X-ray Electron Spectroscopy Applications
X-ray Electron Spectroscopy Applications, Total:140 items.
The international standard classification for "X-ray Electron Spectroscopy Applications" includes: Chemical analysis , Optical measuring instruments , Measurement of electrical and magnetic quantities , IT applications in science , Other standards related to analytical chemistry , Optical equipment , Protection against crime , Electronic components in general .
The Chinese standard classification for "X-ray Electron Spectroscopy Applications" includes: Basic standards and general methods , Electron optics and other physical optics instrument , Integrated test system , Computer application , Electronic element in general , Electrochemical, thermochemistry and optical profile type analyzer , Crime judging technology .
General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China
- GB/T 30704-2014 Surface chemical analysis―X-ray photoelectron spectroscopy―Guidelines for analysis
- GB/T 19500-2004 General rules for X-ray photoelectron spectroscopic analysis method
- GB/T 28632-2012 Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—Determination of lateral resolution
- GB/T 25184-2010 Verification method for X-ray photoelectron spectrometers
- GB/T 18873-2002 General specification of transmission electron microscope(TEM)-X-ray energy dispersive spectrum(EDS) quantitative microanalysis for thin biological specimens
- GB/T 18873-2008 General guide of transmission electron microscope (TEM)-X - Ray energy dispersive spectrometry(EDS)quantitative microanalysis for thin biological specimens
- GB/T 17507-2008 General specification of thin biological standards for X-ray EDS microanalysis in transmission electron microscope
- GB/T 28892-2012 Surface chemical analysis - X-ray photoelectron spectroscopy -Description of selected instrumental performance parameters
- GB/T 22571-2008 Surface chemical analysis ? X-ray photoelectron spectrometers ? Calibration of energy scales
- GB/T 17507-1998 General specification of thin biological STANDARDs for X-ray EDS microanalysis in electron microscope
- GB/Z 32490-2016 Surface chemical analysis--X-ray photoelectron spectroscopy--Procedures for determining backgrounds
- GB/T 33352-2024 General rules of screening application of restricted substances in electrical and electronic products—X-Ray fluorescence spectrometry
- GB/T 31470-2015 Standard practice for determination of the specimen area contributing to the detected signal in Auger electron spectrometers and some X-ray photoelectron spectrometers
- GB/T 17359-1998 General specification of X-ray EDS quantitative analysis for EPMA and SEM
- GB/T 28892-2024 Surface chemical analysis—X-ray photoelectron spectroscopy—Description of selected instrumental performance parameters
- GB/T 33352-2016e General rules of screening application of restricted substances in electrical and electronic products—X-Ray fluorescence spectrometry
- GB/T 21006-2007 Surface chemical analysis - X-ray photoelectron and Auger electron spectrometers - Linearity of intensity scale
Professional Standard - Electron
- SJ/T 10714-1996 Standard practice for checking the operation characteristics of X-ray photoelectron spectrometers
- SJ/T 10458-1993 Standard guide for specimen handling in auger electron spectroscopy and X-ray photoelectron spectroscopy
Professional Standard - Judicatory
- SF/T 0139-2023 Examination of soil—Scanning electron microscope/X-ray energy dispersive spectrometry
国家市场监督管理总局、中国国家标准化管理委员会
- GB/T 36401-2018 Surface chemical analysis—X-ray photoelectron spectroscopy—Reporting of results of thin-film analysis
- GB/T 41073-2021 Surface chemical analysis―Electron spectroscopies―Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
- GB/T 41064-2021 Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会
- GB/T 22571-2017 Surface chemical analysis--X-ray photoelectron spectrometers--Calibration of energy scales
- GB/T 33352-2016 General rules of screening application of restricted substances in electrical and el ectronic products一X-Ray fluorescence spectrometry
Professional Standard - Public Safety Standards
- GA/T 1939-2021 Forensic sciences-Examination methods for electric marks-Scanning electron microscopy/energy dispersive X-ray spectrometry
- GA/T 1522-2018 Forensic science―Examination methods for gun shot residue―Scanning electron microscope/energy dispersive X-ray spectrometry
- GA/T 1938-2021 Forensic sciences- Examination methods for metal-Scanning electron microscope/energy dispersive X-ray spectrometry
- GA/T 1937-2021 Forensic sciences-Examination methods for rubber- Scanning electron microscope/energy dispersive X-ray spectrometry
Guangdong Provincial Standard of the People's Republic of China
- DB44/T 1215-2013 Characterization of Single-Walled Carbon Nanotubes Using Scanning Electron Microscopy and Energy Spectroscopy
- DB44/T 1216-2013 Characterization of graphene using scanning electron microscopy and X-ray spectroscopy
Fujian Provincial Standard of the People's Republic of China
- DB35/T 110-2000 Electron probe and scanning electron microscope X-ray energy spectrum analysis method for paint physical evidence detection
Professional Standard - Nuclear Industry
- EJ/T 805-1993 Low Energy Photon Sources for X-ray Fluorescence Analysis
Group Standards of the People's Republic of China
- T/CSTM 01199-2024 Multilayer metal film-Measurement and analysis method of layer structure-X-ray photoelectron spectroscopy
Military Standard of the People's Republic of China-General Armament Department
- GJB 5814-2006 Testing method of X-ray dose enhancement effect for military electronic devices
American Society for Testing and Materials (ASTM)
- ASTM E995-11 Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy
- ASTM E2108-16 Standard Practice for Calibration of the Electron Binding-Energy Scale of an X-Ray Photoelectron Spectrometer
- ASTM E996-10(2018) Standard Practice for Reporting Data in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy
- ASTM E996-19 Standard Practice for Reporting Data in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy
- ASTM E995-16 Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy
- ASTM E2735-14(2020) Standard Guide for Selection of Calibrations Needed for X-ray Photoelectron Spectroscopy (XPS) Experiments
- ASTM E996-04 Standard Practice for Reporting Data in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy
- ASTM E996-10 Standard Practice for Reporting Data in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy
- ASTM E996-94(1999) Standard Practice for Reporting Data in Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy
- ASTM E902-94(1999) Standard Practice for Checking the Operating Characteristics of X-Ray Photoelectron Spectrometers
- ASTM E1523-97 Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy
- ASTM E1523-15 Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy
- ASTM E1588-10e1 Standard Guide for Gunshot Residue Analysis by Scanning Electron Microscopy/ Energy Dispersive X-ray Spectrometry
- ASTM E1523-24 Standard Guide to Charge Control and Charge Referencing Techniques in X-Ray Photoelectron Spectroscopy
- ASTM E1217-11(2019) Standard Practice for Determination of the Specimen Area Contributing to the Detected Signal in Auger Electron Spectrometers and Some X-Ray Photoelectron Spectrometers
- ASTM E1588-16 Standard Guide for Gunshot Residue Analysis by Scanning Electron Microscopy/Energy Dispersive X-Ray Spectrometry
German Institute for Standardization
- DIN ISO 16129:2020-11 Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer (ISO 16129:2018); Text in English
- DIN ISO 16129 E:2020-01 Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
- DIN ISO 16129:2020 Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer (ISO 16129:2018); Text in English
- DIN ISO 15472 E:2019-09 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales
- DIN ISO 15472:2020-05 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales (ISO 15472:2010); Text in English
- DIN ISO 15472:2020 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales (ISO 15472:2010); Text in English
British Standards Institution (BSI)
- BS ISO 16129:2018 Surface chemical analysis. X-ray photoelectron spectroscopy. Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
- BS ISO 16129:2012 Surface chemical analysis. X-ray photoelectron spectroscopy. Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
- BS ISO 21270:2004(2010) Surface chemical analysis — X - ray photoelectron and Auger electron spectrometers — Linearity of intensity scale
- BS ISO 21270:2004 Surface chemical analysis. X-ray photoelectron and Auger electron spectrometers. Linearity of intensity scale
- BS ISO 19830:2015 Surface chemical analysis. Electron spectroscopies. Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
- BS ISO 10810:2019 Surface chemical analysis. X-ray photoelectron spectroscopy. Guidelines for analysis
- BS ISO 18516:2006(2010) Surface chemical analysis — Auger electron spectroscopy and X - ray photoelectron spectroscopy — Determination of lateral resolution
- BS ISO 10810:2010 Surface chemical analysis. X-ray photoelectron spectroscopy. Guidelines for analysis
- BS ISO 18554:2016 Surface chemical analysis. Electron spectroscopies. Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy
- BS ISO 14701:2018 Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
- BS ISO 14701:2011 Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
- BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
- 21/30433862 DC BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and…
- BS ISO 16243:2011 Surface chemical analysis. Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
- BS ISO 19318:2021 Surface chemical analysis. X-ray photoelectron spectroscopy. Reporting of methods used for charge control and charge correction
International Organization for Standardization (ISO)
- ISO 16129:2018 Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
- ISO 16129:2012 Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
- ISO 21270:2004 Surface chemical analysis - X-ray photoelectron and Auger electron spectrometers - Linearity of intensity scale
- ISO 19830:2015 Surface chemical analysis - Electron spectroscopies - Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
- ISO 10810:2019 Surface chemical analysis — X-ray photoelectron spectroscopy — Guidelines for analysis
