Semiconductor devices. Micromechanical devices. Part 7:
Semiconductor devices. Micromechanical devices. Part 7:, Total:204 items.
The international standard classification for "Semiconductor devices. Micromechanical devices. Part 7:" includes: Integrated circuits. Microelectronics , Other semiconductor devices , Semiconductor devices in general , Transistors .
The Chinese standard classification for "Semiconductor devices. Micromechanical devices. Part 7:" includes: Semiconductor discrete devices in general , Microcircuit in general .
未注明发布机构
- DIN EN 62047-19 E:2011-11 Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses
- DIN EN 62047-1 E:2014-05 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
- DIN EN 62047-18 E:2011-06 Semiconductor devices - Micro-electromechanical devices - Part 18: Bend testing methods of thin film materials
General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China
- GB/T 42709.19-2023 Semiconductor devices―Micro-electromechanical devices―Part 19:Electronic compasses
- GB/T 20516-2006 Semiconductor devices - Discrete devices - Part 4: Microwave devices
- GB/T 4587-2023 Semiconductor devices—Discrete devices—Part 7:Bipolar transistors
- GB/T 42709.5-2023 Semiconductor devices—Micro-electromechanical devices—Part 5: RF MEMS switches
- GB/T 32817-2016 Semiconductor devices - Micro-electromechanical devices - Generic specification for MEMS
International Electrotechnical Commission (IEC)
- IEC 62047-7:2011 Semiconductor devices - Micro-electromechanical devices - Part 7: MEMS BAW filter and duplexer for radio frequency control and selection
- IEC 62435-7:2020 Electronic components - Long-term storage of electronic semiconductor devices - Part 7: Micro-electromechanical devices
- IEC 62047-20:2014 Semiconductor devices - Micro-electromechanical devices - Part 20: Gyroscopes
- IEC 62047-5:2011/COR1:2012 Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches; Corrigendum 1
- IEC 62047-5:2011 Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches
- IEC 62047-4:2008 Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specifications for MEMS
- IEC 62047-40:2021 Semiconductor devices - Micro-electromechanical devices - Part 40: Test methods of micro-electromechanical inertial shock switch threshold
- IEC 62047-1:2005 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
- IEC 62047-1:2016 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
- IEC 60747-16-7:2022 Semiconductor devices - Part 16-7: Microwave integrated circuits - Attenuators
- IEC 62047-35:2019 Semiconductor devices – Micro-electromechanical devices - Part 35: Test method of electrical characteristics under bending deformation for flexible electro-mechanical devices
- IEC 62047-22:2014 Semiconductor devices - Micro-electromechanical devices - Part 22: Electromechanical tensile test method for conductive thin films on flexible substrates
- IEC 60747-7:2000 Semiconductor devices - Part 7: Bipolar transistors
- IEC 62047-33:2019 Semiconductor devices - Micro-electromechanical devices - Part 33: MEMS piezoresistive pressure-sensitive device
- IEC 62047-26:2016 Semiconductor devices - Micro-electromechanical devices - Part 26: Description and measurement methods for micro trench and needle structures
- IEC 62047-21:2014 Semiconductor devices - Micro-electromechanical devices - Part 21: Test method for Poisson's ratio of thin film MEMS materials
- IEC 62047-11:2013 Semiconductor devices - Micro-electromechanical devices - Part 11: Test method for coefficients of linear thermal expansion of free-standing materials for micro-electromechanical systems
- IEC 62047-10:2011/COR1:2012 Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials; Corrigendum 1
- IEC 62047-41:2021 Semiconductor devices - Micro-electromechanical devices - Part 41: RF MEMS circulators and isolators
