GB/T 34326-2017 in English

VALID

Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

Issued on:2017-09-29
Implemented on:2018-08-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $250.00
$243.00

Standard No:	GB/T 34326-2017
Document status:	VALID
Title in English:	Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
Title in Chinese:	表面化学分析深度剖析 AES和XPS深度剖析时离子束对准方法及其束流或束流密度测量方法
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2017-09-29
Implemented on:	2018-08-01
ICS Classification:	71.040.40-Chemical analysis
Chinese Classification:	G04-Basic standards and general methods
Professional Classification:	GB-National Standard
Related Keywords:	beam current density ion beam alignment current density depth profiling proper beam alignment
Related Topics:	xps and aes xps and aes Standard Analysis Method for Density current density aes and xps energy spectrum aes or xps xps+aes xps and aes xps beam density aes and xps aes and xps aes and xps Heat flow during analysis xps or aes xps chemical analysis xps depth aes+xps Purity and how to measure it beam density ion beam instrument dual beam analysis Degree capacity analysis aes chemical analysis Carrier Density Measurement Method xps aes surface beam density xps+ depth Measuring depth of xps xps measure depth Beam aes spectral depth Measuring depth of xps aes and xps Flow meter analysis xps atom xps measure depth xps aes+ xps depth xps measure depth depth xps depth of xps xps aes depth analysis aes and xps surface xps xps aes Benchmarking method aes and xps xps surface depth xps+ surface depth xps surface depth xps depth analysis xps surface depth Current Density Analysis xps depth analysis Depth Analysis Method in Electron Spectroscopy parser depth xps xps surface but depth xps+ atom ion time flow Flow Cytometry Calcium triple ion beam Accuracy in Analytical Methods Density analysis model surface xps use xps and aes aes in xps current density xps and aes xps surface atoms Measurement and Analysis xps general survey depth Depth measured by xps optical depth xps analysis How to measure carrier density longitudinal depth Stream analysis speed xps and aes aes and xps depth of analysis xps measurement method xps+ aes Surface chemical analysis AES GBT34326 GB/T 34326-2017 imagej density analysis XPS penetration depth The intensity of XPS represents xps analysis software How to calculate the resolution of liquid phase analysis method Calculation method of current density during electrolysis Anterior chamber depth measurement method Surface analysis method study paper Force flow analysis method and its application Analytical method resolution requirements Principle and method of dissolution measurement by flow cell method Tap density analysis method Lateral flow chromatography quantitative analysis method gb/t34326 Methods for improving separation by size exclusion analysis

《GB/T 34326-2017表面化学分析深度剖析 AES和XPS深度剖析时离子束对准方法及其束流或束流密度测量方法》由TC38（全国微束分析标准化技术委员会）归口，TC38SC2（全国微束分析标准化技术委员会表面化学分析分会）执行，主管部门为国家标准化管理委员会。

Introduction

This standard provides guidelines for the alignment of ion beams and the measurement of beam current or beam current density during depth profiling using AES and XPS. It outlines methods to ensure accurate and consistent results in surface chemical analysis. The document covers procedures related to ion beam alignment, calibration techniques, and measurement protocols. It is intended for use by professionals involved in the analysis of material surfaces and thin films. The standard includes detailed descriptions of equipment setup, operational parameters, and data collection methods. It also addresses the factors that influence the accuracy of depth profiling and the importance of proper beam alignment. The information provided supports the reliable application of AES and XPS in research and industrial settings. The standard is structured to facilitate implementation and compliance with established practices in the field of surface analysis.

*** Please note: This description may not be accurate, please refer to the official documentation.

More samples: GB 18306-2015 QC/T 942-2021 GB 50021-2001(2009)

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