- ISO 10810:2010 Surface chemical analysis - X-ray photoelectron spectroscopy - Guidelines for analysis
- ISO 18554:2016 Surface chemical analysis - Electron spectroscopies - Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy
- ISO/CD TR 18392:2023 Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for determining backgrounds
- ISO 15470:2017 Surface chemical analysis - X-ray photoelectron spectroscopy - Description of selected instrumental performance parameters
- ISO 14701:2018 Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness
- ISO 17109:2022 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth p
- ISO 13424:2013 Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of results of thin-film analysis
- ISO 14701:2011 Surface chemical analysis - X-ray photoelectron spectroscopy - Measurement of silicon oxide thickness
- ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- ISO 16243:2011 Surface chemical analysis - Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
- ISO 18118:2024 Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis
GSO
- BH GSO ISO 16129:2015 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
- OS GSO ISO 16129:2014 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
- GSO ISO 21270:2014 Surface chemical analysis -- X-ray photoelectron and Auger electron spectrometers -- Linearity of intensity scale
- BH GSO ISO 21270:2016 Surface chemical analysis -- X-ray photoelectron and Auger electron spectrometers -- Linearity of intensity scale
- OS GSO ISO 21270:2014 Surface chemical analysis -- X-ray photoelectron and Auger electron spectrometers -- Linearity of intensity scale
- BH GSO ISO 19830:2017 Surface chemical analysis -- Electron spectroscopies -- Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
- GSO ISO 19830:2016 Surface chemical analysis -- Electron spectroscopies -- Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
- GSO ISO 10810:2013 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Guidelines for analysis
- OS GSO ISO 10810:2013 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Guidelines for analysis
- BH GSO ISO 10810:2016 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Guidelines for analysis
- OS GSO ISO 18554:2017 Surface chemical analysis -- Electron spectroscopies -- Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy
- OS GSO ISO 18516:2013 Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Determination of lateral resolution
- BH GSO ISO 18516:2016 Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Determination of lateral resolution
- GSO ISO 18516:2013 Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Determination of lateral resolution
- GSO ISO 18554:2017 Surface chemical analysis -- Electron spectroscopies -- Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy
- BH GSO ISO 15472:2016 Surface chemical analysis -- X-ray photoelectron spectrometers -- Calibration of energy scales
- GSO ISO 15470:2013 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Description of selected instrumental performance parameters
- GSO ISO 14701:2013 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Measurement of silicon oxide thickness
- GSO ISO/TR 18392:2013 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for determining backgrounds
- OS GSO ISO 13424:2015 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Reporting of results of thin-film analysis
- BH GSO ISO 13424:2017 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Reporting of results of thin-film analysis
- GSO ISO 13424:2015 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Reporting of results of thin-film analysis
- BH GSO ISO 20903:2016 Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Methods used to determine peak intensities and information required when reporting results
- BH GSO ISO 16243:2017 Surface chemical analysis -- Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
- GSO ISO 16129:2014 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
- OS GSO ISO 16243:2015 Surface chemical analysis -- Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
- GSO ISO 16243:2015 Surface chemical analysis -- Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
SCC
- 11/30230635 DC BS ISO 16129. Surface chemical analysis. X-ray photoelectron spectroscopy. Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
- DIN ISO 16129 E:2020 Draft Document - Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer (ISO 16129:2018); Text in English
- AWWA 51768 Identification of Low Pressure Reverse Osmosis Membrane Failure by X-Ray Photoelectron Spectroscopy
- BS ISO 15472:2001 Surface chemical analysis. X-ray photoelectron spectrometers. Calibration of energy scales
- ISO 15472:2001/DAmd 1 Chemical analysis of surfaces — X-ray photoelectron spectrometers — Energy calibration — Amendment 1
- 09/30191895 DC BS ISO 10810. Surface chemical analysis. X-ray photoelectron spectroscopy. Guidelines for analysis
- BS ISO 15470:2004 Surface chemical analysis. X-ray photoelectron spectroscopy. Description of selected instrumental performance parameters
- ISO 17109:2015/DAmd 1 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films — A...