- IEC 60747-16-3:2002/AMD1:2009 Semiconductor devices - Part 16-3: Microwave integrated circuits - Frequency converters; Amendment 1
- IEC 62047-2:2006 Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin film materials
- IEC 60747-4:2007/AMD1:2017 Semiconductor devices - Discrete devices - Part 4: Microwave diodes and transistors
- IEC 60747-4:2001 Semiconductor devices - Discrete devices - Part 4: Microwave devices
- IEC 60747-7:1988 Semiconductor discrete devices and integrated circuits; part 7: bipolar transistors
- IEC 60747-4:2007 Semiconductor devices - Discrete devices - Part 4: Microwave diodes and transistors
- IEC 60747-7:2010+AMD1:2019 CSV Semiconductor devices - Discrete devices - Part 7: Bipolar transistors
- IEC 60747-7:2010/AMD1:2019 Semiconductor devices - Discrete devices - Part 7: Bipolar transistors
- IEC 60747-7:2010 Semiconductor devices - Discrete devices - Part 7: Bipolar transistors
- IEC 60747-7:2019 Semiconductor devices - Discrete devices - Part 7: Bipolar transistors
- IEC 62047-6:2009 Semiconductor devices - Micro-electromechanical devices - Part 6: Axial fatigue testing methods of thin film materials
- IEC 60747-5-5:2007 Semiconductor devices - Discrete devices - Part 5-5: Optoelectronic devices - Photocouplers
- IEC 62047-9:2011/COR1:2012 Semiconductor devices - Micro-electromechanical devices - Part 9: Wafer to wafer bonding strength measurement for MEMS
Japanese Industrial Standards Committee (JISC)
- JIS C 5630-20:2015 Semiconductor devices -- Micro-electromechanical devices -- Part 20: Gyroscopes
- JIS C 5630-19:2014 Semiconductor devices -- Micro-electromechanical devices -- Part 19: Electronic compasses
- JIS C 5630-1:2017 Semiconductor devices -- Micro-electromechanical devices -- Part 1: Terms and definitions
- JIS C 5630-1:2008 Semiconductor devices -- Micro-electromechanical devices -- Part 1: Terms and definitions
- JIS C 5630-18:2014 Semiconductor devices -- Micro-electromechanical devices -- Part 18: Bend testing methods of thin film materials
- JIS C 5630-6:2011 Semiconductor devices -- Micro-electromechanical devices -- Part 6: Axial fatigue testing methods of thin film materials
Association Francaise de Normalisation
- NF C96-050-20*NF EN 62047-20:2014 Semiconductor devices - Micro-electromechanical devices - Part 20 : gyroscopes
- NF C96-050-19*NF EN 62047-19:2014 Semiconductor devices - Micro-electromechanical devices - Part 19 : electronic compasses
- NF C96-050-5*NF EN 62047-5:2012 Semiconductor devices - Micro-electromechanical devices - Part 5 : RF MEMS switches.
- NF EN IEC 62435-7:2021 Electronic components - Long-term storage of semiconductor electronic devices - Part 7: microelectromechanical devices
- NF C96-050-4*NF EN 62047-4:2011 Semiconductor devices - Micro-electromechanical devices - Part 4 : generic specifications for MEMS.
- NF C96-435-7:2021 Electronic components - Long-term storage of electronic semiconductor devices - Part 7 : micro-electromechanical devices
- NF C96-050-1*NF EN 62047-1:2016 Semiconductor devices - Micro-electromechanical devices - Part 1 : terms and definitions
- NF C96-050-1:2006 Semiconductor devices - Micro- electromechanical devices - Part 1 : terms and definitions.
- NF EN IEC 60747-16-7:2023 Dispositifs à semiconducteurs - Partie 16-7 : circuits intégrés hyperfréquences - Atténuateurs
- NF EN 62047-19:2014 Dispositifs à semiconducteurs - Dispositifs microélectromécaniques - Partie 19 : compas électroniques
- NF EN 62047-20:2014 Dispositifs à semiconducteurs - Dispositifs microélectromécaniques - Partie 20 : gyroscopes
- NF EN 62047-5:2012 Dispositifs à semiconducteurs - Dispositifs microélectromécaniques - Partie 5 : commutateurs MEMS-RF
- NF C96-050-9*NF EN 62047-9:2012 Semiconductor devices - Micro-electromechanical devices - Part 9 : wafer to wafer bonding strength measurement for MEMS.
