GB/T 37049-2018 in English

VALID

Test method for the content of metal impurity in electronic grade polysilicon—Inductively coupled-plasma mass spectrometry method

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Implemented on:2019-04-01
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Standard No:	GB/T 37049-2018
Document status:	VALID
Title in English:	Test method for the content of metal impurity in electronic grade polysilicon—Inductively coupled-plasma mass spectrometry method
Title in Chinese:	电子级多晶硅中基体金属杂质含量的测定电感耦合等离子体质谱法
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Implemented on:	2019-04-01
ICS Classification:	77.040.30-Chemical analysis of metals
Chinese Classification:	H17-Semimetal and semiconductor material analysis method
Professional Classification:	GB-National Standard
Related Keywords:	electronic grade polysilicon electronic grade polysilicon detection limit coupled-plasma mass spectrometry method introduction interpretation standard method internal standard method
Related Topics:	If the mass of the precursor ion and the mass of the product ion ion trap MS quadruple ion trap mass spectrometry Precursor ion peak in mass spectrum Inductively Coupled Plasma MS ionization voltage Mass Spec + Precursor Ion Peak Mass spectrometry molecular weight more than 29 Features of multistage mass spectrometry multiple ion mass spectrometer Mass Spectrometry Molecular Weight Multi 1 Mass spectrum molecular weight more than 33 Selection of Precursor Ion Peaks in MS/MS Spectrometry mass spectrometry field ionization Mass Spectrometry Ionization Species Plasma Mass Spectrometry Triple Quadrupole Inductively Coupled Plasma Mass Spectrometry Determination of Metal Elements in Solid Waste by Inductively Coupled Plasma Mass Spectrometry gold ion potential plasma mass spectrometry Ion Trap MS/MS Mass Spectrum Molecular Weight Mass spectrum molecular weight more than 32 metal ion plasma in english Mass spectrum is 18 more than molecular weight silicon in solution ion pairs in mass spectrometry Mass Spectrometry Molecular Weight Multi 3 Silicon content in gas Mass Spectrometry Molecular Weight Are there many X-type ions in the secondary mass spectrometer? Plasma Impurity Spectroscopy Mass spectrum molecular weight multi 17 Mass spectrum molecular weight more than 18 Mass spectrum molecular weight more than 58 Secondary Mass Spectrometry Product Ions Determination of Metal Elements in Solid Waste by Inductively Coupled Plasma Mass Spectrometry Inductively Coupled Plasma Mass Spectrometry Tertiary ion trap mass spectrometry Mass spectrum molecular weight more than 38 Mass spectrum molecular weight more than 38 The mass spectrum molecular weight is more than 42 Mass spec impurity ions Precursor ions for mass spectrometry mass spec molecular mass Gas impurity content Mass spectrometric molecular weight plasma mass spectrometry Precursor Ions in Mass Spectrometry Mass Spectrometry Molecular Weight Multi 2 New Inductively Coupled Plasma Mass Spectrometer Mass spectrum molecular weight more than 18 Inductively Coupled Plasma Nonmetals Silicon content in gas Plasma and Mass Spectrometry Mass spectrometry more than 20 molecular weight Mass spectrometry has many impurity peaks The molecular weight in the tof mass spectrum is more than 23 Mass spectrum molecular weight more than 20 Mass Spectrometry Molecular Weight Multi 7 Mass Spectrometry Metals Mass spectrum molecular weight more than 40 Quadrupole Inductively Coupled Plasma Mass Spectrometer Mass Spec Ion Hydrazine The mass spectrometer has a molecular weight of more than 37 field ionization mass spectrometry Inductively Coupled Plasma Mass Spectrometry Manganese mass spectrometry ion spectrum The molecular weight in the mass spectrum is more than 7 Mass Spectrometry Molecular Weight 58 ions in the mass spectrum Mass Spectrum Molecular Weight 26 Mass spectrum molecular weight more than 30 Mass spectrum molecular weight more than 31 Fe ion mass spectrometry Mass spectrum molecular weight more than 28 How to select product ions in secondary mass spectrometry metal impurities Ion source for mass spectrometry Mass spectrometry negative ions more than 25 Mass Spectrum Molecular Weight 43 Mass spec impurity peak Mass spectrum molecular weight more than 27 mass spec ion peak mass Mass spectrum molecular weight more than 28 plasma mass spectrometry Mass spectrum molecular weight more than 45 Mass spectrum molecular weight more than 54 Chloride ion impurities in water Mass Spectrum Molecular Weight 36 How many electron volts are energetic electrons in the plasma Mass spec b-ions Ion Hydrazine MS/MS mass spectrometric product ions Mass spectrum molecular weight more than 36 How to Determine Precursor Ions and Product Ions in Quadrupole Mass Spectrometry How are precursor and product ions in quadrupole mass spectrometry How are precursor ions and product ions determined in quadrupole mass spectrometry? Precursor Ions in Quadrupole Mass Spectrometry Precursor and Product Ions in Quadrupole Mass Spectrometry in-solution plasma method precursor ion mass Plasma mass spec pure Inductively Coupled Plasma Definition Mass spectrum molecular weight more than 24 plasma coupled mass spectrometry ion mass spectrometry Ions in a mass spectrum precursor ion mass Mass spectrum molecular weight more than 22 multistage mass spectrometer Major ions in mass spectrometry ion trap MS How to solve primary mass spectrometry and secondary mass spectrometry Multiple Receiver Plasma Mass Spectrometry How MSMS selects ions electronic hybridization Quantity of product ions in mass spectrometry Detecting Transitions in Mass Spectrometry MSIM MS ionization voltage MS ion cluster Novel Plasma Mass Spectrometry DC Plasma Mass Spectrometry plasma methylation Mass spectrum molecular weight more than 26 Mass Spectrometry