SJ 20842-2002 in English
VALIDTest method for Ga/As ratio of surface of gallium arsenide
- Issued on:2002-10-30
- Implemented on:2003-03-01
- File Format:PDF
- Delivery:Via email within 1~3 business days
Price(USD):
$60.00
$59.00
$59.00
本标准规定了砷化镓材料表面镓砷比的X射线光电子能谱的试验方法。本标准适用于监测砷化镓器件制造过程中各种表面处理对砷化镓晶片表面镓砷比的影响,也适用于晶片加工中的各种表面处理。
Scope
Copper etching effects are also applicable to various surface treatments in full wafer processing.
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