- NF C96-050-18*NF EN 62047-18:2014 Semiconductor devices - Micro-electromechanical devices - Part 18 : bend testing methods of thin film materials
- NF C96-050-22*NF EN 62047-22:2014 Semiconductor devices - Micro-electromechanical devices - Part 22 : electromechanical tensile test method for conductive thin films on flexible substrates
- NF EN 62047-12:2012 Semiconductor devices - Microelectromechanical devices - Part 12: method of testing bending fatigue of thin-film materials using resonance vibrations of microelectromechanical system structures (M...
- NF C96-050-7*NF EN 62047-7:2011 Semiconductor devices - Micro-electromechanical devices - Part 7 : MEMS BAW filter and duplexer for radio frequency control and selection
- NF EN 62047-4:2011 Dispositifs à semiconducteurs - Dispositifs microélectromécaniques - Partie 4 : spécification générique pour les MEMS
- NF C96-016-1*NF EN 60747-16-1:2003 Semiconductor devices - Part 16-1 : microwave integrated circuits - Amplifiers
- NF EN 62047-1:2016 Dispositifs à semiconducteurs - Dispositifs microélectromécaniques - Partie 1 : termes et définitions
- NF C96-050-26*NF EN 62047-26:2016 Semiconductor devices - Micro-electromechanical devices - Part 26 : description and measurement methods for micro trench and needle structures
- NF C96-016-3*NF EN 60747-16-3:2003 Semiconductor devices - Part 16-3 : microwave integrated circuits - Frequency converters.
- NF C96-050-21*NF EN 62047-21:2014 Semiconductor devices - Micro-electromechanical devices - Part 21 : test method for Poisson's ratio of thin film MEMS materials
- NF C96-050-11*NF EN 62047-11:2014 Semiconductor devices - Micro-electromechanical devices - Part 11 : test method for coefficients of linear thermal expansion of free-standing materials for micro-electromechanical systems
- NF C96-016-3/A1*NF EN 60747-16-3/A1:2013 Semiconductor devices - Part 16-3 : microwave integrated circuits - Frequency converters
- NF C96-050-2*NF EN 62047-2:2006 Semiconductor devices - Micro-electromechanical devices - Part 2 : tensile testing methods of thin film materials.
- NF C96-050-10*NF EN 62047-10:2012 Semiconductor devices - Micro-electromechanical devices - Part 10: micro-pillar compression test for MEMS materials
- NF C96-016-4/A1*NF EN 60747-16-4/A1:2012 Semiconductor devices - Part 16-4 : microwave integrated circuits - Switches
- NF C96-050-6*NF EN 62047-6:2010 Semiconductor devices - Micro-electromechanical devices - Part 6 : axial fatigue testing methods of thin film materials
- NF EN 62047-7:2011 Semiconductor devices - Microelectromechanical devices - Part 7: BAW MEMS filter and duplexer for radio frequency control and selection
- NF C96-015:2005 Discrete semiconductor devices - Part 15: isolated power semiconductor devices
British Standards Institution (BSI)
- BS EN 62047-20:2014 Semiconductor devices. Micro-electromechanical devices. Gyroscopes
- BS EN 62047-19:2013 Semiconductor devices. Micro-electromechanical devices. Electronic compasses
- BS EN 62047-5:2011 Semiconductor devices. Micro-electromechanical devices. RF MEMS switches
- 23/30481371 DC BS EN IEC 62047-4 Semiconductor devices. Micro-electromechanical devices. Part 4. Generic specification for MEMS
- BS EN IEC 62435-7:2021 Electronic components. Long-term storage of electronic semiconductor devices. Micro-electromechanical devices
- BS EN 62047-5:2011(2012) Semiconductor devices — Micro - electromechanical devices Part 5 : RF MEMS switches
- 20/30404574 DC BS EN IEC 62047-41. Semiconductor devices. Micro-electromechanical devices. Part 41. RF MEMS Circulators and Isolators
- 20/30414411 DC BS EN 60747-16-7. Semiconductor devices. Part 16-7. Microwave integrated circuits. Attenuators
- BS EN 62047-4:2010 Semiconductor devices. Micro-electromechanical devices. Generic specification for MEMS
- BS EN 62047-1:2006 Semiconductor devices - Micro-electromechanical devices - Terms and definitions
