Titanium ion sputtering apparatus
Titanium ion sputtering apparatus, Total:23 items.
The international standard classification for "Titanium ion sputtering apparatus" includes: Vacuum technology , Titanium products .
The Chinese standard classification for "Titanium ion sputtering apparatus" includes: Vacuum technique and equipment , Rare light metals and their alloys .
Professional Standard - Machinery
- JB/T 4081-1991 Sputtering ion pump type and basic parameters
- JB/T 2965-1992 Performance Testing Method of Sputtering Ion Pump
- JB/T 4081-2011 Vacuum technology － Sputter-ion pumps
- JB/T 4082-1991 Sputtering ion pump technical conditions
Professional Standard - Electron
- SJ 1780-1981 Ordinary two-electrode sputtering ion pump--Performance specification
- SJ 1781-1981 Sputtering ion pump--Testing methods
- SJ 1779-1981 Ordinary two-electrode sputtering ion pump--Parameters series
Professional Standard - Non-ferrous Metal
- YS/T 893-2013 High-purity Sputtering Titanium Target Used in Electronic Film
General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China
- GB/T 25755-2010 Vacuum technology - Sputter-ion pumps - Measurement of performance characteristics
Group Standards of the People's Republic of China
- T/ZZB 0093-2016 High-purity sputtering titanium target used in integrated circuit
- T/QGCML 018-2020 Negative ion emitter
- T/QGCML 3081-2024 Semiconductor sputtering target high-purity titanium metal powder
工业和信息化部
- YS/T 1357-2020 CrTaTi alloy sputter ing tar get used in magnetic recording
German Institute for Standardization
- DIN 28429:2003 Vacuum technology - Acceptance specifications for getter ion pumps
American Society for Testing and Materials (ASTM)
- ASTM F1709-97(2016) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- ASTM F1709-97 Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- ASTM F1709-97(2008) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- ASTM F1709-97(2002) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
- ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
Japanese Industrial Standards Committee (JISC)
- JIS H 1632-3:2014 Titanium.ICP atomic emission spectrometry.Part 3: Determination of boron
- JIS H 1632-1:2014 Titanium.ICP atomic emission spectrometry.Part 1: General requirements and sample decomposition
RU-GOST R
- GOST 5.1807-1973 Type-GIN-0,5-1M getter-ion pump. Quality requirements of certified products
Ion sputter,Ion sputter,Small Ion Sputterer,Ion sputtering instrument,Ion sputtering parameters,Ion sputtering parameters,Gold ion sputtering apparatus,Titanium ion sputtering apparatus,Ion sputter gold,Parameters of ion sputtering apparatus,Automatic ion sputtering apparatus,Use of ion sputtering,Ion sputter...,How to use the ion sputterer,Gold ion sputtering apparatus,Vacuum sputtering apparatus + titanium target,DC ion sputtering apparatus
