Chromatography mass spectrometry
Chromatography mass spectrometry, Total:111 items.
The international standard classification for "Chromatography mass spectrometry" includes: Cosmetics. Toiletries , Chemical analysis , Organic chemicals in general , Fissile materials , Other standards related to analytical chemistry , Chemical analysis of metals .
The Chinese standard classification for "Chromatography mass spectrometry" includes: Cosmetics , Basic standards and general methods , Organic chemicals in general , Nuclear material, nuclear fuel and their analytical test method , Material composition analysis instrument and environment detection instrument in general , chromatograph , Precious metals and its alloy analysis method .
Taiwan Provincial Standard of the People's Republic of China
- CNS 12511-1989 General Rules for Mass Spectrometric Analysis
- CNS 12509-1989 General Rules Analytical Methods in Gas Chromatography/Mass Spectrometry
General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China
- GB/T 13701-1992 analysis of uranium by single - Standard gas mass - Spectrometer method
- GB/T 24800.2-2009 Determination of 41 glucocorticoids in cosmetics by LC-MS-MS and TLC method
- GB/T 6041-2002 General rules for mass spectrometric analysis
- GB/T 22572-2008 Surface chemical analysis - Secondary-ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials
- GB/T 32495-2016 Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of arsenic in silicon
- GB/T 6041-2020 General rules for mass spectrometric analysis
- GB/Z 35959-2018 General rule for liquid chromatography-mass spectrometry
国家市场监督管理总局、中国国家标准化管理委员会
- GB/T 40129-2021 Surface chemical analysis—Secondary ion mass spectrometry—Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
- GB/T 40109-2021 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
- GB/T 37847-2019 General rules for isotope composition analysis by mass spectrometry
- GB/T 38171-2019 Metal chelating chromatographic medium
- GB/T 38172-2019 Protein A affinity chromatographic medium
- GB/T 41064-2021 Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
Group Standards of the People's Republic of China
- T/ZPP 017-2023 Mass Cytometry Analyzer
- T/CSTM 00253-2020 Test method of thermal analysis coupled with mass spectrometry for phenolic resin
- T/CSTM 01199-2024 Multilayer metal film-Measurement and analysis method of layer structure-X-ray photoelectron spectroscopy
- T/SZBX 017-2021 Protein A affinity chromatographic medium
- T/GDNB 208-2024 Fast analysis of cyromazine in cowpea—Liquid chromatography-massspectrometry method
Professional Standard - Education
- JY/T 003-1996 General principles for organic mass spectrometry
Professional Standard - Petroleum
- SY/T 5258-1991 Chromatography-mass spectrometry identification method for biomarkers
- SY/T 6242-1996 Gas Chromatography Analysis Method of Oleaginous Colloid Wax Content in Crude Oil
Military Standard of the People's Republic of China-General Armament Department
- GJB 8791-2015 Lithium isotope abundance mass spectrometry
- GJB 5168-2003 Lithium isotope abundance mass spectrometry
工业和信息化部
- HG/T 5831-2021 Chemical online gas mass spectrometer
Professional Standard - Ferrous Metallurgy
- YB/T 4304-2012 General Rule for Fusion Extraction- Mass Spectrometric Analysis Method
Professional Standard - Non-ferrous Metal
- YS/T 363-2006 Determination of trace impurities in purity rhodium by atomic emission spectrometric
- YS/T 364-1994 Emission Spectral Analysis of Impurity Elements in Pure Iridium
- YS/T 365-1994 Emission Spectrum Analysis of Impurity Elements in High Purity Platinum
- YS/T 361-2006 Determination of trace impurities in purity platinium by atomic emission spectrometric
- YS/T 362-2006 Determination of trace impurities in purity palladium by atomic emission spectrometric
- YS/T 362-1994 Emission spectrum analysis of impurity elements in pure palladium
- YS/T 363-1994 Emission spectrum analysis of impurity elements in pure rhodium
- YS/T 365-2006 Determination of trace impurities in high purity platinum by atomic emission sspectrometric
- YS/T 364-2006 Determination of trace impurities in purity iridium by atomic emission spectrometric
- YS/T 361-1994 Emission Spectral Analysis of Impurity Elements in Pure Platinum
Liaoning Provincial Standard of the People's Republic of China
- DB21/T 2555-2016 Determination of BTEX in seawater by purge and trap gas chromatography-mass spectrometry
KR-KS
- KS M 0025-2008(2023) General rules for mass spectrometric analysis
- KS M 0027-2008(2023) General rules for analytical methods in gas chromatography mass spectrometry
Korean Agency for Technology and Standards (KATS)
- KS M 0027-1993 General Rules for Analytical Methods in Gas Chromatography Mass Spectrometry
- KS M 0027-2023 General rules for analytical methods in gas chromatography mass spectrometry
- KS M 0025-2008(2018) General rules for mass spectrometric analysis
- KS M 0025-2023 General rules for mass spectrometric analysis
- KS M 0025-1993 General rules for mass spectrometric analysis
- KS M 0027-2008(2018) General rules for analytical methods in gas chromatography mass spectrometry
- KS M 0027-2008 General rules for analytical methods in gas chromatography mass spectrometry
- KS D ISO 20341-2020 Surface chemical analysis-Secondary-ion mass spectrometry-Method for estimating depth resolution parameters with multiple delta-layer reference materials
- KS D ISO 20341-2005(2020) Surface chemical analysis-Secondary-ion mass spectrometry-Method for estimating depth resolution parameters with multiple delta-layer reference materials
- KS H ISO 22634:2012 Cigarettes-Determination of benzo[a]pyrene in cigarette mainstream smoke-Method using gas chromatography/mass spectrometry
- KS D ISO 20341:2005 Surface chemical analysis-Secondary-ion mass spectrometry-Method for estimating depth resolution parameters with multiple delta-layer reference materials
NL-NEN
- NEN 2295-1970 Terminology of thin-layer chromatography
SCC
- ISO 17109:2015/DAmd 1 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films — A...
