Ion sputtering principle

Ion sputtering principle, Total:15 items.

The international standard classification for "Ion sputtering principle" includes: Vacuum technology .

The Chinese standard classification for "Ion sputtering principle" includes: Vacuum technique and equipment .

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Professional Standard - Machinery

• JB/T 4081-2011 Vacuum technology － Sputter-ion pumps
• JB/T 4081-1991 Sputtering ion pump type and basic parameters
• JB/T 4082-1991 Sputtering ion pump technical conditions
• JB/T 2965-1992 Performance Testing Method of Sputtering Ion Pump

Professional Standard - Electron

• SJ 1779-1981 Ordinary two-electrode sputtering ion pump--Parameters series
• SJ 1781-1981 Sputtering ion pump--Testing methods
• SJ 1780-1981 Ordinary two-electrode sputtering ion pump--Performance specification

General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China

• GB/T 31227-2014 Test method for the surface roughness by atomic force microscope for sputtered thin films
• GB/T 25755-2010 Vacuum technology - Sputter-ion pumps - Measurement of performance characteristics

未注明发布机构

• DIN 1326-1:1971 Plasmas; physical principles

German Institute for Standardization

• DIN 28429:2003 Vacuum technology - Acceptance specifications for getter ion pumps
• DIN 1326-1:1991 Plasmas; physical principles

RU-GOST R

• GOST 5.1807-1973 Type-GIN-0,5-1M getter-ion pump. Quality requirements of certified products

American Society for Testing and Materials (ASTM)

• ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
• ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)

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