GB/T 26249-2010 in English

VALID

Gases for electronic industry—Hydrogen selenide

Issued on:2011-01-14
Implemented on:2011-05-01
File Format:PDF
Delivery:Via email within 1~3 business days

Price(USD)： $240.00
$233.00

Standard No:	GB/T 26249-2010
Document status:	VALID
Title in English:	Gases for electronic industry—Hydrogen selenide
Title in Chinese:	电子工业用气体　硒化氢
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2011-01-14
Implemented on:	2011-05-01
ICS Classification:	71.100.20-Gases for industrial application
Chinese Classification:	G86-Industrial gas and chemical gas
Professional Classification:	GB-National Standard
Related Keywords:	hydrogen selenide electronic industry hydrogen hydrogen selenide products selenide
Related Topics:	selenium Molybdenum selenide The role of selenium Hydrogen gas device Molybdenum Selenide Crystal electronics industry Industrial Gases hydrogen selenide electronics industry Selenization electron hydride Application of hydrogen hydrogen electron agent Atomic Selenium Hydride long-term selenium Quantum Selenium industrial gas bar air hydrogen gas industrial gas cobalt selenide crystal Industrial hydrogen production Industrial Aluminum Gas Selenium purity selenium hydrogen GBT26249 GB/T 26249-2010 Gases for the electronics industry Hydrogen Part 1 Industrial Hydrogen Selenium daily chemical Gas for electronics industry Industrialization of ionic liquids Hydrogen cyanide for industrial use Industrial hydrogen quality Gas hydrogen bromide for electronic industry Gases for Electronics Industry International

《GB/T 26249-2010电子工业用气体硒化氢》由TC203（全国半导体设备和材料标准化技术委员会）归口，主管部门为国家标准化管理委员会。

Scope

This standard specifies the technical requirements, test methods, packaging, marking, storage, transportation and safety of hydrogen selenide. This standard applies to hydrogen selenide products obtained by hydrolysis of selenium-aluminum, selenium-magnesium alloy compounds, high-temperature reaction of elemental selenium and hydrogen and refined. It is mainly used for epitaxy, ion implantation and doping in the production of solar cells, semiconductors and integrated circuits.

More samples: YD/T 3934-2021 NB/T 47013.2-2015 JGJ 94-2008

Sample only — not a preview of GB/T 26249-2010

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