GB/T 36646-2018 in English

1. Scope and Applicability of the Standard

This standard applies to hydride vapor phase epitaxy equipment (HVPE equipment) for preparing nitride semiconductor materials with a diameter of \(50.8 \mathrm{~mm} \sim 152.4 \mathrm{~mm}\). The specification content includes product classification, working conditions, technical requirements and test methods.

2. Background of Standard Formulation

Nitride semiconductor materials are the core of the third-generation semiconductors, and HVPE equipment is the key technology for its preparation. With the rapid development of the semiconductor industry, standardizing the technical requirements and test methods of HVPE equipment is of great significance to improving product quality and technical level.

3. Standard Framework Comparison Table

4. Analysis of Technological Evolution

HVPE technology has evolved from laboratory research to industrial application. In recent years, with the growing demand for nitride semiconductor devices, HVPE equipment has made significant progress in the following aspects:

• Optimization of reaction chamber design: Improve gas transport efficiency
• Upgrade of temperature control system: Achieve more precise temperature control
• Improvement of automation level: Introduction of intelligent control system

5. Implementation Suggestions

To ensure the efficient operation of HVPE equipment and product quality, the following measures are recommended:

1. Operator training: Strengthen equipment use and maintenance skills training
2. Regular calibration: Ensure the accuracy of key parameters such as pressure and temperature
3. Spare parts management: Establish a complete spare parts inventory and replacement mechanism