- BS EN 62047-1:2016 Semiconductor devices. Micro-electromechanical devices. Terms and definitions
- 20/30431959 DC BS EN IEC 60747-16-7. Semiconductor devices. Part 16-7. Microwave integrated circuits. Attenuators
- 20/30405217 DC BS EN IEC 62047-40. Semiconductor devices. Micro-electromechanical devices. Part 40. Test methods of Micro-electromechanical inertial shock switch threshold
- BS EN 60747-16-4:2004+A1:2011 Semiconductor devices. Microwave integrated circuits. Switches
- BS EN 60747-16-5:2013 Semiconductor devices. Microwave integrated circuits. Oscillators
- BS EN 62047-22:2014 Semiconductor devices. Micro-electromechanical devices. Electromechanical tensile test method for conductive thin films on flexible substrates
- 13/30264596 DC BS EN 60747-14-7. Semiconductor devices. Part 14-7. Semiconductor sensor. Flow meter
- BS EN 62047-18:2013 Semiconductor devices. Micro-electromechanical devices. Bend testing methods of thin film materials
- 19/30364443 DC BS EN IEC 62047-35. Semiconductor devices. Micro-electromechanical devices. Part 35. Test method of electrical characteristics under bending deformation for flexible and foldable electro-mechanical devices
- BS EN 62047-21:2014 Semiconductor devices. Micro-electromechanical devices. Test method for Poisson's ratio of thin film MEMS materials
- BS EN 62047-26:2016 Semiconductor devices. Micro-electromechanical devices. Description and measurement methods for micro trench and needle structures
- BS EN 62047-10:2011 Semiconductor devices. Micro-electromechanical devices. Micro-pillar compression test for MEMS materials
- BS EN 62047-11:2013 Semiconductor devices. Micro-electromechanical devices. Test method for coefficients of linear thermal expansion of free-standing materials for micro-electromechanical systems
- 21/30432242 DC BS IEC 62047-42. Semiconductor devices. Micro-electromechanical devices. Part 42. Measurement methods of electromechanical conversion characteristics of piezoelectric MEMS cantilever
Danish Standards Foundation
- DS/EN IEC 62435-7:2021 Electronic components – Long-term storage of electronic semiconductor devices – Part 7: Micro-electromechanical devices
- DS/EN 62047-1:2006 Semiconductor devices – Micro-electromechanical devices – Part 1: Terms and definitions
- DS/EN 62047-10:2011 Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials
- DS/IEC 747-7:1990 International Electrotechnical Commission IEC Publication No. 747-7:1988 Semiconductor devices - Discrete devices -Part 7: Bipolar transistors
- DS/IEC 747-1:1993 Semiconductor devices. Discrete devices and integrated circuits. Part 1: General
ES-UNE
- UNE-EN IEC 62435-7:2021 Electronic components - Long-term storage of electronic semiconductor devices - Part 7: Micro-electromechanical devices (Endorsed by Asociación Española de Normalización in April of 2021.)
- UNE-EN IEC 60747-16-7:2023 Semiconductor devices - Part 16-7: Microwave integrated circuits - Attenuators (Endorsed by Asociación Española de Normalización in February of 2023.)
- UNE-EN 62047-20:2014 Semiconductor devices - Micro-electromechanical devices - Part 20: Gyroscopes (Endorsed by AENOR in November of 2014.)
- UNE-EN 62047-19:2013 Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses (Endorsed by AENOR in November of 2013.)
- UNE-EN 62047-5:2011 Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches (Endorsed by AENOR in November of 2011.)
- UNE-EN 62047-4:2010 Semiconductor devices - Micro-electromechanical devices -- Part 4: Generic specification for MEMS (Endorsed by AENOR in February of 2011.)
- UNE-EN 62047-1:2016 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions (Endorsed by AENOR in May of 2016.)
- UNE-EN 62047-10:2011 Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials (Endorsed by AENOR in December of 2011.)
- UNE-EN 62047-7:2011 Semiconductor devices - Micro-electromechanical devices - Part 7: MEMS BAW filter and duplexer for radio frequency control and selection (Endorsed by AENOR in November of 2011.)
