GB/T 33236-2016 in English

GB/T 33236-2016 Standard Overview

Background of standard formulation and technological evolution

With the development of the semiconductor industry, the purity requirements of polysilicon are getting higher and higher. Traditional chemical analysis methods are difficult to meet the needs of trace element detection, so the use of high-sensitivity glow discharge mass spectrometry has become an inevitable choice. This standard fills the gap in this field in China and provides a scientific basis for polysilicon quality control.

Implementation recommendations

• Prepare samples strictly in accordance with standard requirements and ensure that the cleaning steps are correct to avoid contamination.
• The instrument calibration cycle should be at least once every 8 hours to ensure that the shape and resolution of the mass spectrum peak meet the requirements (≥3500).
• When performing in-depth analysis, it is recommended to turn off the pre-sputtering function to reduce the impact of sample surface contamination.
• For high-purity samples, physical cutting methods (such as a) and b) are preferred to avoid the introduction of metal impurities.