Precursor ion analysis by mass spectrometry

Precursor ion analysis by mass spectrometry, Total:174 items.

The international standard classification for "Precursor ion analysis by mass spectrometry" includes: Chemical analysis , Chemical reagents , Products of non-ferrous metals in general , Lead, zinc, tin and their alloys , Chemical analysis of metals , Other non-ferrous metals and their alloys , Testing of metals in general , Metalliferous minerals , Measuring instruments .

The Chinese standard classification for "Precursor ion analysis by mass spectrometry" includes: Basic standards and general methods , Chemical reagent in general , Industrial gas and chemical gas , Electron optics and other physical optics instrument , Precious metal ore , Heavy metals and their alloys analysis method , Rare metals and their alloys analysis method , Light metals and their alloys analysis method , Heavy metal ore , chromatograph , Analysis methods for toxic substances in water , Mass spectrometer, liquid spectrometer, energy spectrometer and combined devices of them .

General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China

GB/T 8152.13-2017 Methods for chemical analysis of lead concentrates - Part 13: Determination of thallium content - Inductively coupled plasma mass spectrometry and inductively coupled plasma-atomic emission spectrometry
GB/T 45768-2025 Surface chemical analysis—Secondary ion mass spectrometry—Linearity of intensity scale in single ion counting time-of-flight mass analysers
GB/T 8151.21-2017 Methods for chemical analysis of zinc concentrates - Part 21: Determination of thallium content - Inductively coupled plasma mass spectrometry and inductively coupled plasma-atomic emission spectrometry
GB/T 28726-2012 Gas analysis—Gas chromatograph with helium ionization detector
GB/T 39486-2020 Chemical reagent—General rules for inductively coupled plasma mass spectrometry
GB/T 25186-2010 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of relative sensitivity factors from ion-implanted reference materials
GB/T 37182-2018 Gas analysis--Gas chromatograph with plasma emission detector
GB/T 41064-2021 Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
GB/T 40129-2021 Surface chemical analysis—Secondary ion mass spectrometry—Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
GB/T 7739.14-2019 Methods for chemical analysis of gold concentrates—Part 14:Determination of thallium content—Inductively coupled plasma atomic emission spectrometry and inductively coupled plasma mass spectrometry
GB/T 40798-2021 Chemical analysis method of ion-adsorption rare earth ore—Determination of total rare earth contents—Inductively coupled plasma mass spectrometry
GB/T 43663-2024 Surface chemical analysis—Secondary-ion mass spectrometry—Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
GB/T 20176-2025 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of boron atomic concentration in silicon using uniformly doped materials
GB/T 20176-2006 Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials
GB/T 20899.14-2017 Methods for chemical analysis of gold ores - Part 14: Determination of thallium content - Inductively coupled plasma atomic emission spectrometry and inductively coupled plasma mass spectrometry
GB/T 40109-2021 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
GB/T 32495-2016 Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of arsenic in silicon

Professional Standard - Non-ferrous Metal

YS/T 1380-2020 Method for chemical analysis of rhodium compounds. Determination of the chloride ion and nitrate ion contents. Ion chromatography method
YS/T 445.14-2019 Methods for chemical analysis of silver concentrates - Part 14: Determination of thallium content Inductively coupled plasma-mass spectrometry and inductively coupled plasma atomic emission spectrometry
YS/T 473-2015 Methods for chemical analysis industrial gallium―Determination of impurity elements―ICP-MS analytical method
YS/T 1050.10-2016 Methods for chemical analysis of lead-antimony concentrate. Part 10: Determanation of thallium. Inductively coupled plasma mass spectrometry and inductively coupled plasma atomic emission spectrometry
YS/T 1497-2021 Analysis method for platinum compounds Determination of impurity anion content Ion chromatography
YS/T 244.9-2008 Chemical analysis methods of high purity aluminum Part 9: Determination of trace impurities in high pruity aluminumby inductively coupled mass spectrometry
YS/T 1496-2021 Analysis method for palladium compounds Determination of impurity anion content Ion chromatography
YS/T 742-2010 Methods for chemical analysis of gallium oxide Determination of impurities Inductively coupled plasma mass spectrometer method
YS/T 473-2005 Determination of impurity elements in gallium for industrial use - ICP-MS analytical method

Professional Standard - Education

JY/T 0575-2020 General rules of analytical methods for ion chromatography
JY/T 020-1996 General rules for ion chromatograpy
JY/T 0568-2020 General rules for inductively coupled plasma-mass spectrometry

Professional Standard - Petroleum

SY/T 6404-2018 Analytical method for metal elements in rock by ICP-AES and ICP-MS
SY/T 7001-2014 Determination of beat stable salts anion composition in alkanolamine desulfurization solution. Ion chromatography
SY 7001-2014 Ion Chromatography for Composition Analysis of Heat Stable Salt Anions in Alcoholic Ammonia Desulfurization Solution

