GB/T 28274-2012 in English
VALIDSilicon-based MEMS fabrication technology—The basic regulation of layout design
- Issued on:2012-05-11
- Implemented on:2012-12-01
- File Format:PDF
- Delivery:Via email within 1~3 business days
$204.00
| Standard No: | GB/T 28274-2012 |
| Document status: | VALID |
| Title in English: | Silicon-based MEMS fabrication technology—The basic regulation of layout design |
| Title in Chinese: | 硅基MEMS制造技术 版图设计基本规则 |
| Language: | English |
| File Format: | Electronic (PDF) |
| Delivery: | Via email within 1~3 business days |
| Issued on: | 2012-05-11 |
| Implemented on: | 2012-12-01 |
| ICS Classification: | 31.200-Integrated circuits. Microelectronics |
| Chinese Classification: | L55-Microcircuit in general |
| Professional Classification: | GB-National Standard |
| Related Keywords: | layout design scopethis standard
lithographic layout design graphic design basic regulation silicon-based mems fabrication technology |
| Related Topics: | Silicon base
mems Manufacturing Technology Silicon base base body diagram Technical Design and Manufacturing silicon-based technology silicon-based technology Manufacturing Technology territory GBT28274 |
《GB/T 28274-2012硅基MEMS制造技术 版图设计基本规则》由TC336（全国微机电技术标准化技术委员会）归口，主管部门为国家标准化管理委员会。
Scope
This standard specifies the basic rules that should be followed in graphic design in lithographic layout design during microstructure processing. This standard applies to the use of contact single/double-sided lithography, oxidation diffusion, chemical vapor deposition (CVD), physical vapor deposition (PVD), ion implantation, reactive ion etching (RIE), potassium hydroxide (KOH) Basic process methods such as corrosion, silicon-glass alignment electrostatic bonding, grinding wheel scribing, etc.
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