GB/T 25755-2010 in English

VALID

Vacuum technology - Sputter-ion pumps - Measurement of performance characteristics

Issued on:2010-12-23
Implemented on:2011-10-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $210.00
$204.00

Standard No:	GB/T 25755-2010
Document status:	VALID
Title in English:	Vacuum technology - Sputter-ion pumps - Measurement of performance characteristics
Title in Chinese:	真空技术溅射离子泵性能参数的测量
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2010-12-23
Implemented on:	2011-10-01
ICS Classification:	23.160-Vacuum technology
Chinese Classification:	J78-Vacuum technique and equipment
Professional Classification:	GB-National Standard
Related Keywords:	sputter-ion pumps ion pumps sputter ion pumps performance characteristics scopethis standard measurement methods
Related Topics:	Ion sputter vacuum technology performance parameters ion pump Metering pump performance Ion sputter vacuum pump ion pump MS parameter product ion Small Ion Sputterer sputter ion pump sputtering Quaternary pump technical parameters Metering pump performance Ion sputtering machine magnetic field ions Ion sputtering instrument Ion sputtering parameters Ion sputtering parameters Rod Technical Parameters Multiparameter Measurement Technology Gold ion sputtering apparatus as ions GB/T 25755-2010 Ion sputtering + gold ion trap vacuum Energy parameter Titanium ion sputtering apparatus Precursor ion parameters Ion sputter gold Ion meter parameters Technical parameter f Parameters of ion sputtering apparatus Quantum Quantum Real? 8a+ technical parameters ion sputtering Automatic ion sputtering apparatus Use of ion sputtering Ionic Hydrazine Technology performance parameters Ion Trap Parameters Ion sputter... Ion Trap Parameters ion detection technology MB Specifications Ion sputtering method gold ion sputtering gold Measuring wheel technical parameters GB/t+25755 True Density Meter Technical Parameters ion pair technology Gold ion sputtering apparatus ts2 technical parameters gold ion sputtering iTechnical parameters Transition parameters Ionic coefficient measurement Measurement of plasma parameters Ionized water technology How to Test a Vacuum Pump High energy ion sputtering machine The main parameters of the vacuum pump Peptide Technical Parameters ion sputtering interface Sputtering parameters Sputtering machine parameters Vacuum box technical parameters Sputtering parameters Gold Instrument Vacuum Parameters ion sputter Vacuum pump - vacuum pump parameters Micro pump parameters Ion sputtering batch small ion sputtering DC ion sputtering apparatus Vacuum sputtering machine Sputtering machine parameters parameter set true Vacuum pump parameters-vacuum pump Sputtering parameters Parameter ion meter GBT25755 GB/T 25755-2010 Ion sputtering principle Ion source parameters Ion source parameter settings The role of new energy vacuum pump AXIO vert 5 technical parameters expec-550 technical parameters icaptq technical parameters TG209F3 Tarsus technical parameters Ion sputtering instrument gold spraying rate Vacuum pump performance testing national standard Leybold vacuum pump testing Vacuum pump metering Sputter stripping Flexible rotor pump technology

《GB/T 25755-2010真空技术溅射离子泵性能参数的测量》由TC18（全国真空技术标准化技术委员会）归口，主管部门为中国机械工业联合会。

Scope

This standard specifies the measurement methods for the performance parameters of sputter ion pumps (hereinafter referred to as ion pumps). This standard applies to ion pumps with a nominal volume flow rate greater than 10L/s. The standard measures the pressure range of the volumetric flow rate from 1.5×10^-3Pa to 1×10^-7Pa.

More samples: JC/T 2453-2018 YD/T 3934-2021 GB 50021-2001(2009)

Sample only — not a preview of GB/T 25755-2010

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