Secondary Electron Spectrum

Secondary Electron Spectrum, Total:86 items.

The international standard classification for "Secondary Electron Spectrum" includes: Chemical analysis , Testing of metals , Semiconducting materials .

The Chinese standard classification for "Secondary Electron Spectrum" includes: Basic standards and general methods , Semimetal and semiconductor material analysis method , Semimetal and semiconductor material in general , Elemental semiconductor material .

国家市场监督管理总局、中国国家标准化管理委员会

GB/T 40129-2021 Surface chemical analysis—Secondary ion mass spectrometry—Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
GB/T 41153-2021 Determination of boron,aluminum and nitrogen impurity content in silicon carbide single crystal―Secondary ion mass spectrometry
GB/T 39144-2020 Test method for magnesium content in gallium nitride materials—Secondary ion mass spectrometry
GB/T 40109-2021 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
GB/T 41064-2021 Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
GB/T 41072-2021 Surface chemical analysis - Electron spectroscopies - Guidelines for ultraviolet photoelectron spectroscopy analysis

Group Standards of the People's Republic of China

T/SHPTA 035-2023 Experimental methods for testing secondary batteries and their key materials using time-of-flight secondary ion mass spectrometry
T/HNNMIA 8-2023 Chemical analysis methods for secondary aluminium ash - Determination of total fluorine content - Ion chromatography

General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China

GB/T 29851-2013 Test method for measuring boron and aluminium in silicon materials used for photovoltaic applications by secondary ion mass spectrometry
GB/T 29852-2013 Test Method for Measuring Phosphorus, Arsenic and Antimony in Silicon Materials Used for Photovoltaic Applications by Secondary Ion Mass Spectrometry
GB/T 28632-2012 Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—Determination of lateral resolution
GB/T 42263-2022 Determination of nitrogen content in silicon single crystal—Secondary ion mass spectrometry method
GB/T 43663-2024 Surface chemical analysis—Secondary-ion mass spectrometry—Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
GB/T 24575-2009 Test method for measuring surface sodium,aluminum,potassium,and iron on silicon and epi substrates by secondary ion mass spectrometry
GB/T 25186-2010 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of relative sensitivity factors from ion-implanted reference materials
GB/T 24580-2009 Test method for measuring Boron contamination in heavily doped n-type silicon substrates by secondary ion mass spectrometry
GB/T 32495-2016 Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of arsenic in silicon

Shandong Provincial Standard of the People's Republic of China

DB37/T 2393-2013 Secondary lithium ion battery electrolyte
DB37/T 1943-2011 General technical requirements for lithium-ion secondary battery cells

Professional Standard - Electron

SJ/T 11493-2015 Test method for measuring nitrogen concentration in silicon substrates by secondary ion mass spectrometry
SJ/T 11498-2015 Test method for measuring oxygen contamination in heavily doped silicon substrates by secondary ion mass spectrometry

Professional Standard - Agriculture

780兽药典一部-2015 Appendix Contents 0400 Spectroscopy 0411 Inductively Coupled Plasma Atomic Emission Spectrometry
783兽药典二部-2015 Appendix Contents 0500 Chromatography 0513 Ion Chromatography
781兽药典一部-2015 Appendix Contents 0400 Spectroscopy 0412 Inductively Coupled Plasma Mass Spectrometry
775兽药典二部-2015 Appendix Contents 0400 Spectroscopy 0411 Inductively Coupled Plasma Mass Spectrometry
776兽药典二部-2015 Appendix Contents 0400 Spectroscopy 0412 Inductively Coupled Plasma Atomic Emission Spectrometry
790兽药典一部-2015 Appendix Contents 0500 Chromatography 0513 Ion Chromatography

国家质量监督检验检疫总局

SN/T 4585-2016 Determination of methylarsonic acid and dimethylarsinic acid residue in foods for export-LC-ICP-MS method

International Organization for Standardization (ISO)

ISO 13084:2018 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
ISO 20411:2018 Surface chemical analysis - Secondary ion mass spectrometry - Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
ISO 13084:2011 Surface chemical analysis - Secondary-ion mass spectrometry - Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
ISO 22048:2004 Surface chemical analysis — Information format for static secondary-ion mass spectrometry
ISO/TS 22933:2022 Surface chemical analysis — Secondary ion mass spectrometry — Method for the measurement of mass resolution in SIMS
ISO 17109:2022 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth p
ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
ISO 14237:2000 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

GSO

GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
BH GSO ISO 13084:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
OS GSO ISO 13084:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
OS GSO ISO 23830:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
GSO ISO 23830:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
BH GSO ISO 23830:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
GSO ISO 22048:2013 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
BH GSO ISO 22048:2016 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
OS GSO ISO 22048:2013 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
BH GSO ISO 17560:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
GSO ISO 18114:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
OS GSO ISO 12406:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of arsenic in silicon
BH GSO ISO 18114:2016 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
GSO ISO 17560:2013 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon

British Standards Institution (BSI)

BS ISO 13084:2011 Surface chemical analysis. Secondary-ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
BS ISO 13084:2018 Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
BS ISO 20411:2018 Surface chemical analysis. Secondary ion mass spectrometry. Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
BS ISO 22048:2004 Surface chemical analysis. Information format for static secondary-ion mass spectrometry
BS ISO 22048:2004(2005) Surface chemical analysis — Information format for static secondary - ion mass spectrometry
BS EN 61960-2:2002 Secondary lithium cells and batteries for portable applications - Secondary lithium batteries
BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
21/30433862 DC BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and…
BS ISO 12406:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon

Japanese Industrial Standards Committee (JISC)

JIS K 0157:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
JIS K 0158:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
JIS K 0153:2015 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
JIS K 0168:2011 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
JIS K 0164:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon

SCC

10/30199193 DC BS ISO 13084. Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time of flight secondary ion mass spectrometer
07/30138812 DC BS ISO 23830. Surface chemical analysis. Secondary-ion mass spectrometry. Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
BS EN 61960-1:2001 Secondary lithium cells and batteries for portable applications-Secondary lithium cells
ISO 17109:2015/DAmd 1 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films — A...

Association Francaise de Normalisation

NF ISO 23830:2009 Chemical analysis of surfaces - Mass spectrometry of secondary ions - Repeatability and constancy of the scale of relative intensities in static mass spectrometry of secondary ions

CZ-CSN

CSN 36 7003-1985 Electronic equipment Secondary power supply systems Classification

American Society for Testing and Materials (ASTM)

ASTM E1504-11(2019) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E2695-09 Standard Guide for Interpretation of Mass Spectral Data Acquired with Time-of-Flight Secondary Ion Mass Spectroscopy
ASTM E1635-95(2000) Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1635-06(2019) Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)

Korean Agency for Technology and Standards (KATS)

KS D ISO 22048-2005(2020) Surface chemical analysis - Information format for static secondary-ion mass spectrometry
KS D ISO 22048-2020 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
KS D ISO 18114-2020 Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS D ISO 18114-2005(2020) Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS C ISO/IEC PAS 16898:2019 Electrically propelled road vehicles — Dimensions and designation of secondary lithium-ion cells

US-FCR

FCR FED H-08-1 SEC 16312-2004 UNIT SUBSTATION, SECONDARY
FCR FED H-08-3 801-2-1987 PRIMARY AND SECONDARY ELECTRICAL TRANSFORMATION AND DISTRIBUTION

IN-BIS

IS 3008-1993 Brush, shoe blacking. Specification (Second Revision)

Standard Association of Australia （SAA）

AS 2668:1983 Water for use in secondary batteries