SCC
- DANSK DS/EN IEC 62435-7:2021 Electronic components – Long-term storage of electronic semiconductor devices – Part 7: Micro-electromechanical devices
- CEI EN IEC 62435-7:2021 Electronic components – Long-term storage of electronic semiconductor devices Part 7: Micro-electromechanical devices
- DIN EN IEC 62435-7:2022 Electronic components - Long-term storage of electronic semiconductor devices - Part 7: Micro-electromechanical devices (IEC 62435-7:2020); German version EN IEC 62435-7:2021
- DANSK DS/EN 62047-19:2013 Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses
- DANSK DS/EN IEC 60747-16-7:2023 Semiconductor devices – Part 16-7: Microwave integrated circuits – Attenuators
- CEI EN IEC 60747-16-7:2023 Semiconductor devices Part 16-7: Microwave integrated circuits - Attenuators
- DANSK DS/EN 62047-20:2014 Semiconductor devices - Micro-electromechanical devices - Part 20: Gyroscopes
- CEI EN 62047-19:2014 Semiconductor devices - Micro-electromechanical devices Part 19: Electronic compasses
- CEI EN 62047-20:2016 Semiconductor devices - Micro-electromechanical devices Part 20: Gyroscopes
- 08/30172394 DC BS EN 62047-7. Semiconductor devices. Micro-electromechanical devices. P art 7. MEMS FBAR Filter & Duplexer
- CEI EN 62047-5:2015 Semiconductor devices - Micro-electromechanical devices Part 5: RF MEMS switches
- DANSK DS/EN 62047-5:2011 Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches
- DANSK DS/EN 62047-4:2010 Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS
- DIN EN IEC 60747-16-7:2024 Semiconductor devices - Part 16-7: Microwave integrated circuits - Attenuators (IEC 60747-16-7:2022); German version EN IEC 60747-16-7:2023
- CEI EN 62047-1:2016 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
- CEI EN 62047-4:2011 Semiconductor devices - Micro-electromechanical devices Part 4: Generic specification for MEMS
- DANSK DS/EN 62047-1:2016 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
- DANSK DS/EN 62047-10:2011 Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials
- CEI EN 62047-10:2012 Semiconductor devices - Microelectromechanical devices Part 10: Micro-pillar compression test for MEMS materials
- DIN IEC 62047-7 E:2008 Draft Document - Semiconductor devices - Micro-electromechanical devices - Part 7: MEMS FBAR Filter & Duplexer (IEC 47/1969/CD:2008)
- IEC 60747-4:1991+AMD1:1993+AMD2:1999 CSV Semiconductor devices - Discrete devices - Part 4: Microwave devices
- DANSK DS/EN 62047-7:2011 Semiconductor devices - Micro-electromechanical devices - Part 7: MEMS BAW filter and duplexer for radio frequency control and selection
- 07/30164950 DC IEC 60747-7. Semiconductor devices. Discrete devices. Part 7. Bipolar transistors (BTRs)
- IEC 60117-7:1971 Recommended graphical symbols - Part 7: Semiconductor devices, capacitors
- IEC 60117-7:1966 Recommended graphical symbols - Part 7: Semiconductor devices, capacitors
- DIN EN 62047-19 E:2011 Draft Document - Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses (IEC 47F/88/CD:2011)
PH-BPS
- PNS IEC 62435-7:2021 Electronic components - Long-term storage of electronic semiconductor devices - Part 7: Micro-electromechanical devices
- PNS IEC 62047-28:2021 Semiconductor devices - Micro-electromechanical devices - Part 28: Performance testing method of vibration-driven MEMS electret energy harvesting devices
PL-PKN
- PN-EN IEC 62435-7-2021-08 E Electronic components -- Long-term storage of electronic semiconductor devices -- Part 7: Micro-electromechanical devices (IEC 62435-7:2020)
European Committee for Electrotechnical Standardization(CENELEC)
- EN IEC 62435-7:2021 Electronic components - Long-term storage of electronic semiconductor devices - Part 7: Micro-electromechanical devices
- EN 62047-10:2011 Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials
- EN 62047-9:2011 Semiconductor devices - Micro-electromechanical devices - Part 9: Wafer to wafer bonding strength measurement for MEMS
- EN 62047-1:2016 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
- EN 62047-8:2011 Semiconductor devices - Micro-electromechanical devices - Part 8: Strip bending test method for tensile property measurement of thin films
Lithuanian Standards Office