Professional Standard - Commodity Inspection

SN/T 5055.1-2018 Analysis of biodiesel - Part 1: Determination of sodium, potassium, calcium, and magnesium cations - Ion chromatography method
SN/T 2698-2010 Elemental analysis of impurities in tungsten products—Inductively coupled plasma atomic emission spectrometric method

Professional Standard - Environmental Protection

HJ/T 84-2001 Water quality -- Determination of inorangic anions -- Ion chromatography method

Group Standards of the People's Republic of China

T/ZJATA 0023-2024 Determination of perchlorate in water Ion chromatography-mass spectrometry/mass spectrometry
T/CIS 17004-2020 Ambient ionization device

Professional Standard - Medicine

YY/T 1740.3-2024 Clinical mass spectrometer-Part 3 : Inductively coupled plasma mass spectrometry

Professional Standard - Geology

DZ/T 0064.28-2021 Methods for analysis of groundwater quality- Part28: Determination of potassium, sodium lithium and ammonium contents- Ion chromatography

British Standards Institution (BSI)

BS ISO 20411:2018 Surface chemical analysis. Secondary ion mass spectrometry. Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
BS ISO 13084:2018 Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
BS ISO 13084:2011 Surface chemical analysis. Secondary-ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
BS ISO 17862:2022 Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
BS ISO 17862:2013 Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
25/30500395 DC BS ISO 13084 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
10/30199193 DC BS ISO 13084. Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time of flight secondary ion mass spectrometer
20/30409963 DC BS ISO 17862. Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
BS ISO 12406:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
BS ISO 22048:2004 Surface chemical analysis. Information format for static secondary-ion mass spectrometry
BS DD ENV 13800:2000 Lead and lead alloys - Analysis by flame atomic absorption spectromerty (FAAS) or inductively coupled plasma emission spectrometry (ICP-ES), without separation of the lead matrix
BS ISO 22048:2004(2005) Surface chemical analysis — Information format for static secondary - ion mass spectrometry
BS ISO 22048:2005 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
BS ISO 18114:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
BS ISO 18114:2021 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials
BS ISO 17560:2014 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of boron in silicon
BS ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
BS ISO 17560:2002 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
07/30138812 DC BS ISO 23830. Surface chemical analysis. Secondary-ion mass spectrometry. Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
BS ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
10/30199169 DC BS ISO 12406. Surface chemical analysis. Secondary ion mass spectrometry. Method for depth profiling of arsenic in silicon
20/30409889 DC BS ISO 18114. Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials
PD CEN/TS 17197:2018(2019) Building Products: Hazardous Release Assessment Mineral Analysis Inductively Coupled Plasma Optical Emission Spectrometry (ICP-OES) Analysis
BS ISO 23812:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
BS ISO 12010:2012 Water quality. Determination of short-chain polychlorinated alkanes (SCCPs) in water. Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
DD ENV 13800-2000 Lead and lead alloys. Analysis by flame atomic absorption spectromerty (FAAS) or inductively coupled plasma emission spectrometry (ICP-ES), without separation of the lead matrix
BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
21/30433862 DC BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and…

International Organization for Standardization (ISO)

ISO 13084:2011 Surface chemical analysis - Secondary-ion mass spectrometry - Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
ISO/TS 22933:2022 Surface chemical analysis — Secondary ion mass spectrometry — Method for the measurement of mass resolution in SIMS
ISO 13084:2018 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
ISO 178:1975 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO 12406:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of arsenic in silicon
ISO 17862:2022 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO 17862:2013 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO 178:2019 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
ISO 20411:2018 Surface chemical analysis - Secondary ion mass spectrometry - Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
ISO 22048:2004 Surface chemical analysis — Information format for static secondary-ion mass spectrometry
ISO 17560:2014 Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon
ISO 18114:2021 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
ISO 18114:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
ISO 14237:2000 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
ISO 17109:2015/DAmd 1 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films — A...

GCC Standardization Organization

GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
GSO ISO 18114:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
GSO ISO 23830:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
GSO ISO 22048:2013 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
GSO ISO 17560:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
GSO ISO 12406:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of arsenic in silicon

Kingdom of Bahrain Testing and Metrology Directorate

BH GSO ISO 13084:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
BH GSO ISO 17560:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
BH GSO ISO 23830:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
BH GSO ISO 22048:2016 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
BH GSO ISO 18114:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials

The Directorate General of Specifications and Metrology (DGSM)

OS GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
OS GSO ISO 23830:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
OS GSO ISO 12406:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of arsenic in silicon
OS GSO ISO 22048:2013 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry

Institute of Interconnecting and Packaging Electronic Circuits (IPC)

