coupled Plasma Mass Spectrometry
YS/T 1601-2023 etermination of impurity content in hexachlorodisilane—Inductively coupled plasma mass spectrometry
YS/T 666-2008 Chemical analysis emthods of gallium for industrial use - Determination of impurity elements - Inductively coupled plasma atomic emission spectrometric method
YS/T 898-2013 Methods for Chemical Analysis of The High Purity Tantalum - Determination of Trace Impurity Element Content - Inductively Coupled Plasma Mass Spectrometry
YS/T 896-2013 Methods for Chemical Analysis of High Purity Niobium - Determination of Trace Impurity Element Content - Inductively Coupled Plasma Mass Spectrometry
YS/T 244.9-2008 Chemical analysis methods of high purity aluminum Part 9: Determination of trace impurities in high pruity aluminumby inductively coupled mass spectrometry
YS/T 34.1-2011 Method for chemical analysis of the high-purity arsenic—Inductive coupling plasma mass spectrum (ICP-MS) for determinating the concentration of elements in the high-purity arsenic
YS/T 742-2010 Methods for chemical analysis of gallium oxide Determination of impurities Inductively coupled plasma mass spectrometer method
YS/T 870-2013 Chemical Analysis of High Purity Aluminium-Determination of Trace Impurities Inductively Coupled Plasma Mass Spectrometry
YS/T 892-2013 Methods for Chemical Analysis of High Purity Titanium - Determination of Trace Impurity Element Content - Inductively Coupled Plasma Mass Spectrometry
YS/T 473-2015 Methods for chemical analysis industrial gallium―Determination of impurity elements―ICP-MS analytical method
YS/T 473-2005 Determination of impurity elements in gallium for industrial use - ICP-MS analytical method

Group Standards of the People's Republic of China

T/CMES 08002-2020 Determination of Ferroniobium Impurity Elements by Inductively Coupled Plasma Atomic Emission Spectrometry
T/CBWQA 0003-2013 Dirt separator
T/SXQCA 001-2023 Water quality-Determination of water soluble cations（Sr2+、Ba2+） -Ion chromatography
T/CIS 17004-2020 Ambient ionization device
T/CASAS 010-2019 Determination of Trace Impurities Concentration and Distribution in GaN Materials by Secondary Ion Mass Spectrometry
T/CNIA 0061-2020 Determination of Impurity Content in Silicon Tetrachloride for Silicon Epitaxy by Inductively Coupled Plasma Mass Spectrometry
T/CNIA 0141-2022 Determination of metal impurity content in hydrogen for polysilicon production by inductively coupled plasma mass spectrometry
T/ZJATA 0023-2024 Determination of perchlorate in water Ion chromatography-mass spectrometry/mass spectrometry
T/CMES 08001-2020 Determination of Ferrochrome Impurity Elements by Inductively Coupled Plasma Primary Emission Spectrometry
T/CNIA 0120-2021 Determination of trace impurity elements in high-purity nitric acid for the electronics industry by inductively coupled plasma mass spectrometry
T/CNIA 0017-2019 Determination of Impurity Content in Chlorosilanes for Polysilicon by Inductively Coupled Plasma Mass Spectrometry
T/CNIA 0118-2021 Determination of trace impurity elements in high-purity hydrofluoric acid for the electronics industry by inductively coupled plasma mass spectrometry
T/NAIA 0169-2022 Water Quality Determination of Ammonia Nitrogen by Ion Chromatography
T/CASAS 009-2019 Determination of Trace Impurities Concentration and Distribution in Semi-insulating SiC Materials by Secondary Ion Mass Spectrometry

Yunnan Provincial Standard of the People's Republic of China

DB53/T 501-2013 Inductively Coupled Plasma Mass Spectrometry for Determination of Trichlorosilane Impurity Element Content in Polysilicon

Professional Standard - Commodity Inspection

SN/T 2698-2010 Elemental analysis of impurities in tungsten products—Inductively coupled plasma atomic emission spectrometric method
SN/T 3363-2012 Determination of impurity elements in pig lead-Inductively coupled plasma atomic emission spectrometry
SN/T 2047-2008 Determination of impurities in copper concentrates for import - Inductively coupled plasma atomic emission spectrometry
SN/T 3796-2014 Determination of acid soluble impurity elements (lead, cadmium, chromium, arsenic, mercury, copper, zinc, manganese, nickel, cobalt) in talc powder - Inductively coupled plasma mass spectrometry method (ICP-MS)

