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Database: 365,228(8 Aug 2026)

xps and aes

xps and aes, Total:11 items.

The international standard classification for "xps and aes" includes: Chemical analysis .

The Chinese standard classification for "xps and aes" includes: Basic standards and general methods .


中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会

  • GB/T 34326-2017 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
  • GB/T 33502-2017 Surface chemical analysis―Recording and reporting data in X-ray photoelectron spectroscopy(XPS)

IETF - Internet Engineering Task Force

  • RFC 8442-2018 ECDHE_PSK with AES-GCM and AES-CCM Cipher Suites for TLS 1.2 and DTLS 1.2
  • RFC 4494-2006 The AES-CMAC-96 Algorithm and Its Use with IPsec
  • RFC 3602-2003 The AES-CBC Cipher Algorithm and Its Use with IPsec
  • RFC 3566-2003 The AES-XCBC-MAC-96 Algorithm and Its Use With IPsec
  • RFC 6188-2011 The Use of AES-192 and AES-256 in Secure RTP

International Organization for Standardization (ISO)

  • ISO 16531:2020 Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

British Standards Institution (BSI)

  • BS ISO 16531:2020 Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
  • 19/30399949 DC BS ISO 16531. Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

SCC

  • 12/30241146 DC BS ISO 16531. Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS