GB/T 31225-2014 in English

VALID

Test method for the thickness of silicon oxide on Si substrate by ellipsometer

Issued on:2014-09-30
Implemented on:2015-04-15
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $130.00
$127.00

Standard No:	GB/T 31225-2014
Document status:	VALID
Title in English:	Test method for the thickness of silicon oxide on Si substrate by ellipsometer
Title in Chinese:	椭圆偏振仪测量硅表面上二氧化硅薄层厚度的方法
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2014-09-30
Implemented on:	2015-04-15
Professional Classification:	GB-National Standard
Related Keywords:	silicon substrate silicon oxide thin silicon dioxide layer silicon dioxide silicon surface
Related Topics:	silica Silica Standard Silica Standard thin layer Polarizer Silica + Standard Ellipsometer Ellipsometry method for measuring the thickness of thin silicon dioxide layers on silicon surfaces polarization Ellipsometer Display Performance Ellipsometer method Ellipsometer Technology silica on silicon surface polarimeter surface silicon oxide Ellipsometer thickness Ellipsometer test method Two methods of ellipsometer silicon surface ellipsometer premium quality surface silicon oxide Ellipse size Silicon Surface Inspection Ellipsometry Film Thickness Measurement Ellipsometer roundness Silicon oxide film SiO2 on silicon surface The temperature of the ellipsometer Silica peak Polarization Meter Ellipsometer method Ellipsometer test method surface silicon long-term ellipsometer Ellipsometer silicon Infrared measurement of silica Polarization tester Ellipsometer silicon surface silicon Elliptical polarization Polarization measurement polarized+ Lithium surface oxide layer GB/T 31225-2014 Performance Ellipsometer TLC Peaks on the silica surface Polarization ellipsoid TLC Ellipsometer UV polarimeter Silicon sphere surface Silicon measurement instrument for measuring thickness silicon surface Ellipsometer Silicon + measurement Silicon Meter Ellipsometer layer thickness How to measure ellipticity silicon surface Tantalum Oxide Thickness Ellipticity Ellipticity gb/t+31225 Methods of silicon measurement Polarization measurement Instruments for Measuring Film Thickness How to measure roundness Sample Thickness Measurement Ellipticity method UV polarimetry silica silicon surface Post Oxide Thickness Measurement silicon dioxide Used Polarization Extinction Ratio Tester gb/t31225 meter on the road Film Thickness Instruments surface layer Silica instrument Silicon Dioxide Wafer Round Two Instruments GBT31225 GB/T 31225-2014 Silica transparency Owens two-liquid method for measuring surface energy Silica synthesis detection method Detection methods for silica Polarization degree test method Common methods for measuring silica Determination method of silica - national standard method Thickness gauge debugging method Determination method of silica in the oxide layer on the surface of silicon steel Application of Silica Determination Methods How to measure the thickness of oxide layer Quality inspection methods for silica Chemically Conductive Oxide Layer Thickness Measurement How to measure silica Oxymeter measurement method Low concentration silica analysis method Silica Assay Method Measurement method of trace amounts of silicon Determination of silica on silicon Elliptical film thickness Disease control silica detection method Biochemical instrument method What are the methods for measuring trace amounts of silica? Silicone oil for instruments Silica specific surface area test Silica national standard method Polarization measurement method Characterization methods of silicon quantum dots Polarization measurement method

《GB/T 31225-2014椭圆偏振仪测量硅表面上二氧化硅薄层厚度的方法》由TC279（全国纳米技术标准化技术委员会）归口，主管部门为中国科学院。
本标准给出了使用连续变波长、变角度的光谱型椭圆偏振仪测量硅表面上二氧化硅薄层厚度的方法。
本标准适用于测试硅基底上厚度均匀、各向同性、10nm~1000nm 厚的二氧化硅薄层厚度,其他对测试波长处不透光的基底上单层介电薄膜样品厚度测量可以参考此方法。

Scope

This standard provides a method for measuring the thickness of a thin silicon dioxide layer on a silicon surface using a spectral ellipsometer with continuously variable wavelength and variable angle. This standard is suitable for testing the thickness of silicon dioxide thin layer with uniform thickness, isotropy, 10nm~1000nm thick on the silicon substrate. Other single-layer dielectric film samples on the substrate that are opaque at the test wavelength can be measured. Refer to this method.

More samples: QC/T 942-2021 DL/T 5154-2012 JJG 21-2008

Sample only — not a preview of GB/T 31225-2014

Loading PDF document...

Error loading PDF. Please make sure the file is valid and try again.

We also recommend

GB/T 378-1964 in English

Test for copper strip corrosion of engine fuels
-
GB/T 130250.13-1994 in English

General test method in salt industry
1994-07-06
GB/T 6435-2014 in English

Determination of moisture in feedstuffs
2014-07-08
GB 1187-1981 in English

Rubber hose for water supply
-
GB/T 1962.1-2015 in English

Conical fittings with a 6%(Luer) taper for syringes,needles and certain other medical equipment—Part 1: General requirement
2015-12-10
GB 2955-1982 in English

Synthetic rubber latex--Determination of high-speed mechanical stability
-
GB/T 21432-2021 in English

Graphite pressure vessels
2021-03-09
GB/T 30440.5-2016 in English

Specification for product of amusement game-Part 5:Household game console
2016-04-25
GB 17930-2016 in English

Gasoline for motor vehicles
2016-12-23
GB/T 41923.1-2022 in English

Three-dimensional process planning for mechanical products—Part 1:Terms and definitions
2022-03-09