- LST EN IEC 62435-7:2021 Electronic components - Long-term storage of electronic semiconductor devices - Part 7: Micro-electromechanical devices (IEC 62435-7:2020)
- LST EN 62047-7-2011 Semiconductor devices - Micro-electromechanical devices -- Part 7: MEMS BAW filter and duplexer for radio frequency control and selection (IEC 62047-7:2011)
- LST EN 62047-4-2011 Semiconductor devices - Micro-electromechanical devices -- Part 4: Generic specification for MEMS (IEC 62047-4:2008)
KR-KS
- KS C IEC 62047-22-2016 Semiconductor devices ― Micro-electromechanical devices ― Part 18: Bend testing methods of thin film materials
- KS C IEC 62047-18-2016 Semiconductor devices ― Micro-electromechanical devices ― Part 18: Bend testing methods of thin film materials
- KS C IEC 60747-7-2017 Semiconductor devices-Discrete devices-Part 7:Bipolar transistors
- KS C IEC 60747-7-2022 Semiconductor devices — Discrete devices — Part 7: Bipolar transistors
GSO
- GSO IEC 62047-19:2021 Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses
- BH GSO IEC 62047-19:2022 Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses
- GSO IEC 62047-20:2021 Semiconductor devices - Micro-electromechanical devices - Part 20: Gyroscopes
- BH GSO IEC 62047-20:2022 Semiconductor devices - Micro-electromechanical devices - Part 20: Gyroscopes
- GSO IEC 62047-5:2014 Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches
- OS GSO IEC 62047-5:2014 Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches
- BH GSO IEC 62047-5:2016 Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches
- GSO IEC 62047-4:2013 Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS
- GSO IEC 62047-1:2014 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
- BH GSO IEC 62047-4:2016 Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS
- OS GSO IEC 62047-4:2013 Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS
- OS GSO IEC 62047-1:2014 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
- GSO IEC 62047-7:2014 Semiconductor devices - Micro-electromechanical devices - Part 7: MEMS BAW filter and duplexer for radio frequency control and selection
- OS GSO IEC 62047-10:2014 Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials
- BH GSO IEC 62047-10:2016 Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials
- GSO IEC 62047-10:2014 Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials
- GSO IEC 62047-41:2023 Semiconductor devices - Micro-electromechanical devices - Part 41: RF MEMS circulators and isolators
- BH GSO IEC 62047-41:2023 Semiconductor devices - Micro-electromechanical devices - Part 41: RF MEMS circulators and isolators
- BH GSO IEC 62047-40:2023 Semiconductor devices - Micro-electromechanical devices - Part 40:Test methods of micro-electromechanical inertial shock switch threshold
- GSO IEC 62047-40:2023 Semiconductor devices - Micro-electromechanical devices - Part 40:Test methods of micro-electromechanical inertial shock switch threshold
- BH GSO IEC 60747-7:2016 Semiconductor devices - Discrete devices - Part 7: Bipolar transistors
- OS GSO IEC 62047-7:2014 Semiconductor devices - Micro-electromechanical devices - Part 7: MEMS BAW filter and duplexer for radio frequency control and selection
- BH GSO IEC 62047-7:2016 Semiconductor devices - Micro-electromechanical devices - Part 7: MEMS BAW filter and duplexer for radio frequency control and selection
- GSO IEC 62047-9:2014 Semiconductor devices - Micro-electromechanical devices - Part 9: Wafer to wafer bonding strength measurement for MEMS
German Institute for Standardization
- DIN EN 62047-19:2014-04 Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses (IEC 62047-19:2013); German version EN 62047-19:2013
- DIN EN 62047-5:2012-03 Semiconductor devices - Micro-electromechanical devices - Part 5: RF MEMS switches (IEC 62047-5:2011); German version EN 62047-5:2011
- DIN EN IEC 60747-16-7:2024-04 Semiconductor devices - Part 16-7: Microwave integrated circuits - Attenuators (IEC 60747-16-7:2022); German version EN IEC 60747-16-7:2023
- DIN EN 62047-1:2016-12 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions (IEC 62047-1:2016); German version EN 62047-1:2016 / Note: DIN EN 62047-1 (2006-10) remains valid alongside this standard until 2019-02-10.
- DIN EN 62047-4:2011-03 Semiconductor devices - Micro-electromechanical devices - Part 4: Generic specification for MEMS (IEC 62047-4:2008); German version EN 62047-4:2010
- DIN EN 62047-1:2006 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions (IEC 62047-1:2005); German version EN 62047-1:2006
- DIN EN 62047-10:2012-03 Semiconductor devices - Micro-electromechanical devices - Part 10: Micro-pillar compression test for MEMS materials (IEC 62047-10:2011); German version EN 62047-10:2011
- DIN EN 62047-20:2015-04 Semiconductor devices - Micro-electromechanical devices - Part 20: Gyroscopes (IEC 62047-20:2014); German version EN 62047-20:2014
- DIN EN 62047-19:2014 Semiconductor devices - Micro-electromechanical devices - Part 19: Electronic compasses (IEC 62047-19:2013); German version EN 62047-19:2013
- DIN EN IEC 60747-16-7:2021-07 Semiconductor devices - Part 16-7: Microwave integrated circuits - Attenuators (IEC 47E/734/CD:2020); Text in English / Note: Date of issue 2021-06-04
- DIN EN 62047-2:2007 Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin film materials (IEC 62047-2:2006); German version EN 62047-2:2006
- DIN EN 62047-7:2012-02 Semiconductor devices - Micro-electromechanical devices - Part 7: MEMS BAW filter and duplexer for radio frequency control and selection (IEC 62047-7:2011); German version EN 62047-7:2011
IEC - International Electrotechnical Commission
- IEC 62047-19:2013 Dispositifs à semiconducteurs – Dispositifs microélectromécaniques – Partie 19: Compas électroniques (Edition 1.0)
- IEC 62047-10:2011 Semiconductor devices – Micro-electromechanical devices – Part 10: Micro-pillar compression test for MEMS materials (Edition 1.0)
- IEC 62951-7:2019 Semiconductor devices – Flexible and stretchable semiconductor devices – Part 7: Test method for characterizing the barrier performance of thin film encapsulation for flexible organic semiconductor (Edition 1.0)
Korean Agency for Technology and Standards (KATS)
- KS C IEC 62047-7-2015(2020) SEMICONDUCTOR DEVICES ― MICRO-ELECTROMECHANICAL DEVICES ― Part 7: MEMS BAW filter and duplexer for radio frequency control and selection
- KS C IEC 60747-7:2017 Semiconductor devices-Discrete devices-Part 7:Bipolar transistors
- KS C IEC 60747-7:2006 Semiconductor devices-Discrete devices-Part 7:Bipolar transistors
- KS C IEC 60747-7:2022 Semiconductor devices — Discrete devices — Part 7: Bipolar transistors
- KS C IEC 62047-7:2015 SEMICONDUCTOR DEVICES ― MICRO-ELECTROMECHANICAL DEVICES ― Part 7: MEMS BAW filter and duplexer for radio frequency control and selection
- KS C IEC 62047-7-2020 SEMICONDUCTOR DEVICES ― MICRO-ELECTROMECHANICAL DEVICES ― Part 7: MEMS BAW filter and duplexer for radio frequency control and selection
IN-BIS
- IS 1885 Pt.7/Sec.6-1984 Electrical Vocabulary Part 7 Semiconductor Devices Section 6: Optoelectronic Devices
RO-ASRO
- STAS SR CEI 747-4-1995 Semiconductor devices Discrete devices Part 4: Microwave diodes and transistors
TH-TISI
- TIS 1864-2009 Semiconductor devices.part 7: bipolar transistors