Professional Standard - Environmental Protection

HJ 778-2015 Water quality - Determination of iodide - Ion chromatiography
HJ 669-2013 Water quality-Determination of phosphate-Ion chromatography
HJ/T 84-2001 Water quality -- Determination of inorangic anions -- Ion chromatography method

Association Standard - China Boiler Water Quality Association Standards

CBWQA/T 0003-2013 Dirt separator

Inner Mongolia Provincial Standard of the People's Republic of China

DB15/T 1243-2017 Determination of Impurity Content in Resins by Inductively Coupled Plasma Emission Spectrometry

Qinghai Provincial Standard of the People's Republic of China

DB63/T 1611-2017 Determination of Impurity Content in Silicon Tetrachloride as Raw Material of Optical Fiber Preform by Inductively Coupled Plasma Mass Spectrometry

Professional Standard - Medicine

YY/T 1740.3-2024 Clinical mass spectrometer-Part 3 : Inductively coupled plasma mass spectrometry

Professional Standard - Agriculture

73药典四部-2015 0412 Inductively coupled plasma mass spectrometry
53药典四部-2020 0412 Inductively coupled plasma mass spectrometry
HJ 1288-2023 Water quality-Determination of acrylic acid-Ion chromatography
HJ 1288-2023 Water quality-Determination of acrylic acid-Ion chromatography

Professional Standard - Building Materials

JC/T 2027-2010 Determination of impurities in high purity quartz - Inductively coupled plasma atomic emission spectrometry

国家质量监督检验检疫总局

SN/T 4377-2015 Determination of impurities in copper and copper alloy scraps―Inductively coupled plasma atomic emission spectrometry

Professional Standard - Nuclear Industry

EJ/T 20170-2018 Determination of 20 trace impurity elements in metallic uranium by inductively coupled plasma atomic emission spectrometry

Shandong Provincial Standard of the People's Republic of China

DB37/T 4152-2020 Determination of water quality glyphosate ion chromatography
DB37/T 4151-2020 Determination of Acrylic Acid in Water by Ion Chromatography

Professional Standard - Electron

SJ 20713-1998 Method for the determination of 12 species of impurities including copper, maganese, magnesium, vanadium, titanium in high-purity gallium used for gallium arsenide by ICP spectrometry

Hebei Provincial Standard of the People's Republic of China

DB13/T 5874-2023 Chromatographic method for determination of impurities in hydrogen fluoride used in the electronics industry

Jiangxi Provincial Standard of the People's Republic of China

DB36/T 1839-2023 Determination of iodide in water quality by inductively coupled plasma mass spectrometry

Hunan Provincial Standard of the People's Republic of China

DB43/T 2957-2024 Water quality-Determination of perchlorate-Ion chromatography

RU-GOST R

GOST R 57061-2016 Copper. Measurement of impurities mass fraction in copper by an inductively coupled plasma mass spectrometry method
GOST R 57060-2016 Copper. Measurement of impurities mass fraction in copper by an inductively coupled plasma atomic emission spectrometry method
GOST 10671.0-1974 Reagents. General requirements for methods of analysis of anions impurities
GOST 27566-1987 Superpure substances. Method of atomic emission spectroscopy for determination of chemical elements impurities in liquid-phase substances
GOST 10671.0-2016 Reagents. General requirements for methods of analysis of anions impurities
GOST 34247-2017 Copper concentrate. Measurement of copper and impurities weight fraction by an inductively coupled plasma atomic emission spectrometry method
GOST R 56240-2014 Copper. Spectral methods of impurity analysis
GOST R 55845-2013 Reagents and high purity substances. Determination of impurities of chemical elements by atomic-emission spectrometry with inductively coupled plasma

International Organization for Standardization (ISO)