Molecular Weight Multi 11 Mass spectrum molecular weight more than 99 Inductively Coupled Plasma Mass Spectrometry Portable Plasma Mass Spectrometry Mass Spectrum Peak Precursor Ion Mass spectrum molecular weight more than 69 Mass Spec Molecules Multi 18 Ions in mass detection Mass spectrum molecular weight more than 33 Ion peaks in a mass spectrum Metal ion content in water Inductively Coupled Plasma Mass Spectrometry Quadrupole Mass Spectrometry Mass spectrum molecular weight more than 16 eutectic properties Mass spectrum molecular weight more than 50 Mass spectrometry positive ions more than 31 Method for Determination of Performance of Inductively Coupled Plasma Mass Spectrometer Voltage ionization + mass spectrometry Plasma silicon Types of MS Mass spectrometry negative ions more than 16 Metal ion content in water Ion Hydrazine Mass Spectrometry molecular crystal Plasma silicon Inductively Coupled Plasma-Mass Spectrometry Inductively Coupled Plasma Mass Spectrometer ion trap multistage mass spectrometer Multiple Electron Mass Spectrometry Mass spec major ions plasma dual mass spectrometry Inductively Coupled Plasma Dual Mass Spectrometry multistage ion trap mass Inductively Coupled Plasma Mass Spectrometry Sample Preparation Precursor ion peaks in mass spectra 1st stage mass spectrometry and 2nd stage mass spectrometry There are many ions in the first mass spectrometry, but few ions in the second mass spectrometry twinned electrons Mass spectrum molecular weight more than 41 ionic transistor ion pair mass Mass spectrum molecular weight more than 27 Determination of Ion Peaks in Mass Spectrometry Mass Spectrometry Precursor Ion Peak icpms plasma mass spectrometry ms2 first stage mass spectrometry second stage mass spectrometry Mass spectrometry detects ions Ion source in mass spectrometry Major Ions for Mass Spectrometry The molecular weight in the mass spectrum is more than 54 xrd crystal content How to determine the parent ion in mass spectrometry Inductively coupled plasma mass spectrometry using Mass Spec + Precursor Ion Peak icpms inductively coupled plasma mass spectrometry Plasma detection of metals Major Ions in Mass Spectrometry Mass spectrum is 15 more than molecular weight The mass spectrum molecular weight is more than 76 Mass spectrum molecular weight more than 98 Mass spec impurity peak Mass Spectrometry Primary Ionization Ion content in solid Mass Spectrometry Multivalent Ions GB 37049 Features of MSMS Standard Titanium Alloy Plasma Inductively Coupled Used ICP-MS Precursor Ions and Precursor Ions in Mass Spectrometry Mass spectrum molecular weight more than 64 MS coupled peaks icpms plasma mass spectrometry Mass spectrum molecular weight more than 43 质谱中分子量多44 MSMS features Triple rod inductively coupled plasma liquid How much does the plasma burn The mass spectrometer molecular weight is much more Mass Spectrometry Secondary Mass Spectrometry Information Matrix ion MSMS The molecular weight of mass spectrum is more than 60 MS Ion multiphoton ionization Inductively Coupled Plasma Mass Spectrometry for Lead in Water Mass spectrum is 2 more than molecular weight Mass Spectrometry Molecular Weight Multi 14 Mass spectrometry molecular weight more than 15 Mass spectrum molecular weight more than 37 There are many Cl ions in the body Talc powder inductively coupled plasma mass spectrometry Inductively Coupled Plasma Lead Alloy used icpms plasma mass spectrometer Mass spectrometry negative ions more than 44 Mass spectrum molecular weight more than 66 Mass spectrum molecular weight multi 17 Silicon substrate Precursor ion mass for mass spectrometry Ion content in mass spectrometry Mass Spectrometry Molecular Weight Multi 9 Metal impurity content Soil Determination Inductively Coupled Plasma Mass Spectrometry Plasma electronics Ionization method of MS/MS ion trap multistage mass spectrometry Metal Ion Determination Method Water Quality Inductively Coupled Plasma Atomic Mass Spectrometry Inductively Coupled Plasma Mass Spectrometry Food Iodine Inductively Coupled Plasma Mass Spectrometry Ions of mass spectrum 58 GBT37049 GB/T 37049-2018 CuTiTantalum Inductively Coupled Plasma Mass Spectrometry Inorganic Inductively Coupled Plasma Mass Spectrometry Mass spectrometry APCI ion source measures substance molecular weight +36 The difference between secondary mass spectrometry and primary mass spectrometry The difference between primary mass spectrum and secondary mass spectrum Mass spectrometry metal ions Inventor of mass spectrometry soft ionization What is the molecular weight of flag antibody? Gas molecular mass of Vo CS Inductively coupled plasma mass spectrometer won the bid Silicon substrate metal ion content Mass Spectrometry 4500 Split Ion Source Soft ionization method of mass spectrometry In the mass spectrum if the mass of the precursor ion m1 and the product ion m2 PE inductively coupled plasma mass spectrometer won the bid What equipment is used for cold plasma mass spectrometry? Corresponding wavelength of metal ion inductive coupling ICPoes detects impurities in gold Secondary mass spectrometry precursor ions Rubber plate metal ion content experiment Metal ion content detection method Metal impurity content of semiconductor equipment How to measure the electron content in metals Electrolyte metal impurity content Optocoupler component quality grade Metal ion free radical determination method Metal silicon industry quality Titanium alloy inductively coupled plasma Detection of bulk metal impurities in silicon wafers Bromine method for measuring metal ion content Metal ion detection Antibody isoelectric point mass Crystal content test National monitoring of plasma mass spectrometer Metal ion detection method Construction of Proton and Heavy Ion Center gbt37049 Multi-stage mass spectrometry representation method

