Magnetron sputtering titanium target

Magnetron sputtering titanium target, Total:11 items.

The international standard classification for "Magnetron sputtering titanium target" includes: Other products of non-ferrous metals , Other non-ferrous metals and their alloys , Titanium products .

The Chinese standard classification for "Magnetron sputtering titanium target" includes: Precious metals and their alloys , Metal physical property test method , Rare refractory metals and their compounds , Rare light metals and their alloys .

中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会

• GB/T 34649-2017 Magnetron sputtering ruthenium target

Group Standards of the People's Republic of China

• T/CAS 304-2018 Magnetron sputtering silicon targets and bound targets
• T/QGCML 3081-2024 Semiconductor sputtering target high-purity titanium metal powder
• T/ZZB 0093-2016 High-purity sputtering titanium target used in integrated circuit
• T/ZZB 0639-2018 Alumium doped zinc oxide magnetron sputtering targets

工业和信息化部

• YS/T 1357-2020 CrTaTi alloy sputter ing tar get used in magnetic recording
• YS/T 1358-2020 FeCoTa alloy target used in magnetic recording
• YS/T 1124-2016 Testing method on pass through flux of magnetic sputtering target

Professional Standard - Non-ferrous Metal

• YS/T 718-2009 Flat magneting sputtering target—Niobium target for optical coating
• YS/T 719-2009 Flat magneting sputtering target—Silicon target for optical coating
• YS/T 893-2013 High-purity Sputtering Titanium Target Used in Electronic Film

Others: Titanium target grain size,High-purity titanium target,High-purity titanium target,High-purity titanium target,Titanium target,Titanium target,Vacuum sputtering apparatus + titanium target,Double target magnetron sputtering apparatus,Titanium flat target,Magnetron sputtering titanium target,Titanium flat target,Titanium magnetron sputtering conditions,Titanium Alloy Target