GB/T 29658-2013 in English

VALID

High-purity sputtering aluminium and aluminium alloy target used in electronic film

Issued on:2013-09-06
Implemented on:2014-05-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $110.00
$107.00

Standard No:	GB/T 29658-2013
Document status:	VALID
Title in English:	High-purity sputtering aluminium and aluminium alloy target used in electronic film
Title in Chinese:	电子薄膜用高纯铝及铝合金溅射靶材
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2013-09-06
Implemented on:	2014-05-01
ICS Classification:	77.120.10-Aluminium and aluminium alloys
Chinese Classification:	H61-Light metals and their alloys
Professional Classification:	GB-National Standard
Related Keywords:	aluminium alloy target aluminum alloy targets high-purity aluminum aluminum alloy electronic film scopethis standard
Related Topics:	High purity High purity standard Aluminum and aluminum alloy with high purity Sputtering target Gold ion sputtering apparatus molecular target sputtered gold sputtering target gold sputtering Ion sputtering + gold gold for sputtering Experimental gold thin film Efficient target Ion sputter gold High Efficiency Thin Film Battery ion sputtering gold target molecule sputtering target sputtered gold Gold ion sputtering apparatus high power target gold ion sputtering Enzyme target molecule Electronic target manufacturer Round aluminum target Round aluminum target electron sputtering Titanium Alloy Target target shooting High-purity titanium sputtering target for electronic thin film GBT29658 GB/T 29658-2013 pure aluminum Aluminum and Aluminum Alloy Ion sputtering instrument gold spraying rate Target aluminum box packaging Pure aluminum film execution Target materials used abroad Target purity test High purity aluminum High purity pseudo-boehmite

《GB/T 29658-2013电子薄膜用高纯铝及铝合金溅射靶材》由TC243（全国有色金属标准化技术委员会）归口，TC243SC1（全国有色金属标准化技术委员会轻金属分会）执行，主管部门为中国有色金属工业协会。
本标准规定了电子薄膜制备用高纯铝及铝合金靶材的要求、试验方法、检验规则及标志、包装、运输、存贮、订货单(或合同)等内容。
本标准适用于电子薄膜用各类高纯铝及铝合金溅射靶材(以下简称铝靶)。

Scope

This standard specifies the requirements, test methods, inspection rules and signs, packaging, transportation, storage, order form (or contract) and other contents of high-purity aluminum and aluminum alloy targets used in the preparation of electronic thin films. This standard applies to all kinds of high-purity aluminum and aluminum alloy sputtering targets for electronic thin films (hereinafter referred to as aluminum targets).

More samples: DL/T 368-2010 YD/T 3934-2021 QC/T 942-2021

Sample only — not a preview of GB/T 29658-2013

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