《GB/T 37049-2018电子级多晶硅中基体金属杂质含量的测定电感耦合等离子体质谱法》由TC203（全国半导体设备和材料标准化技术委员会）归口，主管部门为国家标准化管理委员会。

Introduction

Interpretation of the National Standard of the People's Republic of China GB/T 37049—2018

1. Background and significance of the standard

Inductively coupled plasma mass spectrometry (ICP-MS) is the internationally recognized gold standard for trace element analysis, with the advantages of high sensitivity, low detection limit and simultaneous detection of multiple elements. The formulation of the GB/T 37049—2018 standard fills the gap in the field of matrix metal impurity detection in electronic grade polysilicon and provides a unified technical specification for the semiconductor industry.

2. Principles and technical advantages of the method

ICP-MS introduces the sample into a high-temperature plasma source to atomize and ionize the metal impurities in the sample into ions. These ions are separated by mass-to-charge ratio in the quadrupole mass analyzer, and the signal intensity is recorded by the detector. The unique advantages of this method are:

High sensitivity: the detection limit can reach $0.4~\mathrm{ng/g}$
Simultaneous detection of multiple elements: six metal impurities including iron, chromium, nickel, copper, zinc and sodium can be determined at one time
Strong anti-interference ability: the matrix effect can be effectively eliminated by mass number selection and internal standard correction

3. Comparative analysis of standard framework

Standard dimension	GB/T 37049—2018	International similar standards	Scope of application
Detection method	ICP-MS	ICP-AES/MS	Specialized for electronic grade polysilicon
Detection limit requirement	$0.4~\mathrm{ng/g}$	$1~\mathrm{ng/g}$	Ultra-pure semiconductor materials
Interference factor control	Strict clean room environment (ISO5 grade)	Class 10 purification requirements	Laboratory levels vary greatly

4. Implementation suggestions and technical points

Case study: Laboratory conditions confirmation

A semiconductor material company adopted this standard method for testing and found that:

The detection limit of the equipment is consistent, RSD < 5%
The clean room environment needs to be strictly controlled to avoid surface contamination
It is recommended to establish a standardized sample pretreatment process

5. Analysis of the technical evolution of standards

From the perspective of technological development, ICP-MS has evolved from simple detection to intelligent calibration:

1990s: single element detection mode
2000s: simultaneous determination of multiple elements
2010s: maturity of internal standard method and anti-interference technology
Currently: intelligent data analysis and automatic calibration system

6. Conclusion

GB/T 37049—2018 provides an important basis for the quality control of electronic-grade polysilicon. In the future, continuous improvements should be made in the following aspects:

Establish a unified internal standard solution standard
Optimize sample pre-treatment process
Promote localization of equipment and technology upgrades

More samples: DL/T 368-2010 QC/T 942-2021 DL/T 5154-2012

Sample only — not a preview of GB/T 37049-2018

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