Use of ion sputtering
Use of ion sputtering, Total:22 items.
The international standard classification for "Use of ion sputtering" includes: Vacuum technology , Titanium products , Copper products .
The Chinese standard classification for "Use of ion sputtering" includes: Vacuum technique and equipment , Rare light metals and their alloys , Heavy metals and their alloys .
Professional Standard - Machinery
- JB/T 4081-2011 Vacuum technology － Sputter-ion pumps
- JB/T 4081-1991 Sputtering ion pump type and basic parameters
- JB/T 2965-1992 Performance Testing Method of Sputtering Ion Pump
- JB/T 4082-1991 Sputtering ion pump technical conditions
Professional Standard - Electron
- SJ 1780-1981 Ordinary two-electrode sputtering ion pump--Performance specification
- SJ 1781-1981 Sputtering ion pump--Testing methods
- SJ 1779-1981 Ordinary two-electrode sputtering ion pump--Parameters series
General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China
- GB/T 25755-2010 Vacuum technology - Sputter-ion pumps - Measurement of performance characteristics
Group Standards of the People's Republic of China
- T/QGCML 018-2020 Negative ion emitter
Professional Standard - Non-ferrous Metal
- YS/T 819-2012 High-purity Sputtering Copper Target Used in Electronic Film
- YS/T 893-2013 High-purity Sputtering Titanium Target Used in Electronic Film
German Institute for Standardization
- DIN 28429:2003 Vacuum technology - Acceptance specifications for getter ion pumps
British Standards Institution (BSI)
- BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
- 21/30433862 DC BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and…
RU-GOST R
- GOST 5.1807-1973 Type-GIN-0,5-1M getter-ion pump. Quality requirements of certified products
International Organization for Standardization (ISO)
- ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
SCC
- ISO 17109:2015/DAmd 1 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films — A...
American Society for Testing and Materials (ASTM)
- ASTM E1438-91(2001) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
- ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM E1438-91(1996) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
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