ISO 14237:2000 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
ISO 13084:2018 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
ISO/TS 22933:2022 Surface chemical analysis — Secondary ion mass spectrometry — Method for the measurement of mass resolution in SIMS
ISO/TS 13278:2017 Nanotechnologies - Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry
ISO 13084:2011 Surface chemical analysis - Secondary-ion mass spectrometry - Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
ISO 14911:1998 Water quality - Determination of dissolved Li<(hoch)+>, Na<(hoch)+>, NH<(Index)4><(hoch)+>, K<(hoch)+>, Mn<(hoch)2+>, Ca<(hoch)2+>, Mg<(hoch)2+>, Sr<(hoch)2+> and Ba<(hoch)2+> using ion chromatography - Method for water and waste water

Korean Agency for Technology and Standards (KATS)

KS L 1627-2014(2019) Testing method of impurities in high purity cobalt ingot by inductively coupled plasma spectrometric
KS K 0195-2006 Non-ionic surface active agents-Determination of cloud point index-Volumetric method
KS L 1627-2014 Testing method of impurities in high purity cobalt ingot by inductively coupled plasma spectrometric
KS L 1627-2019 Testing method of impurities in high purity cobalt ingot by inductively coupled plasma spectrometric
KS I ISO 17294:2014 Water quality — Application of inductively coupled plasma mass spectrometry(ICP-MS)
KS I ISO 17294-2014(2021) Water quality — Application of inductively coupled plasma mass spectrometry(ICP-MS)
KS I ISO 17294-2021 Water quality — Application of inductively coupled plasma mass spectrometry(ICP-MS)
KS D ISO 18114-2020 Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS D ISO 18114-2005(2020) Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS I ISO 14911:2009 Water quality-Determination of dissolved Li+, Na+,NH4+, K+, Mn2+, Ca2+, Mg2+, Sr2+ and Ba2+ using ion chromatography-Method for water and waste water

GSO

GSO ISO 26062:2013 Nuclear technology -- Nuclear fuels -- Procedures for the measurement of elemental impurities in uranium- and plutonium-based materials by inductively coupled plasma mass spectrometry
GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
BH GSO ISO 13084:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
OS GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
BH GSO ISO 26062:2016 Nuclear technology -- Nuclear fuels -- Procedures for the measurement of elemental impurities in uranium- and plutonium-based materials by inductively coupled plasma mass spectrometry
GSO ISO 18114:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
OS GSO ISO 26062:2013 Nuclear technology -- Nuclear fuels -- Procedures for the measurement of elemental impurities in uranium- and plutonium-based materials by inductively coupled plasma mass spectrometry
GSO ISO 14237:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
BH GSO ISO 23830:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry

British Standards Institution (BSI)

BS ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
BS ISO 13084:2011 Surface chemical analysis. Secondary-ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
PD ISO/TS 13278:2017 Nanotechnologies. Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry
BS ISO 13084:2018 Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
BS ISO 20411:2018 Surface chemical analysis. Secondary ion mass spectrometry. Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
BS DD ISO/TS 13278:2011 Nanotechnologies. Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry
BS PD ISO/TS 13278:2017 Nanotechnologies. Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry

VN-TCVN

TCVN 2315-1978 Reagents.Method for the determination of anions impurities

American Society for Testing and Materials (ASTM)

ASTM D5996-05 Standard Test Method for Measuring Anionic Contaminants in High-Purity Water by On-Line Ion Chromatography
ASTM C1287-95(2001) Standard Test Method for Determination of Impurities in Uranium Dioxide by Inductively Coupled Plasma Mass Spectrometry
ASTM C1287-10 Standard Test Method for Determination of Impurities in Nuclear Grade Uranium Compounds by Inductively Coupled Plasma Mass Spectrometry
ASTM C1287-18 Standard Test Method for Determination of Impurities in Nuclear Grade Uranium Compounds by Inductively Coupled Plasma Mass Spectrometry
ASTM E1438-06 Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
ASTM C1637-21 Standard Test Method for Determination of Impurities in Plutonium Materials—Acid Digestion and Inductively Coupled Plasma-Mass Spectroscopy (ICP-MS) Analysis
ASTM F1366-92(1997)e1 Standard Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry
ASTM E1504-92(1996) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM C1637-13 Standard Test Method for the Determination of Impurities in Plutonium Metal: Acid Digestion and Inductively Coupled Plasma-Mass Spectroscopy (ICP-MS) Analysis
ASTM E1504-92(2001) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM C1637-06 Standard Test Method for the Determination of Impurities in Plutonium Metal: Acid Digestion and Inductively Coupled Plasma-Mass Spectroscopy (ICP-MS) Analysis
ASTM E1504-11(2019) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-06 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-11 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM C1432-03 Standard Test Method for Determination of Impurities in Plutonium: Acid Dissolution, Ion Exchange Matrix Separation, and Inductively Coupled Plasma-Atomic Emission Spectroscopic (ICP/AES) Analysis
ASTM C1432-15 Standard Test Method for Determination of Impurities in Plutonium: Acid Dissolution, Ion Exchange Matrix Separation, and Inductively Coupled Plasma-Atomic Emission Spectroscopic (ICP/AES) Analysis
ASTM C1432-99 Standard Test Method for Determination of Impurities in Plutonium: Acid Dissolution, Ion Exchange Matrix Separation, and Inductively Coupled Plasma-Atomic Emission Spectroscopic (ICP/AES) Analysis
ASTM C1432-03(2008) Standard Test Method for Determination of Impurities in Plutonium: Acid Dissolution, Ion Exchange Matrix Separation, and Inductively Coupled Plasma-Atomic Emission Spectroscopic (ICP/AES) Analysis

Association Francaise de Normalisation

NF X21-070*NF ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials.
XP ISO/TS 13278:2018 Nanotechnologies - Determination of impurities in carbon nanotube (CNT) samples by induced plasma mass spectroscopy (ICP-MS)
XP T16-207*XP ISO/TS 13278:2018 Nanotechnologies - Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry
NF ISO 26062:2010 Nuclear technology - Nuclear fuels - Procedures for measuring elemental impurities in uranium and plutonium materials by inductively coupled plasma mass spectrometry
NF ISO 14237:2010 Chemical analysis of surfaces - Mass spectrometry of secondary ions - Determination of boron atoms in silicon using uniformly doped materials

CZ-CSN

CSN 68 4154-1989 Concentration of the inpurities by he ion exchange method

PL-PKN

PN R66147-1973 Oil seeds Determination of impuri?ies

Institute of Electrical and Electronics Engineers (IEEE)

IEEE Std 802.15.4-2020/Cor 1-2022 (Corrigendum to IEEE Std 802.15.4-2020 as amended by IEEE Std 802. IEEE Standard for Low-Rate Wireless Networks Corrigendum 1: Correction of Errors Preventing Backward Compatibility

GOSTR

PNST 499-2020 Nanotechnologies. Сarbon nanotubes. Determination of chemical element impurities by inductively coupled plasma mass spectrometry method
GOST 27566-2020 Superpure substances. Determination of impurities of chemical elements by atomic emission spectrometry methods in liquid-phase substances

Japanese Industrial Standards Committee (JISC)

JIS K 0157:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
JIS K 0158:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
JIS K 0143:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
JIS K 0143:2000 Surface chemical analysis -- Secondary ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
JIS K 0133:2000 General rules for high frequency plasma mass spectrometry
JIS K 0133:2007 General rules for high frequency plasma mass spectrometry

International Electrotechnical Commission (IEC)

ISO/TS 13278:2011 Nanotechnologies - Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry
ISO TS 13278:2011 Nanotechnologies - Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry
ISO/TS 13278:2011 Nanotechnologies - Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry

SCC

10/30199193 DC BS ISO 13084. Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time of flight secondary ion mass spectrometer
DANSK DS/ISO/TS 13278:2017 Nanotechnologies – Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry
CEI 15-16:1997 Test methods for the determination of ionic impurities in electrical insulating materials by liquid extraction
BS ISO 14237:2000 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials

Danish Standards Foundation

DS/ISO/TS 13278:2012 Nanotechnologies - Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry

German Institute for Standardization

DIN EN ISO 17294-1:2022-07 Water quality - Application of inductively coupled plasma mass spectrometry (ICP-MS) - Part 1: General guidelines (ISO/DIS 17294-1:2022); German and English version prEN ISO 17294-1:2022 / Note: Date of issue 2022-06-17*Intended as replacement for DIN ...
DIN 25708:1995 Determination of metallic impurities in nuclear fuels by optical emission spectrometry with inductively coupled plasma excitation

Indonesia Standards

SNI 02-1189-1989 Water and oil palm impurities separator, Performance test

SE-SIS

SIS SS-ISO 1265:1987 Plastics - Polyvinyl chloride resins - Determination of number of impurities and foreign particles

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