Ion sputtering instrument gold spraying rate

Ion sputtering instrument gold spraying rate, Total:38 items.

The international standard classification for "Ion sputtering instrument gold spraying rate" includes: Vacuum technology , Chemical analysis , Aluminium and aluminium alloys , Other products of non-ferrous metals .

The Chinese standard classification for "Ion sputtering instrument gold spraying rate" includes: Vacuum technique and equipment , Basic standards and general methods , Light metals and their alloys , Rare refractory metals and their compounds .

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Professional Standard - Machinery

• JB/T 4081-1991 Sputtering ion pump type and basic parameters
• JB/T 4082-1991 Sputtering ion pump technical conditions
• JB/T 2965-1992 Performance Testing Method of Sputtering Ion Pump
• JB/T 4081-2011 Vacuum technology － Sputter-ion pumps

Professional Standard - Electron

• SJ 1781-1981 Sputtering ion pump--Testing methods
• SJ 1780-1981 Ordinary two-electrode sputtering ion pump--Performance specification
• SJ 1779-1981 Ordinary two-electrode sputtering ion pump--Parameters series

中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会

• GB/T 32999-2016 Surface chemical analysis―Depth profiling―Measurement of sputtering rate:mesh-replica method using a mechanical stylus profilometer

General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China

• GB/T 25755-2010 Vacuum technology - Sputter-ion pumps - Measurement of performance characteristics
• GB/T 29658-2013 High-purity sputtering aluminium and aluminium alloy target used in electronic film

Group Standards of the People's Republic of China

• T/QGCML 018-2020 Negative ion emitter

Professional Standard - Non-ferrous Metal

• YS/T 1025-2015 High-purity tungsten and tungsten alloy sputtering target used in electronic film

国家市场监督管理总局、中国国家标准化管理委员会

• GB/T 41064-2021 Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films

German Institute for Standardization

• DIN 28429:2003 Vacuum technology - Acceptance specifications for getter ion pumps

British Standards Institution (BSI)

• BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
• 21/30433862 DC BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and…
• BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
• PD ISO/TR 22335:2007 Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Mesh-replica method using a mechanical stylus profilometer

SCC

• ISO 17109:2015/DAmd 1 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films — A...
• BS PD ISO/TR 22335:2007 Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Mesh-replica method using a mechanical stylus profilometer
• 04/30098988 DC ISO 22335. Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Meshreplica method with the use of a mechanical stylus profilometer

Society of Automotive Engineers (SAE)

• SAE AMS5791B-2004 Cobalt Alloy, Powder, Plasma Spray 56.5Co 25.5Cr 10.5Ni 7.5W
• SAE AMS5793B-2006 Powder, Plasma Spray 95Ni - 5Al
• SAE AMS5793A-1992 Powder, Plasma Spray 95Ni 5Al
• SAE AMS2437C-2003 Coating, Plasma Spray Deposition

Korean Agency for Technology and Standards (KATS)

• KS A IEC 61005-2014(2019) Radiation protection instrumentation — Neutron ambient dose equivalent(rate) meters

RU-GOST R

• GOST 5.1807-1973 Type-GIN-0,5-1M getter-ion pump. Quality requirements of certified products
• GOST 22091.2-1984 X-ray devices. The methods of measuring of the current and the voltage of injection of X-ray betatrons

International Organization for Standardization (ISO)

• ISO 17109:2022 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth p
• ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
• ISO/TR 22335:2007 Surface chemical analysis - Depth profiling - Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer

GSO

• OS GSO ISO/TR 22335:2009 Surface chemical analysis - Depth profiling – Measurement of sputtering rate – mesh-replica method using a mechanical stylus profilometer

American Society for Testing and Materials (ASTM)

• ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
• ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)

U.S. Air Force

• AIR FORCE QPL-27200-2013 Transmitter, Rate Gyroscope TRU-2A/A
• AIR FORCE QPL-27200-2011 Transmitter, Rate Gyroscope TRU-2A/A
• AIR FORCE QPL-27200-22-2006 TRANSMITTER, RATE GYROSCOPE TUE-2A/A

United States Navy

• NAVY MIL-T-23733 A-1968 TRANSMITTER, RATE GYROSCOPE T-751( )/AJB-3

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