GB/T 34900-2017 in English

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Standard No:	GB/T 34900-2017
Document status:	VALID
Title in English:	Micro-electromechanical system technology-Measuring method for residual strain measurements of MEMS microstructures using an optical interferometer
Title in Chinese:	微机电系统（MEMS）技术基于光学干涉的MEMS微结构残余应变测量方法
Language:	English
File Format:	Electronic (PDF)
Delivery:	Via email within 1~3 business days
Issued on:	2017-11-01
Implemented on:	2018-05-01
ICS Classification:	31.200-Integrated circuits. Microelectronics
Chinese Classification:	L55-Microcircuit in general
Professional Classification:	GB-National Standard
Related Keywords:	mems microstructures technology-measuring method optical interferometer residual strain measurements optical interferometry
Related Topics:	microstructure MEMS mems remnant Technology Mems microstructure in-plane length measurement method based on optical interference mems technology Mems microstructure in-plane length measurement method based on optical interference Optical system structure Strain measurement method microcavity interference mems technology mems technology optical properties mems structure measurement Microdose system residual standard interference of light mems test system microsystem technology GBT34900 GB/T 34900-2017 National standard number of structural strain measurement method

《GB/T 34900-2017微机电系统（MEMS）技术基于光学干涉的MEMS微结构残余应变测量方法》由TC336（全国微机电技术标准化技术委员会）归口，主管部门为国家标准化管理委员会。

Scope

Micro-electromechanical systems (MEMS) technology A method for measuring the in-plane length of MEMS microstructures based on optical interferometry

More samples: JC/T 2453-2018 JGJ 94-2008 DL/T 5154-2012

Sample only — not a preview of GB/T 34900-2017

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