- BS PD ISO/TS 15338:2020 Surface chemical analysis. Glow discharge mass spectrometry. Operating procedures
- AWWA WQTC58783 Liquid Chromatography Mass Spectrometry (LC-MS) Based Method for the Analysis of Algal Toxins
RU-GOST R
- GOST R 56240-2014 Copper. Spectral methods of impurity analysis
- GOST 4.361-1985 Product-quality index system. Mass-spectrometric analysers. Index nomenclature
British Standards Institution (BSI)
- BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
- BS ISO 23812:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
- BS ISO 13084:2018 Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
- BS PD CEN/TR 15641:2007 Food analysis — Determination of pesticide residues by LC-MS/MS — Tandem mass spectrometric parameters
- PD ISO/TS 15338:2020 Surface chemical analysis. Glow discharge mass spectrometry. Operating procedures
- BS ISO 20411:2018 Surface chemical analysis. Secondary ion mass spectrometry. Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
- BS ISO 10638:2017 Rubber. Identification of antidegradants by gas chromatography/mass spectrometry
- BS ISO 10638:2010 Rubber - Identification of antidegradants by gas chromatography/mass spectrometry
- BS ISO 13084:2011 Surface chemical analysis. Secondary-ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
- BS ISO 17858:2007 Water quality - Determination of dioxin-like polychlorinated Biphenyls - Method using gas-chromatography/mass spectrometry
- BS ISO 12406:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
Japanese Industrial Standards Committee (JISC)
- JIS K 0118:1979 General rules for mass spectrometric analysis
- JIS K 0123:1995 General rules for analytical methods in gas chromatography mass spectrometry
- JIS K 0133:2022 General rules for ICP-mass spectrometry
- JIS K 0136:2015 General rules for high performance liquid chromatography / mass spectrometry
- JIS K 0136:2004 General rules for high performance liquid chromatography / mass spectrometry
- JIS K 6241:2012 Rubber -- Identification of antidegradants by gas chromatography/mass spectrometry
- JIS K 0164:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
- JIS K 0156:2018 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials
- JIS K 0157:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
International Organization for Standardization (ISO)
- ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
- ISO 13084:2011 Surface chemical analysis - Secondary-ion mass spectrometry - Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
- ISO 13084:2018 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
- ISO 17109:2022 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth p
- ISO 10638:2010 Rubber - Identification of antidegradants by gas chromatography/mass spectrometry
- ISO/TS 22933:2022 Surface chemical analysis — Secondary ion mass spectrometry — Method for the measurement of mass resolution in SIMS
- ISO 10638:2017 Rubber - Identification of antidegradants by gas chromatography/mass spectrometry
- ISO 12406:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of arsenic in silicon
Association Francaise de Normalisation
- NF X21-066*NF ISO 23812:2009 Surface chemical analysis - Secondary ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
- NF V03-155:2010 Food analysis - Determination of patuline by High performance liquid chromatography - Mass spectrometry/Mass spectrometry method (HPLC-MS/MS).
- NF EN ISO 22892:2011 Soil quality - Guidelines for the identification of target compounds by gas chromatography and mass spectrometry
- NF X31-439*NF EN ISO 22892:2011 Soil quality - Guidelines for the identification of target compounds by gas chromatography and mass spectrometry.
- NF EN 62321-8:2017 Determination of certain substances in electrotechnical products - Part 8: Analysis of phthalates in polymers by gas chromatography-mass spectrometry (GC-MS), gas chromatography-mass spectrometry ...
GSO
- GSO ISO 10638:2013 Rubber - Identification of antidegradants by gas chromatography/mass spectrometry
- OS GSO ISO 23812:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials
- BH GSO ISO 23812:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials
- GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
- BH GSO ISO 13084:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
- OS GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
- GSO ISO 23812:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials
- GSO OIML R83:2008 Gas chromatograph/mass spectrometer systems for the analysis of organic pollutants in water
- BH GSO ISO 17560:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
- OS GSO OIML R83:2008 Gas chromatograph/mass spectrometer systems for the analysis of organic pollutants in water
American Society for Testing and Materials (ASTM)
- ASTM C791-83(2000) Standard Test Methods for Chemical, Mass Spectrometric, and Spectrochemical Analysis of Nuclear-Grade Boron Carbide
- ASTM E1504-11 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
- ASTM RR-C26-1000 1976 C0791-Methods for Chemical, Mass Spectrometric, Spectrochemical Analysis of Nuclear-Grade Boron Carbide
- ASTM C696-11 Standard Test Methods for Chemical, Mass Spectrometric, and Spectrochemical Analysis of Nuclear-Grade Uranium Dioxide Powders and Pellets
AT-ON
- ONORM M 6238 Teil.1-1986 Water analysis; determination ofnitrate; 2,6-dimethylphenol spectrometric method
- ONORM M 6603-2-1997 Water analysis - Determination of potassium and sodium by flame emission spectrometry
- ONORM M 6603-1-1997 Water analysis - Determination of potassium and sodium by atomic absorption spectrometry
RO-ASRO
- STAS SR 12271-18-1996 Uranium dioxide. Uranium isotopic analysis by mass spectrometry
IT-UNI
- UNI 6714-1970 Chemical analysis of the mineral manganese. Zinc determination. Polarography
German Institute for Standardization
- DIN ISO 22634:2012 Cigarettes - Determination of benzo[a]pyrene in cigarette mainstream smoke - Method using gas chromatography/mass spectrometry (ISO 22634:2008)
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