IPC TM-650 2.3.28A-2004 Ionic Analysis of Circuit Boards@ Ion Chromatography Method
IPC TM-650 2.3.28B-2012 Ionic Analysis of Circuit Boards@ Ion Chromatography Method
IPC TM-650 2.3.28-1995 Ionic Analysis of Circuit Boards Ion Chromatography Method
IPC TM-650 2.3.28-2004 Ionic Analysis of Circuit Boards, Ion Chromatography Method Revision A

Korean Agency for Technology and Standards (KATS)

KS M 0035-1993 General rules for ion chromatographic analysis
KS M 0035-2008(2023) General rules for ion chromatographic analysis
KS D ISO 18114-2020 Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS D ISO 18114-2005(2020) Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS M 0035-2023 General rules for ion chromatographic analysis
KS I ISO 17294-2014 Water quality — Application of inductively coupled plasma mass spectrometry(ICP-MS)
KS D ISO 17560-2025 Surface chemical analysis — Secondary ion mass spectrometry — Method for depth profiling of boron in silicon
KS D ISO 22048-2020 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
KS D ISO 17560-2003(2023) Surface chemical analysis - Secondary ion mass spectrometry - Boron depth distribution measurement method in silicon
KS D ISO 22048-2005(2020) Surface chemical analysis - Information format for static secondary-ion mass spectrometry
KS D ISO 22048:2005 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
KS D ISO 14237-2003(2023) Surface geometry analysis - Secondary ion mass spectrometry - Method for measuring the concentration of boron atoms uniformly added in silicon
KS D ISO 18114:2005 Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials

Japanese Industrial Standards Committee (JISC)

JIS K 0157:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
JIS K 0158:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
JIS K 0127:2001 General rules for ion chromatographic analysis
JIS K 0164:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
JIS K 0127:1992 General rules for ion chromatographic analysis
JIS K 0127:2013 General rules for ion chromatography
JIS K 0155:2018 Surface chemical analysis -- Secondary ion mass spectrometry -- Linearity of intensity scale in single ion counting time-flight mass analysers
JIS K 0153:2015 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
JIS K 0168:2011 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
JIS K 0163:2010 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials

American Society for Testing and Materials (ASTM)

ASTM E1504-11 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM UOP1031-19 Chromium (III) and Chromium (VI) Speciation in Water by IC-ICP-MS (Ion Chromatography- Inductively Coupled Plasma Mass Spectrometry)
ASTM RR-E01-1115 2011 E2823-Test Method for Analysis of Nickel Alloys by Inductively Coupled Plasma Mass Spectrometry
ASTM E1881-12 Standard Guide for Cell Culture Analysis with SIMS
ASTM E1881-06 Standard Guide for Cell Culture Analysis with SIMS
ASTM C1476-00 Standard Test Method for Analysis of Urin for Technetium-99 by Inductively Coupled Plasma-Mass Spectrometry
ASTM RR-D15-1025 2009 D5827-Test Method for Analysis of Engine Coolant for Chloride and Other Anions by Ion Chromatography
ASTM D5542-04(2009) Standard Test Methods for Trace Anions in High Purity Water by Ion Chromatography
ASTM C1476-06 Standard Test Method for Analysis of Urine for Technetium-99 by Inductively Coupled Plasma-Mass Spectrometry
ASTM C1432-15 Standard Test Method for Determination of Impurities in Plutonium: Acid Dissolution, Ion Exchange Matrix Separation, and Inductively Coupled Plasma-Atomic Emission Spectroscopic (ICP/AES) Analysis
ASTM C1379-10 Standard Test Method for Analysis of Urine for Uranium-235 and Uranium-238 Isotopes by Inductively Coupled Plasma-Mass Spectrometry
ASTM C1432-03 Standard Test Method for Determination of Impurities in Plutonium: Acid Dissolution, Ion Exchange Matrix Separation, and Inductively Coupled Plasma-Atomic Emission Spectroscopic (ICP/AES) Analysis
ASTM STP 195-1958 Symposium on Ion Exchange and Chromatography in Analytical Chemistry

Ente Nazionale Italiano di Unificazione

UNI 9813:1991 Ionic chromatography procedures. Anions analysis by ionic chromatography and high pressure liquid chromatography.
UNI ENV 14029:2002 Lead and lead alloys - Analysis by flame atomic absorption spectrometry (FAAS) or inductively coupled plasma emission spectrometry (ICP-ES), after separation of the lead matrix
EC 1-2021 UNI EN 17374:2020 Animal feeding stuffs: Methods of sampling and analysis - Determination of inorganic arsenic in animal feed by anion-exchange HPLC-ICP-MS
UNI EN 17374:2020 Animal feeding stuffs: Methods of sampling and analysis - Determination of inorganic arsenic in animal feed by anion-exchange HPLC-ICP-MS
UNI EN 14242:2004 Aluminium and aluminium alloys - Chemical analysis - Inductively coupled plasma optical emission spectral analysis

