YS/T 893-2013 in English

VALID

High-purity Sputtering Titanium Target Used in Electronic Film

Issued on:2013-10-17
Implemented on:2014-03-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $180.00
$175.00

Standard No:	YS/T 893-2013
Document status:	VALID
Title in English:	High-purity Sputtering Titanium Target Used in Electronic Film
Title in Chinese:	电子薄膜用高纯钛溅射靶材
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2013-10-17
Implemented on:	2014-03-01
ICS Classification:	77.150.50-Titanium products
Chinese Classification:	H64-Rare light metals and their alloys
Professional Classification:	YS-Non-ferrous Metal
Related Keywords:	high-purity sputtering titanium target high-purity titanium electronic film scopethis standard electronic thin film manufacturing electronic thin films
Related Topics:	High purity target ys/t+910-2013 High purity standard ys t 941 2013 ys+t+941+2013 ys/t 3018-2013 polymer film ys/t+941-2013 ys/t 893-2013 sputtering ys t 910 2013 ys/t 229.3-2013 Sputtering instrument thin film scattering Thin film ionic resistance ys/t938.1-2013 Thin film ionic resistance Sputtering instrument+ High-purity titanium target High-purity titanium target with high purity thin film scattering Sputtering target Titanium sputtering target molecular target sputtering target High-purity titanium target Pure titanium material gold for sputtering polymer film Titanium ion sputtering apparatus Efficient target electron beam on target Electric thin film electron beam target High Efficiency Thin Film Battery Electrode thin film Use of ion sputtering High pressure gas target High pressure gas target target molecule sputtering target Titanium target Titanium target pure titanium high power target anti-aircraft electron gun thin film diffractometer Hot-pressed film polymer Vacuum sputtering apparatus + titanium target Enzyme target molecule High energy ion sputtering machine Titanium thin film electrode Electronic target manufacturer electronic target Titanium flat target Magnetron sputtering titanium target Conductive target Titanium flat target electron sputtering x-ray target material target shooting High-purity titanium sputtering target for electronic thin film High purity titanium film titanium ys/T895-2013 Titanium material use Pure Titanium Execution Pure aluminum film execution Target materials used abroad Target purity test Titanium targets Pure titanium chips ys/t3014-2013 ys-t921-2013

Scope

This standard specifies the requirements, test methods, inspection rules and markings, packaging, transportation, storage, quality certification and contracts (orders) for high-purity titanium sputtering targets for electronic thin films. This standard applies to various titanium sputtering targets used in electronic thin film manufacturing.

More samples: GB 18306-2015 NB/T 47013.2-2015 DL/T 368-2010

Sample only — not a preview of YS/T 893-2013

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