- BS ISO 19318:2004 Surface chemical analysis. X-ray photoelectron spectroscopy. Reporting of methods used for charge control and charge correction
- 10/30212265 DC BS ISO 14701. Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
Korean Agency for Technology and Standards (KATS)
- KS D ISO 21270-2020 Surface chemical analysis-X-ray photoelectron and Auger electron spectrometers-Linearity of intensity scale
- KS D ISO 21270:2005 Surface chemical analysis-X-ray photoelectron and Auger electron spectrometers-Linearity of intensity scale
- KS D ISO 21270-2005(2020) Surface chemical analysis-X-ray photoelectron and Auger electron spectrometers-Linearity of intensity scale
- KS D ISO 15470-2005(2020) Surface chemical analysis-X-ray photoelectron spectroscopy-Description of selected instrumental performance parameters
- KS D ISO 15470-2020 Surface chemical analysis-X-ray photoelectron spectroscopy-Description of selected instrumental performance parameters
- KS D ISO 19318-2005(2020) Surface chemical analysis-X-ray photoelectron spectroscopy-Reporting of methods used for charge control and charge correction
- KS D ISO 18118-2005(2020) Surface chemical analysis-Auger electron spectroscopy and X-ray photoelectron spectroscopy-Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of h
Association Francaise de Normalisation
- NF X21-071:2011 Surface Chemical Analysis - X-ray photoelectron Spectroscopy - Guidelines for analysis.
- NF M60-512:1984 X AND GAMMA REFERENCE RADIATIONS FOR CALIBRATING DOSEMETERS AND DOSE RATEMETERS AND FOR DETERMINING THEIR RESPONSE AS A FUNCTION OF PHOTON ENERGY.
- NF X21-073*NF ISO 16243:2012 Surface chemical analysis - Recording and reporting data in X-ray photoelectron spectroscopy (XPS).
- NF ISO 16243:2012 Chemical Analysis of Surfaces - X-ray Photoelectron Spectroscopy (XPS) Data Logging and Reporting
KR-KS
- KS D ISO 15472-2003(2023) Surface chemical analysis - X-ray photoelectron spectroscopy - Calibration of energy scale
Standard Association of Australia (SAA)
- AS ISO 15472:2006 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales
RU-GOST R
- GOST 25645.118-1984 Cosmic X-rays of the discrete sources. Energy spectra and angular coordinates
x-ray electron spectroscopy,X-ray electron spectrometer,X-ray Spectroscopy and Electron Spectroscopy,x-ray electron spectroscopy,Auger Electron Spectroscopy X-ray Spectroscopy,X-ray Scanning Electron Spectroscopy,x-ray electron spectroscopy,X-ray Electron Spectroscopy,x-ray electron spectroscopy,x-ray photoelectron spectroscopy,X-ray Auger Electron Spectroscopy,X-ray Auger Electron Spectroscopy,X-ray Photoelectron Spectroscopy Applications,X-ray Photoelectron Spectroscopy Applications,X-ray Electron Spectroscopy Applications,X-ray Electron Spectroscopy Applications,X-ray electron spectroscopy sample preparation,X-ray Photoelectron Spectroscopy+ Applications,X-ray spectroscopy applications,X-ray Spectroscopy Electron Spectroscopy