Association Francaise de Normalisation

NF ISO 23830:2009 Chemical analysis of surfaces - Mass spectrometry of secondary ions - Repeatability and constancy of the scale of relative intensities in static mass spectrometry of secondary ions
NF ISO 17560:2006 Chemical analysis of surfaces - Mass spectrometry of secondary ions - Determination of boron in silicon by thickness profiling
NF ISO 14237:2010 Chemical analysis of surfaces - Mass spectrometry of secondary ions - Determination of boron atoms in silicon using uniformly doped materials
NF X21-064*NF ISO 23830:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry.
NF X21-070*NF ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials.
NF EN 1785:2003 Food products - Detection of ionized foods containing lipids - Analysis by gas chromatography/mass spectrometry of 2-alkylcytobutanones
NF T90-046:2014 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
NF X21-066*NF ISO 23812:2009 Surface chemical analysis - Secondary ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
NF EN 1784:2003 Food products - Detection of ionized foods containing lipids - Gas chromatographic analysis of hydrocarbons
XP A06-422*XP ENV 14029:2001 Lead and lead alloys - Analysis by flame atomic absorption spectrometry (FAAS) or inductively coupled plasma emission spectrometry (ICP-ES), after separation of the lead matrix
NF T51-241:2011 Plastics - Determination of the molecular mass and molecular mass distribution of polymer species by matrix-assisted laser desorption/ionization time-of-flight mass spectrometry (MALDI-TOF-MS).

German Institute for Standardization

DIN V ENV 13800:2000 Lead and lead alloys - Analysis by flame atomic absorption spectrometry (FAAS) or inductively coupled plasma emission spectrometry (ICP-ES) without separation of the lead matrix; German version ENV 13800:2000
DIN V ENV 14029 DIN:2001-12 Analysis of lead and lead alloys by flame atomic absorption spectrometry (FAAS) or inductively coupled plasma optical emission spectrometry (ICP-ES) after separation of the lead matrix
DIN EN ISO 12010 E:2013-12 Water quality Determination of short-chain polychlorinated triphenylane (SCCP) in water by gas chromatography mass spectrometry (GC-MS) and negative ion chemical ionization (NCI) (draft)
DIN V ENV 13800 DIN:2000-11 Analysis of lead and lead alloys by flame atomic absorption spectrometry (FAAS) or inductively coupled plasma optical emission spectrometry (ICP-OES) without separation of the lead matrix
DIN EN ISO 12010 E:2018-03 Water quality Determination of short-chain polychlorinated triphenylane (SCCP) in water by gas chromatography mass spectrometry (GC-MS) and negative ion chemical ionization (NCI) (draft)

Austrian Standards

ONORM M 6253 Teil.1-1985 Water analysis; determination ofanionic Surfactants by the methylene blue spectrometric method
ONORM M 6279-1991 Water analysis — Determination oj 33 elements by inductively coupled plasma emission spectrometry (ICP-AES)

Institute of Electrical and Electronics Engineers (IEEE)

IEEE Std 802.15.4-2020/Cor 1-2022 (Corrigendum to IEEE Std 802.15.4-2020 as amended by IEEE Std 802. IEEE Standard for Low-Rate Wireless Networks Corrigendum 1: Correction of Errors Preventing Backward Compatibility

Standard Association of Australia （SAA）

AS ISO 17560:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
AS ISO 22048:2006 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
AS ISO 22048:2006(R2016) Surface chemical analysis - Information format for static secondary-ion mass spectrometry
AS ISO 18114:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
AS ISO 18114:2006(R2016) Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
AS 4873.1:2005 Recommended practice for inductively coupled plasma-mass spectrometry (ICP-MS) - Principles and techniques

American Water Works Association (AWWA)

AWWA WQTC58858 Liquid Chromatography of Bromate and Bromoacetic Acids with Inductively Coupled Plasma Mass Spectrometry Detection
AWWA WQTC50450 Interlaboratory Validation of an Ion Chromatographic Method for the Analysis of DBP Anions in Drinking Water

Standards Norway

NS-ENV 14029:2001 Lead and lead alloys — Analysis by flame atomic absorption spectrometry (FAAS) or inductively coupled plasma emission spectrometry (ICP-ES), after separation of the lead matrix

Danish Standards Foundation

DS/ENV 14029:2001 Lead and lead alloys - Analysis by flame atomic absorption spectrometry (FAAS) or inductively coupled plasma emission spectrometry (ICP-ES), after separation of the lead matrix

Swedish Institute for Standards

SS-EN 14242:2023 Aluminium and aluminium alloys - Chemical analysis - Inductively coupled plasma optical emission spectrometric analysis