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Database: 365,228(8 Aug 2026)
atomic force microscope surface roughness test method thin films scopethis standard thin films grade chip scopethis standard 3-methyl-5-phenylpentanol scopethis standard market scopethis standard
GB/T 31227-2014 in English

GB/T 31227-2014 in English

VALID

Test method for the surface roughness by atomic force microscope for sputtered thin films

  • Issued on:2014-09-30
  • Implemented on:2015-04-15
  • File Format:PDF
  • Delivery:Via email within 1~3 business days
Price(USD): $150.00
$146.00
Standard No: GB/T 31227-2014
Document status: VALID
Title in English: Test method for the surface roughness by atomic force microscope for sputtered thin films
Title in Chinese: 原子力显微镜测量溅射薄膜表面粗糙度的方法
Language: English
File Format: Electronic (PDF)
Delivery: Via email within 1~3 business days
Issued on: 2014-09-30
Implemented on: 2015-04-15
Professional Classification: GB-National Standard
Related Keywords: atomic force microscope
surface roughness
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《GB/T 31227-2014原子力显微镜测量溅射薄膜表面粗糙度的方法》由TC279(全国纳米技术标准化技术委员会)归口,主管部门为中国科学院。
本标准规定了使用原子力显微镜(AFM)测量表面粗糙度的方法。
本标准适用于测量溅射成膜方法生成的、平均粗糙度Ra 小于100nm 的薄膜。
其他非溅射薄膜的表面粗糙度的测量可以参考此方法。


Scope

This standard specifies a method for measuring surface roughness using an atomic force microscope (AFM). This standard is applicable to the measurement of thin films produced by sputtering film formation method with an average roughness Ra of less than 100 nm. The measurement of surface roughness of other non-sputtered films can refer to this method.

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