YS/T 718-2009 in English

VALID

Flat magneting sputtering target—Niobium target for optical coating

Issued on:2009-12-04
Implemented on:2010-06-01
File Format:PDF
Delivery:Via email within 1~3 business days

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$136.00

Standard No:	YS/T 718-2009
Document status:	VALID
Title in English:	Flat magneting sputtering target—Niobium target for optical coating
Title in Chinese:	平面磁控溅射靶材光学薄膜用铌靶
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2009-12-04
Implemented on:	2010-06-01
ICS Classification:	77.150.99-Other products of non-ferrous metals
Chinese Classification:	H63-Rare refractory metals and their compounds
Professional Classification:	YS-Non-ferrous Metal
Related Keywords:	target niobium target niobium targets optical films optical thin films niobium
Related Topics:	Optical film target Anode target material military target Target xrd xrd target Science target sem target ys/t 667.2-2009 maldi target co target material Magnetron sputtering mo target and cu target rotating target x-ray xrd diffraction target druggable target mc1000 target xrd target xrd+target Sputtering instrument Magnetron sputtering maldi target target spectrum Magnetron sputtering apparatus Rili magnetron sputtering machine ys/t722-2009 target diffractometer Optical Test Target transmission target target of xrd target ward target wave Sputtering instrument+ rotating target x-ray mn target target+xrd molecular target Target board sputtering target Wipe the target target target egg target to target plant target brain multi-target target recognition gold for sputtering cr target cu target wide target Second-hand magnetron sputtering machine Through the target target Efficient target wine target single crystal target fe target co target ni target target stripping Target manufacturer target cancer Expansion target biological target Bacteria target dish target target sn target dry target fat Lu target weak target Lookout target scratch Lu + target bow target target algorithm Laser Target egg target adjust target drinking target adjust target target eye Light control target targeted therapy fluorescent film target esterase target dna Pan target target probe target number cancer target magnetron sputtering and target target molecule Spallation target target site target dba What target is used for x-ray universal target candidate anode target co target copper plane target Magnetron sputtering quadrupole target non-target waveform target mutation Surface Roughness of Sputtering Target metabolomic targets Film inside and outside cu target co target target ms co target + cu target Vacuum sputtering apparatus + titanium target Target area Double target magnetron sputtering apparatus ms target board Laser Target pcr target Titanium flat target Purple target Magnetron sputtering titanium target ys/t575.24-2009 Titanium flat target target monkey co target and copper target optical resolution target fixed target co target and cu target test target target number x-ray target material target receptor cu target and co target ys/t 2009 target material energy target recognition Optical target Large target area Target light source instrument Test target effect target dna Photosensitive film ys/t514-2009 Magneto-optical metasurface Does magnetron sputtering technology film have radiation? target car target Standard optical target Target materials used abroad ys/t 203 2009 ys/t 514-2009 ys/t691-2009

本标准规定了平面磁控溅射光学薄膜用铌靶材的要求、试验方法、检验规则、标志、包装、运输、贮存及订货单（或合同）内容。
本标准适用于平面磁控溅射光学薄膜用铌靶材。

Scope

This standard specifies the requirements, test methods, inspection rules, marking, packaging, transportation, storage, and order form (contract) content for niobium targets used for planar magnetron sputtering optical films. This standard applies to niobium targets for planar magnetron sputtering optical thin films.

More samples: JC/T 2453-2018 YD/T 3934-2021 JJG 21-2008

Sample only — not a preview of YS/T 718-2009